Semiconductor device
View Patent ↗A semiconductor device includes a semiconductor part, first to third electrodes, a control electrode and first to third insulating films. The semiconductor part is provided between the first and second electrodes. The third electrode extends in a first direction inside a trench of the semiconductor part. The control electrode is provided inside the trench at an opening side thereof. The control electrode includes first and second control portions arranged in a second direction crossing the first direction. The third electrode has an end portion between the first and second control portions. The first insulating film is provided between the semiconductor part and the third electrode. The second insulating film is provided between the semiconductor part and the control electrode. The third insulating film covers the end portion of the third electrode. The first insulating film includes an extending portion extending between the third insulating film and the control electrode.
1. A semiconductor device comprising:
a semiconductor part;
a first electrode provided on a back surface of the semiconductor part;
a second electrode provided on a front surface of the semiconductor part, the front surface of the semiconductor part being at a side of the semiconductor part that is opposite to the back surface of the semiconductor part;
a third electrode provided between the first electrode and the second electrode, the semiconductor part including a trench having an opening in the front surface of the semiconductor part, and the third electrode extending inside the trench in a first direction from the first electrode toward the second electrode;
a control electrode provided inside the trench at the opening of the trench, the control electrode including a first control portion and a second control portion arranged in a second direction parallel to the back surface of the semiconductor part, the third electrode having a front end portion on a side of the third electrode that is closest to the front surface of the semiconductor part, and the front end portion of the third electrode extending between the first control portion and the second control portion;
a first insulating film provided between the semiconductor part and the third electrode, the first insulating film electrically insulating the third electrode from the semiconductor part;
a second insulating film provided between the semiconductor part and the control electrode, the second insulating film electrically insulating the control electrode from the semiconductor part; and
a third insulating film covering the front end portion of the third electrode, the third insulating film electrically insulating the third electrode from the control electrode and from the second electrode,
the control electrode being provided between the first insulating film and the second electrode,
the first insulating film including an extending portion extending between the front end portion of the third electrode and the control electrode,
the third insulating film extending between the extending portion of the first insulating film and the front end portion of the third electrode, and
the third insulating film extending between the front end portion of the third electrode and the second electrode.
2. A semiconductor device comprising:
a semiconductor part;
a first electrode provided on a back surface of the semiconductor part;
a second electrode provided on a front surface of the semiconductor part, the front surface of the semiconductor part being at a side of the semiconductor part that is opposite to the back surface of the semiconductor part;
a third electrode provided between the first electrode and the second electrode, the semiconductor part including a trench having an opening in the front surface of the semiconductor part, and the third electrode extending inside the trench in a first direction from the first electrode toward the second electrode;
a control electrode provided inside the trench at the opening of the trench, the control electrode including a first control portion and a second control portion arranged in a second direction parallel to the back surface of the semiconductor part, and the third electrode having an end portion extending between the first control portion and the second control portion;
a first insulating film provided between the semiconductor part and the third electrode, the first insulating film electrically insulating the third electrode from the semiconductor part;
a second insulating film provided between the semiconductor part and the control electrode, the second insulating film electrically insulating the control electrode from the semiconductor part; and
a third insulating film covering the end portion of the third electrode, the third insulating film electrically insulating the third electrode from the control electrode,
the control electrode being provided between the first insulating film and the second electrode,
the first insulating film including an extending portion extending between the end portion of the third electrode and the control electrode,
the third insulating film extending between the extending portion of the first insulating film and the end portion of the third electrode,
the control electrode including a first end portion at a side of the control electrode facing the second electrode and a second end portion at a side of the control electrode facing the first insulating film,
the first end portion of the control electrode being in contact with the third insulating film, and
the second end portion of the control electrode being in contact with the first insulating film.
3. The semiconductor device according to claim 1 , wherein
the first insulating film has a two-layer structure including an oxidized film provided by thermally oxidizing the semiconductor part and a deposited film provided on the oxidized film, and
the extending portion of the first insulating film is a portion of the deposited film.
4. The semiconductor device according to claim 3 , wherein
the semiconductor part is silicon, and
the oxidized film and the deposited film of the first insulating film are silicon oxide films.
5. The semiconductor device according to claim 1 , wherein
the third electrode is polysilicon, and
the third insulating film is a silicon oxide film provided by thermally oxidizing the third electrode.
6. The semiconductor device according to claim 2 , wherein
the extending portion of the first insulating film has a first film thickness, which is at a tip end thereof in the first direction, and a second film thickness that is equal to a distance from the second end portion of the control electrode to the third electrode, and
the first film thickness is smaller than the second film thickness.
7. The semiconductor device according to claim 2 , wherein
the third insulating film includes a first portion in contact with the first end portion of the control electrode and a second portion facing the second end portion of the control electrode and the extending portion of the first insulating film, and
the first portion of the third insulating film has a third film thickness in the second direction larger than a fourth film thickness in the second direction of the second portion of the third insulating film.
8. The semiconductor device according to claim 1 , further comprising:
a fourth insulating film provided between the second electrode and the control electrode, the fourth insulating film electrically insulating the control electrode from the second electrode.
9. The semiconductor device according to claim 8 , wherein
the fourth insulating film extends between the second electrode and the third electrode.
10. The semiconductor device according to claim 1 , wherein
the semiconductor part includes first to third layers,
the first layer being of a first conductivity type, the first layer extending between the first electrode and the second electrode, and the first layer facing the third electrode and the first insulating film,
the second layer being of a second conductivity type, the second layer being provided between the first layer and the second electrode, and the second layer facing the control electrode and the second insulating film, and
the third layer being of the first conductivity type, the third layer being provided between the second layer and the second electrode, and the third layer being in contact with the second insulating film.
11. The semiconductor device according to claim 10 , wherein
the semiconductor part further includes a fourth layer of the second conductivity type, the fourth layer being provided between the second layer and the second electrode, and the fourth layer including a second conductivity type impurity with a higher concentration than a concentration of a second conductivity type impurity in the second layer, and
the second electrode includes a first contact portion in contact with the third layer and the fourth layer, the second electrode being electrically connected to the third layer and the fourth layer.