IP Library Granted Patent US 12,469,324
Granted Patent B2
US 12,469,324 · App. 18/742,009 · Granted Nov 11, 2025

Semiconductor device with biofet and biometric sensors

Inventors: Ching-Hui Lin (Taichung, TW); Chun-Ren Cheng (Hsinchu, TW); Shih-Fen Huang (Jhubei, TW); Fu-Chun Huang (Zhubei, TW)
Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
G06V40/1306G01N27/4145H10D30/015H10N30/302
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,469,324
App. No.
18/742,009
Granted
Nov 11, 2025
Kind
B2
Abstract

The structure of a semiconductor device with an array of bioFET sensors, a biometric fingerprint sensor, and a temperature sensor and a method of fabricating the semiconductor device are disclosed. A method for fabricating the semiconductor device includes forming a gate electrode on a first side of a semiconductor substrate, forming a channel region between source and drain regions within the semiconductor substrate, and forming a piezoelectric sensor region on a second side of the semiconductor substrate. The second side is substantially parallel and opposite to the first side. The method further includes forming a temperature sensing electrode on the second side during the forming of the piezoelectric sensor region, forming a sensing well on the channel region, and binding capture reagents on the sensing well.

Claims (49)

1 . A semiconductor device, comprising:

a substrate comprising a first side and a second side opposite to the first side, wherein the substrate comprises a semiconductor layer;

a gate electrode disposed on the first side of the substrate;

source and drain regions disposed in the substrate;

a channel region disposed between the source region and the drain region; and

a piezoelectric sensor disposed on the second side of the substrate and adjacent to the gate electrode, wherein the piezoelectric sensor and the gate electrode are laterally separated from each other by a portion of the substrate.

2 . The semiconductor device of claim 1 , wherein the piezoelectric sensor comprises:

a bottom electrode disposed on the second side of the substrate;

first and second piezoelectric layers disposed on the bottom electrode; and

first and second top electrodes disposed on the first and second piezoelectric layers, respectively.

3 . The semiconductor device of claim 1 , wherein the piezoelectric sensor comprises:

a sensing layer comprising a high-k material; and

an array of sensing regions electrically isolated from each other by the sensing layer.

4 . The semiconductor device of claim 1 , wherein the piezoelectric sensor comprises:

a sensing layer comprising a high-k material; and

a coupling layer comprising a polymeric material disposed on the sensing layer.

5 . The semiconductor device of claim 1 , wherein the piezoelectric sensor comprises:

a sensing layer comprising a high-k material; and

a cover plate comprising a sapphire glass disposed on the sensing layer.

6 . The semiconductor device of claim 1 , further comprising an isolation layer disposed between the piezoelectric sensor and the substrate.

7 . The semiconductor device of claim 1 , wherein the piezoelectric sensor comprises:

an isolation layer disposed between the piezoelectric sensor and the substrate; and

an array of cavities in the substrate, wherein portions of the isolation layer are exposed in the array of cavities.

8 . The semiconductor device of claim 1 , further comprising first and second cavities in the substrate, wherein first and second sensing regions of the piezoelectric sensor are aligned with the first and second cavities, respectively.

9 . The semiconductor device of claim 1 , further comprising a sensing well with capture reagents disposed on the channel region.

10 . The semiconductor device of claim 1 , further comprising an array of resonators under the piezoelectric sensor.

11 . A semiconductor device, comprising:

a substrate;

a biological field effect transistor (bioFET), comprising:

a gate electrode disposed on a first side of the substrate,

source and drain regions disposed in the substrate, and

a channel region disposed between the source region and the drain region; and

a biometric sensor comprising first and second piezoelectric layers disposed on a second side of the substrate.

12 . The semiconductor device of claim 11 , wherein the biometric sensor further comprises an oxide layer surrounding the first and second piezoelectric layers.

13 . The semiconductor device of claim 11 , further comprising a temperature sensor disposed on the second side of the substrate, wherein a sensing electrode of the temperature sensor is coupled to an interface layer of the bioFET, and wherein the interface layer is configured to hold capture reagents.

14 . The semiconductor device of claim 11 , wherein the biometric sensor further comprises a metal electrode disposed on the second side of the substrate, and

wherein the first and second piezoelectric layers are disposed on the metal electrode.

15 . The semiconductor device of claim 11 , wherein the biometric sensor further comprises a polymeric layer disposed on the first and second piezoelectric layers.

16 . The semiconductor device of claim 11 , the biometric sensor further comprises a sapphire glass disposed on the first and second piezoelectric layers.

17 . A semiconductor device, comprising:

a substrate;

a gate electrode disposed on a first side of the substrate;

source and drain regions disposed in the substrate;

first and second piezoelectric regions disposed on a second side of the substrate;

a high-k dielectric layer disposed on and between the first and second piezoelectric regions, wherein materials of the high-k dielectric layer and the first and second piezoelectric regions are different from each other; and

a temperature sensing electrode disposed on the second side of the substrate.

18 . The semiconductor device of claim 17 , further comprising a metal layer disposed between the substrate and the first and second piezoelectric regions.

