Method and apparatus for supplying improved gas flow to a processing volume of a processing chamber
The present disclosure generally provides methods of providing at least metastable radical molecular species and/or radical atomic species to a processing volume of a process chamber during an electronic device fabrication process, and apparatus related thereto. In one embodiment, the apparatus is a gas injection assembly disposed between a remote plasma source and a process chamber. The gas injection assembly includes a body, a dielectric liner disposed in the body that defines a gas mixing volume, a first flange to couple the gas injection assembly to a process chamber, and a second flange to couple the gas injection assembly to the remote plasma source. The gas injection assembly further includes one or more gas injection ports formed through the body and the liner.
1 . A substrate processing system, comprising:
a substrate process chamber;
a gas inlet conduit coupled to a gas inlet of the process substrate process chamber;
a mixing plate coupled to the gas inlet conduit with an elliptical opening in the mixing plate that registers with, and fluidly couples with, the gas inlet conduit, the mixing plate defining a plane, and the elliptical opening in the mixing plate formed perpendicular to the plane and defined by a wall, wherein the mixing plate comprises:
a plurality of gas inlets formed in an outside edge of the mixing plate;
a first gas path including;
a first gas source conduit disposed in the mixing plate and connected to a first gas inlet of the plurality of gas inlets;
a first gas passage formed within the mixing plate and fluidly coupled to the gas inlet conduit by a corresponding first opening formed in the wall; and
a second gas passage formed within the mixing plate and fluidly coupled to the gas inlet conduit by a corresponding second opening formed in the wall;
a first passage coupling the first gas passage and the second gas passage to the first gas source conduit; and
a second gas path including:
a second gas source conduit disposed in the mixing plate and connected to a second gas inlet of the plurality of gas inlets;
a third gas passage formed within the mixing plate and fluidly coupled to the gas inlet conduit by a corresponding third opening formed in the wall; and
a fourth gas passage formed within the mixing plate and fluidly coupled to the gas inlet conduit by a corresponding fourth opening formed in the wall;
a second passage coupling the third gas passage and the fourth gas passage to second gas source conduit, wherein the first gas path and the second gas path are opposite each other and are disposed in a common plane; and
a remote plasma source fluidly coupled to the elliptical opening in the mixing plate by a remote plasma conduit; and
a gas source fluidly coupled to the first gas inlet and second gas inlet.
2 . The substrate processing system of claim 1 , wherein the first gas passage and the second gas passage are parallel.
3 . The substrate processing system of claim 2 , wherein the mixing plate has a central axis and the first gas passage and the second gas passage are on the same side of the central axis.
4 . The substrate processing system of claim 2 , wherein the mixing plate has a central axis, and wherein the first gas passage and the second gas passage are on opposite sides of the central axis.
5 . A gas injection assembly, comprising:
a mixing plate with an outside edge having a plurality of gas inlets formed in the outside edge, a mixing plate opening formed through the mixing plate perpendicular to a major plane defined by the mixing plate, wherein the mixing plate opening is an elliptical opening and is defined by a wall and a plurality of gas openings are formed through the wall, wherein a plurality of gas paths fluidly couples each gas inlet of the plurality of gas inlets to a corresponding gas opening in the wall, wherein a first gas path of the plurality of gas paths includes: a first gas passage is disposed in the mixing plate, the first gas passage coupling a second gas passage of the plurality of gas passages and a third gas passage of the plurality of gas passages to a first gas inlet of the plurality of gas inlets, and a second gas path of the plurality of gas paths includes: a fourth gas passage is disposed in the mixing plate, the fourth gas passage coupling a fifth gas passage of the plurality of gas passages and a sixth gas passage of the plurality of gas passages to a second gas inlet of the plurality of gas inlets, wherein the first gas path and the second gas path are opposite each other and are disposed in a common plane.
