Granted Patent B1

US 12,333,624 · App. 18/098,667 · Granted Jun 17, 2025

Inventors: Alastair M. Reed (Lake Oswego, OR); Kristyn R. Falkenstern (Portland, OR)

Assignee: Digimarc Corporation

G06T1/005B41F23/08B41M3/10G06T1/0028G06T2201/0065G06T2201/0202

Abstract

Claims (12)

1. An image processing method comprising:

obtaining a first gloss value corresponding to a layer comprising a matte or gloss topcoat flooded over a substrate or color;

obtaining a second gloss value corresponding to the substrate or color;

determining a relationship between the first gloss value and the second gloss value to determine signal robustness of a sparse mark signal pattern provided on the substrate or color with the matte or gloss topcoat.

2. An image processing method comprising:

obtaining a gloss value corresponding to a sparse mark pattern relative to a substrate or color, the sparse mark pattern printed on a substrate using a matte or gloss topcoat, the sparse mark pattern comprising a plurality of printed dots;

using the gloss value to determine whether the plurality of printed dots are printed correctly.

3. An image processing method comprising:

for each of a plurality of substrates or colors, obtaining a first gloss value corresponding to a layer comprising a matte or gloss topcoat flooded over a substrate or color;

for each of the plurality of substrates or colors, obtaining a second gloss value corresponding to the substrate or color;

for each of the plurality of substrates or colors, determining a gray level for the layer comprising a matte or gloss topcoat flooded over a substrate or color; and

determining a relationship between the first gloss values and the second gloss values and determined gray levels to predict signal robustness of a sparse mark signal pattern provided on a substrate or color with the matte or gloss topcoat.

Assignments (3)

Continuity (3)

References Cited (195)