19 . The semiconductor device of claim 17 , further comprising first and second metal layers disposed on the first and second piezoelectric regions, respectively.

20 . The semiconductor device of claim 17 , further comprising a coupling layer comprising a polymeric material disposed on the high-k dielectric layer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 5, 2024
From: LIN, CHING-HUI; CHENG, CHUN-REN; HUANG, SHIH-FEN; HUANG, FU-CHUN
To: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Reel/Frame 068855/0568 →
Continuity (3)
Continuation 17234641 · Apr 19, 2021
Division 16656882 · Oct 18, 2019
Related Publication 20240331439A1 · Oct 3, 2024
References Cited (50)
US 6234031B1 · Suga · 2001 [cited by applicant]
US 7013031B2 · Kim et al. · 2006 [cited by applicant]
US 8349167B2 · Rothberg et al. · 2013 [cited by applicant]
US 8682592B2 · Rabinowitz et al. · 2014 [cited by applicant]
US 9096899B2 · Eltoukhy et al. · 2015 [cited by applicant]
US 9212977B2 · Tang et al. · 2015 [cited by applicant]
US 9329173B2 · Shachar et al. · 2016 [cited by applicant]
US 9340830B2 · Lipson et al. · 2016 [cited by applicant]
US 9341529B2 · Nishikage et al. · 2016 [cited by applicant]
US 9347946B2 · Mikolajczyk et al. · 2016 [cited by applicant]
US 9447411B2 · Chenchik · 2016 [cited by applicant]
US 10048220B2 · Lin et al. · 2018 [cited by applicant]
US 10101295B2 · Chang et al. · 2018 [cited by applicant]
US 10161901B2 · Huang et al. · 2018 [cited by applicant]
US 10876997B2 · Huang et al. · 2020 [cited by applicant]
US 10984211B1 · Lin et al. · 2021 [cited by applicant]
US 20080220557A1 · Mainguet · 2008 [cited by applicant]
US 20120060756A1 · Ookawara et al. · 2012 [cited by applicant]
US 20130105868A1 · Kalnitsky et al. · 2013 [cited by applicant]
US 20140264467A1 · Cheng et al. · 2014 [cited by applicant]
US 20140264468A1 · Cheng et al. · 2014 [cited by applicant]
US 20140361901A1 · Hoefer · 2014 [cited by applicant]
US 20150129937A1 · Chen et al. · 2015 [cited by applicant]
US 20150353920A1 · Enderle et al. · 2015 [cited by applicant]
US 20150355129A1 · Knopfmacher · 2015 [cited by applicant]
US 20160040245A1 · Dittamore · 2016 [cited by applicant]
US 20160054312A1 · Goldsmith · 2016 [cited by applicant]
US 20160116434A1 · Mwakikunga · 2016 [cited by applicant]
US 20160209355A1 · Tseng et al. · 2016 [cited by applicant]
US 20160334362A1 · Liu · 2016 [cited by examiner]
US 20170343498A1 · Kalnitsky et al. · 2017 [cited by applicant]
US 20180059050A1 · Chen · 2018 [cited by examiner]
US 20190033252A1 · Huang et al. · 2019 [cited by applicant]
US 20190294845A1 · De Foras et al. · 2019 [cited by applicant]
CN 102403465A · 2012 [cited by applicant]
CN 104051512A · 2014 [cited by applicant]
CN 107037094A · 2017 [cited by applicant]
CN 107064271A · 2017 [cited by applicant]
CN 109307701A · 2019 [cited by applicant]
JP 2012177686A · 2012 [cited by applicant]
JP 2014228494A · 2014 [cited by applicant]
TW 201911423A · 2019 [cited by applicant]
Office Action issued in related Chinese Application 202010870002, dated Mar. 20, 2024; 11 pages. [cited by applicant]
Mironov et al. “Sensing small molecules by nascent RNA: a mechanism to control transcription in bacteria.” Cell 111.5 (2002): 747-756. [cited by applicant]
Winkler et al. “Thiamine derivatives bind messenger RNAs directly to regulate bacterial gene expression.” Nature 419.6910 (2002): 952-956. [cited by applicant]
Brzozka et al. “Enhanced performance of potassium ChemFETs by optimization of a polysiloxane membrane,” Sensors and Actuators B. Chemical 18, 3 8-41. [cited by applicant]
Sibbald et al. “A miniature flow-through cell with a four-function ChemFET integrated circuit for simultaneous measurements of potassium, hydrogen, calcium and sodium ions,” Analytica ChimicaActa. 159, 47-62 (1984). [cited by applicant]
Cobben et al. “Transduction of selective recognition of heavy metal ions by chemically modified field effect transistors (ChemFETs),” Journal of the American Chemical Society 114, 10573-10582 (1992). [cited by applicant]
Humayun et al. “Visual perception in a blind subject with a chronic microelectronic retinal prosthesis,” Vision Research 43, 2573-2581 (2003). [cited by applicant]
Normann et al. “A neural interface for a cortical vision prosthesis,” Vision Research 39, 2577-2587 (1999). [cited by applicant]