6 . The gas injection assembly of claim 5 , wherein the mixing plate comprises a plurality of quadrants, wherein the plurality of quadrants are defined by a first axis of the mixing plate and a second axis that is perpendicular to the first axis and intersects the first axis at a center of the mixing plate, wherein a first quadrant of the plurality of quadrants is adjacent to a second quadrant along the first axis, a third quadrant is adjacent to the second quadrant along the second axis, and a fourth quadrant is adjacent to the first quadrant along the first axis and adjacent to the third quadrant along the second axis, and wherein a first half of the mixing plate is defined by the first quadrant and the second quadrant and a second half of the mixing plate is defined by the third quadrant and the fourth quadrant, and wherein each half of the mixing plate has at least one of the plurality of gas passages.
7 . The gas injection assembly of claim 6 , wherein at least one quadrant of the plurality of quadrants does not have a gas passage of the plurality of gas passages.
8 . The gas injection assembly of claim 6 , wherein:
the first gas inlet and the first gas passage are located in the first half of the mixing plate,
each of the first gas passage, the second gas passage and the third gas passage is located in the first half of the mixing plate and is fluidly coupled to a corresponding gas opening of the plurality of gas openings;
the second gas inlet located in the second half of the mixing plate;
the fourth gas passage fluidly coupled to the second gas inlet and located in the second half of the mixing plate;
the fifth gas passage fluidly coupled to the fourth gas passage; and
the sixth gas passage fluidly coupled to the fourth gas passage, wherein each of the fourth gas passage and fifth gas passage are fluidly coupled to a corresponding gas opening of the plurality of gas openings.
9 . The gas injection assembly of claim 6 , wherein:
the fourth gas passage is fluidly coupled to the first gas passage, wherein each of the second gas passage, the third gas passage, and the fourth gas passage is in the first half of the mixing plate and fluidly coupled to a corresponding gas opening of the plurality of gas openings in the wall, and wherein the third gas passage is disposed between the second gas passage and the fourth gas passage and is on the first axis;
the second gas inlet of the plurality of gas inlets and a passage on the second half of the mixing plate;
the fifth gas passage fluidly coupled to the fourth gas passage;
the sixth gas passage fluidly coupled to the fifth gas passage in the second half of the mixing plate, the sixth gas passage aligned with the third gas passage along the first axis; and
a seventh gas passage fluidly coupled to the fifth gas passage in the second half of the mixing plate, wherein each of the sixth and seventh gas passages and is fluidly coupled to a corresponding gas opening of the plurality of gas openings.
10 . The gas injection assembly of claim 9 , wherein:
each of the second gas passage and third gas passage is fluidly coupled to a different gas opening of the plurality of gas openings;
the fourth gas passage fluidly coupled to the second gas inlet, wherein the fourth gas passage extends from the third quadrant to the fourth quadrant;
the fifth gas passage located in the third quadrant and fluidly coupled to the fourth gas passage; and
the sixth gas passage located in the third quadrant and fluidly coupled to the fourth gas passage, wherein each of the fifth gas passage and sixth gas passage is fluidly coupled to a different gas opening of the plurality of gas openings.
11 . The gas injection assembly of claim 10 , wherein the second gas passage and the third gas passage are perpendicular to the first gas passage, and wherein the gas passages of the first quadrant are not aligned along a common axis with the gas passages of the third quadrant.
12 . The gas injection assembly of claim 6 , wherein:
the second inlet is formed in the outside edge of the mixing plate along the first axis;
the fourth gas passage of the plurality of gas passages is fluidly coupled to the second inlet, wherein the fourth gas passage is located in the third quadrant;
the fifth gas passage is located in the third quadrant and fluidly coupled to the fourth gas passage; and
the sixth gas passage located in the third quadrant and fluidly coupled to the fourth gas passage, wherein each of the fifth and sixth gas passages is fluidly coupled to a different gas opening of the plurality of gas openings.
13 . The gas injection assembly of claim 6 , wherein:
the first gas passage extends from the first quadrant to the second quadrant;
the second gas passage is located in the first quadrant;
the third gas passage is located in the second quadrant;
the fourth gas passage is fluidly coupled to the fifth gas passage located in the first quadrant;
the sixth gas passage is located along the first axis fluidly coupled to the fourth gas passage; and
a seventh gas passage is located in the second quadrant, wherein each of the fourth gas passage, the fifth gas passage, and the sixth gas passage are coupled to a different gas opening of the plurality of gas openings.
