Substrate processing method, substrate processing apparatus, and processing liquid
A substrate processing method includes a processing film forming step in which a processing liquid is supplied to a front surface of a substrate and the processing liquid on the front surface of the substrate is solidified or cured to form a processing film on the front surface of the substrate, an etching facilitating step in which the processing film is subjected to etching function developing processing, thereby facilitating etching at a surface layer portion of the substrate by the processing film, and an etching reducing step in which the processing film is subjected to etching function eliminating processing, thereby reducing the etching at the surface layer portion of the substrate by the processing film in a state that the processing film is kept on the substrate.
1 . A substrate processing method comprising:
a processing film forming step in which a processing liquid is supplied to a front surface of a substrate and the processing liquid on the front surface of the substrate is solidified or cured to form a processing film on the front surface of the substrate;
an etching facilitating step in which the processing film is subjected to etching function developing processing to facilitate etching at a surface layer portion of the substrate by the processing film; and
an etching reducing step in which the processing film is subjected to etching function eliminating processing to reduce the etching at the surface layer portion of the substrate by the processing film in a state that the processing film is kept on the substrate; wherein
the etching function developing processing includes pH-adjusting processing in which a pH-adjusting liquid is supplied to the processing film on the substrate, thereby adjusting the pH in the processing film so as to be acidic or basic, and
the etching function eliminating processing includes neutralization processing in which a neutralizing liquid is supplied to the processing film on the substrate, thereby bringing the pH in the processing film closer to neutral than the pH in the processing film which has been adjusted by the pH-adjusting processing.
2 . The substrate processing method according to claim 1 , wherein
the etching function developing processing includes heating strengthening processing of strengthening heating applied to the processing film, and
the etching function eliminating processing includes heating weakening processing of weakening the heating applied to the processing film.
3 . The substrate processing method according to claim 1 , wherein
in the processing film forming step, the processing film is formed which contains a function developing component to develop an etching function by the etching function developing processing.
4 . The substrate processing method according to claim 1 , wherein
etching processing in which the etching facilitating step and the etching reducing step are given as one cycle is executed in a plural number of cycles.
5 . The substrate processing method according to claim 1 , further comprising a processing film removing step in which a removing liquid is supplied to the front surface of the processing film, thereby removing the processing film from the front surface of the substrate.
6 . The substrate processing method according to claim 5 , wherein
the processing film removing step includes a dissolution removing step in which the processing film is dissolved in the removing liquid to remove the processing film from the front surface of the substrate.
7 . A substrate processing method comprising:
a processing film forming step in which a processing liquid is supplied to a front surface of a substrate and the processing liquid on the front surface of the substrate is solidified or cured to form a processing film on the front surface of the substrate;
an etching facilitating step in which the processing film is subjected to etching function developing processing to facilitate etching at a surface layer portion of the substrate by the processing film; and
an etching reducing step in which the processing film is subjected to etching function eliminating processing to reduce the etching at the surface layer portion of the substrate by the processing film in a state that the processing film is kept on the substrate; wherein
in the processing film forming step, the processing film is formed which contains a function developing component to develop an etching function by the etching function developing processing,
the function developing component is a polymer which releases protons in the processing film by the etching function developing processing and receives protons from the processing film by the etching function eliminating processing,
the etching facilitating step includes a step in which the protons are released from the polymer by the etching function developing processing to facilitate etching at the surface layer portion of the substrate, and
the etching reducing step includes a step in which the protons are imparted to the polymer by the etching function eliminating processing to reduce the etching at the surface layer portion of the substrate.
8 . The substrate processing method according to claim 7 , wherein
the polymer is a copolymer of N-isopropylacrylamide, N,N′-methylenebisacrylamide, and acrylic acid.
9 . A substrate processing method comprising:
a processing film forming step in which a processing liquid is supplied to a front surface of a substrate and the processing liquid on the front surface of the substrate is solidified or cured to form a processing film on the front surface of the substrate;
an etching facilitating step in which the processing film is subjected to etching function developing processing to facilitate etching at a surface layer portion of the substrate by the processing film; and
an etching reducing step in which the processing film is subjected to etching function eliminating processing to reduce the etching at the surface layer portion of the substrate by the processing film in a state that the processing film is kept on the substrate; wherein
in the processing film forming step, the processing film is formed which contains a function developing component to develop an etching function by the etching function developing processing,
the function developing component is a polymer which has plural types of constituent units and contains an organic acid as one type of the constituent unit,
the etching facilitating step includes a step in which the polymer is decomposed by the etching function developing processing to form plural types of monomers including an organic acid of a monomer, thereby facilitating etching at the surface layer portion of the substrate, and
the etching reducing step includes a step in which the plural types of monomers in the processing film are polymerized by the etching function eliminating processing to form the polymer, thereby reducing the etching at the surface layer portion of the substrate.
