Granted Patent B2

US 12,385,123 · App. 17/776,709 · Granted Aug 12, 2025

Inventors: Michael Edward Rendall (Newbury, GB); Robert Ian Joseph Gruar (Swindon, GB)

Assignee: Dyson Technology Limited

C23C14/02C23C14/351C23C14/50C23C14/54H01J37/32733H01J37/3277H01J37/3405H01J37/3417H01J37/3452

Abstract

Claims (36)

1. A sputter deposition apparatus comprising:

a guiding member to guide a substrate in a conveyance direction, wherein the guiding member is a curved member having a curved surface, wherein the curved member comprises a roller having a circumference;

a plasma source to generate a plasma;

a magnet arrangement configured to confine the plasma within the apparatus to:

a pre-treatment zone, within which the substrate is exposed to the plasma in use; and

a sputter deposition zone, located after the pre-treatment zone in the conveyance direction, to provide for sputter deposition of a target material to the substrate in use;

wherein the pre-treatment and sputter deposition zones are separated about and disposed about the guiding member, and

wherein the magnet arrangement is configured to provide the plasma such that the plasma substantially conforms to a curvature of at least ¼ of the circumference of the roller.

2. The sputter deposition apparatus according to claim 1 , wherein the magnet arrangement is configured to confine the plasma within the pre-treatment zone to interact with at least part of a surface of the substrate in use.

3. The sputter deposition apparatus according to claim 1 , wherein within the pre-treatment zone the plasma interacts with the substrate in an ablative process in use.

4. The sputter deposition apparatus according to claim 1 , wherein the magnet arrangement is configured to confine the plasma to extend between the pre-treatment and sputter deposition zones about the guiding member.

5. The sputter deposition apparatus according to claim 1 , comprising a target portion arranged to support the target material, wherein the deposition zone is located between the target portion and the guiding member.

6. The sputter deposition apparatus according to claim 1 , wherein the magnet arrangement is configured to confine the plasma in the form of a sheet.

7. The sputter deposition apparatus according to claim 1 , wherein the magnet arrangement is configured to confine the plasma around the curved member in the sputter deposition zone and into the pre-treatment zone.

8. The sputter deposition apparatus according to claim 1 , wherein the magnet arrangement comprises one or more magnetic elements.

9. The sputter deposition apparatus according to claim 8 , wherein the magnet arrangement comprises at least two magnetic elements arranged such that a region of relatively high magnetic field strength, defined between the at least two magnetic elements, is in the form of a sheet.

10. The sputter deposition apparatus according to claim 8 , wherein one or more of the magnetic elements is an electromagnet.

11. The sputter deposition apparatus according to claim 8 , comprising a magnetic controller to control a magnetic field strength of one or more of the one or more magnetic elements.

12. The sputter deposition apparatus according to claim 8 , wherein one or more of the magnetic elements comprises a solenoid, the solenoid being elongate in cross-section.

13. The sputter deposition apparatus according to claim 12 , wherein the solenoid is elongate, in cross section, in a direction substantially parallel to an axis of rotation of the curved member.

14. The sputter deposition apparatus according to claim 8 , wherein the magnet arrangement is disposed outside a curve of the curved member.

15. The sputter deposition apparatus according to claim 1 , wherein the plasma source is an inductively coupled plasma source.

16. The sputter deposition apparatus according to claim 1 , wherein the plasma source comprises one or more elongate antennae.

17. The sputter deposition apparatus according to claim 16 , wherein one or more of the elongate antennae are substantially linear.

18. The sputter deposition apparatus according to claim 16 , wherein one or more of the elongate antennae extend in a direction substantially perpendicular to the conveyance direction.

19. The sputter deposition apparatus according to claim 16 , wherein one or more of the elongate antennae are curved.

20. The sputter deposition apparatus according to claim 19 ,

wherein one or more of the curved elongate antennae extend in a plane substantially perpendicular to the longitudinal axis of the curved member.

21. The sputter deposition apparatus according to claim 16 , wherein one or more of the elongate antennae extend in a direction substantially parallel to a longitudinal axis of the curved member.

22. A sputter deposition method using the sputter deposition apparatus of claim 1 , comprising:

guiding the substrate, using the guiding member, in the conveyance direction;

generating plasma using the plasma source;

confining said plasma, using the magnet arrangement, to:

the pre-treatment zone, within which the substrate is exposed to the plasma; and

the sputter deposition zone, located after the pre-treatment zone in the conveyance direction, to provide for sputter deposition of the target material to the substrate;

wherein the pre-treatment and sputter deposition zones are disposed about the guiding member.

Assignments (1)

Priority Claims (1)

Continuity (1)

References Cited (185)