Cleaning device and cleaning method
A cleaning device includes: a substrate rotation mechanism that holds and rotates a substrate around center axis thereof; a first single-tube nozzle that discharges first cleaning liquid toward a top surface of the substrate; and a second single-tube nozzle that discharges second cleaning liquid toward the top surface of the substrate. The first single-tube nozzle and the second single-tube nozzle are disposed such that the second single-tube nozzle discharges the second cleaning liquid in a forward direction of a rotation direction of the substrate at a position farther away from the center of the substrate than a landing position of the first cleaning liquid, and a part is generated in which liquid flow on the top surface of the substrate after landing of the first cleaning liquid and liquid flow on the top surface of the substrate after landing of the second cleaning liquid are combined.
1. A cleaning device comprising:
a substrate rotation mechanism that holds a substrate and rotates the substrate around a center axis of the substrate as a rotation axis;
a first single-tube nozzle that discharges a first cleaning liquid toward a top surface of the substrate held by the substrate rotation mechanism; and
a second single-tube nozzle that discharges a second cleaning liquid toward the top surface of the substrate held by the substrate rotation mechanism separately from the first single-tube nozzle,
wherein the first single-tube nozzle is configured to discharge the first cleaning liquid along a first line, the first line extending from the first single-tube nozzle to a first location on the top surface of the substrate, the first location being on a first radius of the top surface of the substrate a first distance before a center of the substrate in a direction to the edge of the substrate in alignment with the first single-tube nozzle, the discharge causing a first liquid flow of the first cleaning liquid on the top surface of the substrate after landing, the first liquid flow passing from the first location through the center of the substrate, and
wherein the second single-tube nozzle is configured to discharge the second cleaning liquid along a second line, the second line extending from the second single-tube nozzle to a second location on the top surface of the substrate, the second location being on a second radius of the top surface of the substrate a second distance from the center of the substrate toward the outer edge of the substrate, the second distance being greater than the first distance, and the second line extending from the second nozzle in a same direction as a direction of a rotation of the substrate and in a direction where the second line forms a first angle with a third line extending from the center of the substrate to the second location when viewed in a plan view from above, the second discharge causing a second liquid flow of the second cleaning liquid on the top surface of the substrate after the second cleaning liquid lands on the substrate and causing a portion of the first liquid flow and a portion of the second liquid flow to combine, and
wherein the third line forms an obtuse second angle with a fourth line extending from the center of the substrate to the first location on a downstream side of the first location in the direction of rotation of the substrate.
2. The cleaning device according to claim 1 , wherein
a flow rate of the first cleaning liquid discharged from the first single-tube nozzle is larger than a flow rate of the second cleaning liquid discharged from the second single-tube nozzle.
3. The cleaning device according to claim 2 , wherein
a diameter of the first single-tube nozzle is larger than a diameter of the second single-tube nozzle.
4. The cleaning device according to claim 1 , wherein
discharge of the first cleaning liquid by the first single-tube nozzle and discharge of the second cleaning liquid by the second single-tube nozzle are performed simultaneously.
5. The cleaning device according to claim 1 , wherein
the first cleaning liquid and the second cleaning liquid are water or a chemical liquid.
6. The cleaning device according to claim 1 , wherein
the second radius is longer than ¼ of a radius of the substrate.
7. The cleaning device according to claim 6 , wherein
the second radius is longer than ⅓ of a radius of the substrate.
8. The cleaning device according to claim 1 , wherein
an angle between a liquid flow from being discharged from the first single-tube nozzle to landing on the top surface of the substrate and the top surface of the substrate is 15° to 75° when viewed from a side view of the cleaning device.
9. The cleaning device according to claim 1 , wherein
an angle between a liquid flow from being discharged from the second single-tube nozzle to landing on the top surface of the substrate and the top surface of the substrate is 15° to 75° when viewed from a side view of the cleaning device.
10. The cleaning device according to claim 1 , wherein
the number of second single-tube nozzles is two or more.
11. A cleaning method comprising:
a step of rotating a substrate around a center axis of the substrate as a rotation axis;
a step of discharging a first cleaning liquid from a first single-tube nozzle toward a top surface of the substrate, wherein the first single-tube nozzle is configured to discharge the first cleaning liquid along a first line, the first line extending from the first single-tube nozzle to a first location on the top surface of the substrate, the first location being on a first radius of the top surface of the substrate a first distance before a center of the substrate in a direction to the edge of the substrate in alignment with the first single-tube nozzle, the discharge causing a first liquid flow of the first cleaning liquid on the top surface of the substrate after landing, the first liquid flow passing from the first location through the center of the substrate, and
a step of discharging a second cleaning liquid from a second single-tube nozzle toward the top surface of the substrate separately from the first single-tube nozzle, wherein
the second single-tube nozzle discharges the second cleaning liquid along a second line, the second line extending from the second single-tube nozzle to a second location on the top surface of the substrate, the second location being on a second radius of the top surface of the substrate a second distance from the center of the substrate toward the outer edge of the substrate, the second distance being greater than the first distance, and the second line extending from the second nozzle being in a same direction as a direction of a rotation of the substrate and in a direction where the second line forms a first angle with a third line extending from the center of the substrate to the second location when viewed in a plan view from above, the second discharge causing a second liquid flow of the second cleaning liquid on the top surface of the substrate after the second cleaning liquid lands on the substrate and causing a portion of the first flow and a portion of the second flow to combine, and
wherein the third line forms an obtuse second angle with a fourth line extending from the center of the substrate to the first location on a downstream side of the first location in the direction of rotation of the substrate.
12. The cleaning method according to claim 11 , wherein
a flow rate of the first cleaning liquid discharged from the first single-tube nozzle is larger than a flow rate of the second cleaning liquid discharged from the second single-tube nozzle.
13. The cleaning method according to claim 12 , wherein a diameter of the first single-tube nozzle is larger than a diameter of the second single-tube nozzle.
14. The cleaning method according to claim 11 , wherein discharge of the first cleaning liquid by the first single-tube nozzle and discharge of the second cleaning liquid by the second single-tube nozzle are performed simultaneously.
15. The cleaning method according to claim 11 , wherein the first cleaning liquid and the second cleaning liquid are water or a chemical liquid.
16. The cleaning method according to claim 11 , wherein
the second radius is longer than ¼ of a radius of the substrate.
17. The cleaning method according to claim 16 , wherein
the second radius is longer than ⅓ of a radius of the substrate.
18. The cleaning method according to claim 11 , wherein
an angle between a liquid flow from being discharged from the first single-tube nozzle to landing on the top surface of the substrate and the top surface of the substrate is 15° to 75° when viewed from a side view of the cleaning device.