10 . The substrate processing method according to claim 9 , wherein
the polymer is a copolymer of N-isopropylacrylamide and acrylic acid, and
the organic acid is acrylic acid.
11 . A substrate processing method comprising:
a processing film forming step in which a processing liquid is supplied to a front surface of a substrate and the processing liquid on the front surface of the substrate is solidified or cured to form a processing film on the front surface of the substrate;
an etching facilitating step in which the processing film is subjected to etching function developing processing to facilitate etching at a surface layer portion of the substrate by the processing film;
an etching reducing step in which the processing film is subjected to etching function eliminating processing to reduce the etching at the surface layer portion of the substrate by the processing film in a state that the processing film is kept on the substrate; and
a processing film removing step in which a removing liquid is supplied to the front surface of the processing film, thereby removing the processing film from the front surface of the substrate; wherein
the processing film removing step includes a peeling/removing step in which the processing film is peeled from the front surface of the substrate by the removing liquid to remove the processing film from the front surface of the substrate.
12 . The substrate processing method according to claim 11 , wherein
in the processing film forming step, the processing film is formed which contains a low solubility component in a solid state and a high solubility component in a solid state which is higher in solubility with respect to the removing liquid than the low solubility component, and
the peeling/removing step includes a step in which the high solubility component is selectively dissolved in the removing liquid, with the low solubility component kept in a solid state, thereby peeling the processing film from the front surface of the substrate.
13 . The substrate processing method according to claim 11 , wherein
etching is made at the surface layer portion of the substrate to form etching residue which is held by the processing film, and
the processing film removing step includes a step in which the etching residue is removed together with the processing film in a state that the etching residue is held by the processing film.
14 . A substrate processing method comprising:
a processing film forming step in which a processing liquid is supplied to a front surface of a substrate and the processing liquid on the front surface of the substrate is solidified or cured to form a processing film on the front surface of the substrate;
an etching facilitating step in which the processing film is subjected to etching function developing processing to facilitate etching at a surface layer portion of the substrate by the processing film; and
an etching reducing step in which the processing film is subjected to etching function eliminating processing to reduce the etching at the surface layer portion of the substrate by the processing film in a state that the processing film is kept on the substrate; wherein
a trench in a circular shape in a plan view which depresses the front surface of the substrate is formed in the substrate,
the trench has a bottom wall and a side wall which is connected to the bottom wall and extends in a depth direction of the trench,
the side wall has a bottom wall side portion which is connected to the bottom wall and an opening side portion which demarcates an opening of the trench, and
the processing film forming step includes a step of forming the processing film that covers the bottom wall side portion of the side wall and the bottom wall.
15 . A substrate processing apparatus comprising:
a processing liquid supplying unit that includes a processing liquid nozzle which supplies a processing liquid to a front surface of a substrate;
a processing film forming unit by which the processing liquid on the front surface of the substrate is solidified or cured to form a processing film on the front surface of the substrate;
a pH-adjusting liquid supplying unit that includes a pH-adjusting liquid nozzle which supplies to the front surface of the substrate a pH-adjusting liquid to adjust the pH in the processing film so as to be acidic or basic;
a neutralizing liquid supplying unit that includes a neutralizing liquid nozzle which supplies to the front surface of the substrate a neutralizing liquid to bring the pH in the processing film close to neutral; and
a controller which controls the processing liquid supplying unit, the processing film forming unit, the pH-adjusting liquid supplying unit, and the neutralizing liquid supplying unit; wherein
the controller is programmed so as to execute a processing film forming step in which the processing liquid is supplied from the processing liquid supplying unit to the front surface of the substrate, and the processing liquid on the front surface of the substrate is solidified or cured by the processing film forming unit to form a processing film on the front surface of the substrate,
an etching facilitating step in which the pH-adjusting liquid is supplied from the pH-adjusting liquid supplying unit to the front surface of the substrate to adjust the pH in the processing film so as to be acidic or basic, thereby facilitating etching at a surface layer portion of the substrate by the processing film, and an etching reducing step in which the neutralizing liquid is supplied from the neutralizing liquid supplying unit to the front surface of the substrate to bring the pH in the processing film closer to neutral than the pH in the processing film which has been adjusted by the pH-adjusting liquid, thereby reducing the etching at the surface layer portion of the substrate in a state that the processing film is kept on the substrate.