Semiconductor package with routing patch and method of fabricating the semiconductor package
Methods and systems for a semiconductor package with high routing density routing patch are disclosed and may include a semiconductor die bonded to a substrate and a high routing density patch bonded to the substrate and to the semiconductor die, wherein the high routing density patch comprises a denser trace line density than the substrate. The high routing density patch can be a silicon-less-integrated module (SLIM) patch, comprising a BEOL portion, and can be TSV-less. Metal contacts may be formed on a second surface of the substrate. A second semiconductor die may be bonded to the substrate and to the high routing density patch. The high routing density patch may provide electrical interconnection between the semiconductor die. The substrate may be bonded to a silicon interposer. The high routing density patch may have a thickness of 10 microns or less. The substrate may have a thickness of 10 microns or less.
1. An electronic device, comprising:
a patch comprising a patch top side, a patch bottom side, patch signal paths, one or more patch dielectric layers, and patch lateral sides between the patch top side and the patch bottom side;
a substrate comprising a substrate top side, a substrate bottom side, substrate signal paths, and one or more substrate dielectric layers, wherein the one or more substrate dielectric layers surround the one or more patch dielectric layers and the patch lateral sides;
a first semiconductor die over the substrate top side;
a second semiconductor die over the substrate top side;
conductive interconnects along the substrate bottom side, wherein the substrate signal paths provide first signal paths between one or more of the conductive interconnects and the first semiconductor die and provide second signal paths between one or more of the conductive interconnects and the second semiconductor die; and
wherein the patch signal paths provide signal paths between the first semiconductor die and the second semiconductor die.
2. The electronic device of claim 1 , wherein the patch signal paths have a denser signal routing density than the substrate signal paths.
3. The electronic device of claim 1 , wherein trace lines of the patch signal paths are thinner than trace lines of the substrate signal paths.
4. The electronic device of claim 1 , wherein the patch signal paths have a finer pitch than the substrate signal paths.
5. The electronic device of claim 1 , wherein each conductive interconnect vertically spans a respective patch lateral side.
6. The electronic device of claim 1 , comprising:
first die interconnects that couple the first semiconductor die and the second semiconductor die to the substrate signal paths via the substrate top side;
second die interconnects that couple the first semiconductor die and the second semiconductor die to the patch signal paths via the patch top side; and
non-conductive material that surrounds the first die interconnects and the second die interconnects.
7. The electronic device of claim 6 , wherein the second die interconnects are smaller than the first die interconnects.
8. The electronic device of claim 6 , wherein the patch signal paths have a denser signal routing density than the substrate signal paths.
9. The electronic device of claim 6 , wherein trace lines of the patch signal paths are thinner than trace lines of the substrate signal paths.
10. The electronic device of claim 6 , wherein the patch signal paths have a finer pitch than the substrate signal paths.
11. The electronic device of claim 6 , wherein each conductive interconnect vertically spans the patch.
12. A method of manufacturing an electronic device, the method comprising:
providing a substrate comprising a substrate top side, a substrate bottom side, substrate signal paths, and one or more substrate dielectric layers;
providing a patch comprising a patch top side, a patch bottom side, patch signal paths, one or more patch dielectric layers, and patch lateral sides between the patch top side and the patch bottom side, wherein the one or more substrate dielectric layers surround the one or more patch dielectric layers and the patch lateral sides;
providing a first semiconductor die over the substrate top side;
providing a second semiconductor die over the substrate top side;
providing conductive interconnects along the substrate bottom side, wherein the substrate signal paths provide first signal paths between one or more of the conductive interconnects and the first semiconductor die and provide second signal paths between one or more of the conductive interconnects and the second semiconductor die; and
wherein the patch signal paths provide signal paths between the first semiconductor die and the second semiconductor die.
13. The method of claim 12 , wherein the patch signal paths have a denser signal routing density than the substrate signal paths.
14. The method of claim 12 , wherein trace lines of the patch signal paths are thinner than trace lines of the substrate signal paths.
15. The method of claim 12 , wherein the patch signal paths have a finer pitch than the substrate signal paths.
16. The method of claim 12 , wherein each conductive interconnect vertically spans a respective patch lateral side.
17. The method of claim 12 , comprising:
providing first die interconnects that couple the first semiconductor die and the second semiconductor die to the substrate signal paths via the substrate top side;
providing second die interconnects that couple the first semiconductor die and the second semiconductor die to the patch signal paths via the patch top side; and
providing non-conductive material that surrounds the first die interconnects and the second die interconnects.
18. The method of claim 17 , wherein the second die interconnects are smaller than the first die interconnects.