14 . The gas injection assembly of claim 13 , wherein:
the second gas inlet is formed in the outside edge of the mixing plate and located on the first axis;
an eighth gas passage of the plurality of gas passages extends from the third quadrant to the fourth quadrant and is coupled to the second gas inlet;
a ninth gas passage is located in the third quadrant and fluidly coupled to the eighth gas passage and a gas opening of the plurality of gas openings; and
a tenth gas passage located in the fourth quadrant that is fluidly coupled to the eighth gas passage and a gas opening of the plurality of gas openings, wherein the ninth and the tenth gas passages are formed equidistant from the first axis.
15 . The gas injection assembly of claim 13 , wherein:
an eighth gas passage of the plurality of gas passages extends from the third quadrant to the fourth quadrant and is coupled to a second gas inlet formed in the outside edge of the mixing plate;
a ninth gas passage in the fourth quadrant is fluidly coupled to the eighth gas passage;
a tenth gas passage extends from the third quadrant to the fourth quadrant and is fluidly coupled to the ninth gas passage;
an eleventh gas passage extends along the first axis and is fluidly coupled to a one of the gas openings of the plurality of gas openings; and
a twelfth gas passage in the third quadrant is fluidly coupled to the tenth gas passage and one of the gas openings of the plurality of gas openings.
16 . A gas injection assembly, comprising:
a mixing plate defined by a plurality of quadrants and an outside edge;
a plurality of gas inlets formed in the outside edge;
a mixing plate opening formed perpendicularly through a plane defined parallel to the mixing plate, wherein the opening is an elliptical opening and a first axis is parallel to the plane, wherein the opening is defined by a wall and a plurality of gas openings are formed through the wall; and
a plurality of gas paths fluidly coupling each gas inlet of the plurality of gas inlets to a corresponding gas opening of the plurality of gas openings, a first gas path of the plurality of gas paths includes: at least a first gas passage of the plurality of gas passages and a second gas passage of the plurality of gas passages are coupled to a first gas inlet of the plurality of gas inlets by a first passage within the mixing plate, and a first gas path of the plurality of gas paths includes: at least a third gas passage of the plurality of gas passages and a fourth gas passage of the plurality of gas passages are coupled to a second gas inlet of the plurality of gas inlets by a second passage within the mixing plate, wherein the first gas path and the second gas path are opposite each other and are disposed in a common plane.
17 . The gas injection assembly of claim 16 , further comprising:
a first quadrant of the plurality of quadrants adjacent to a second quadrant along the first axis;
a third quadrant adjacent to the second quadrant along a second axis;
a fourth quadrant adjacent to the first quadrant along the second axis and adjacent to the third quadrant along the first axis, wherein a first half of the mixing plate is defined by the first quadrant and the second quadrant and a second half of the mixing plate is defined by the third quadrant and the fourth quadrant, wherein the first gas passage is defined in the first half of the mixing plate and the second gas passage is defined in the second half of the mixing plate;
wherein the first passage comprises a first portion and a second portion, wherein the first portion is perpendicular to the first gas passage and extends from the first quadrant to the second quadrant, and the second portion is located in the second quadrant at an angle from 120 degrees to about 150 degrees relative to the first portion;
the fourth gas passage fluidly coupled to the first portion of the third gas passage, aligned with the first axis, and coupled to a first gas opening of the plurality of gas openings; and
a fifth gas passage fluidly coupled to the second portion of the third gas passage and coupled to a second gas opening of the plurality of gas openings.
18 . The gas injection assembly of claim 17 , wherein the fifth gas passage is perpendicular to the second portion of the first passage.
19 . The gas injection assembly of claim 18 , further comprising:
a sixth gas passage fluidly coupled to the second gas passage, wherein the sixth gas passage comprises a first portion that extends from the third quadrant to the fourth quadrant and a second portion formed in the fourth quadrant.
20 . The gas injection assembly of claim 19 , further comprising:
a seventh gas passage fluidly coupled to the second portion of the sixth gas passage and coupled to a third gas opening of the plurality of gas openings; and
an eighth gas passage that is fluidly coupled to the first portion of the sixth gas passage, aligned with the first axis, and coupled to a gas opening of the plurality of gas openings.