IP Library Granted Patent US 7,016,236
Granted Patent B2
US 7,016,236 · App. 11/101,504 · Granted Mar 21, 2006

Semiconductor memory device and defect remedying method thereof

Assignees: Hitachi, Ltd.; Hitachi ULSI Systems Co., Ltd.
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Quick Facts
Patent No.
US 7,016,236
App. No.
11/101,504
Granted
Mar 21, 2006
Kind
B2
Abstract

A semiconductor memory device formed on a semiconductor chip comprises a plurality of first memory arrays, a plurality of second memory arrays, a first voltage generator, and a plurality of first bonding pads. The semiconductor chip is divided into a first rectangle region, a second rectangle region, and a third rectangle region and the third rectangle region is arranged between the first rectangle region and the second rectangle region. The plurality of first memory arrays are formed in the first rectangle region. The plurality of second memory arrays are formed in the second rectangle region. The voltage generator and the plurality of first bonding pads are arranged in the third rectangle region. The plurality of first bonding pads are arranged between the first rectangle region and the voltage generator and no bonding pads are arranged between the voltage generator and the plurality of second memory arrays.

Claims (33)

1. A semiconductor memory device formed on a semiconductor chip comprising:

a plurality of first memory arrays;

a plurality of second memory arrays;

a first voltage generator;

a plurality of first bonding pads;

wherein the semiconductor chip is divided into a first rectangle region, a second rectangle region, and a third rectangle region,

wherein the third rectangle region is arranged between the first rectangle region and the second rectangle region,

wherein the plurality of first memory arrays are formed in the first rectangle region,

wherein the plurality of second memory arrays are formed in the second rectangle region,

wherein the voltage generator and the plurality of first bonding pads are arranged in the third rectangle region,

wherein the plurality of first bonding pads are arranged between the first rectangle region and the voltage generator,

wherein no bonding pads are arranged between the voltage generator and the plurality of second memory arrays.

2. A semiconductor memory device according to claim 1 ,

wherein the first voltage generator is a substrate voltage generator.

3. A semiconductor memory device according to claim 2 , further comprising:

a second voltage generator generating an internal voltage which is supplied to the first and second memory array; and

a plurality of second bonding pads,

wherein the plurality of second bonding pads are arranged between the second voltage generator and the first rectangle region, and

wherein no bonding pads are arranged between the second voltage generator and the second rectangle region.

4. A semiconductor memory device according to claim 1 , further comprising:

a second voltage generator generating an internal voltage which is supplied to the first and second memory array; and

a plurality of second bonding pads,

wherein the plurality of second bonding pads are arranged between the second voltage generator and the first rectangle region, and

wherein no bonding pads are arranged between the second voltage generator and the second rectangle region.

5. A semiconductor memory device according to claim 1 , wherein the semiconductor device is DRAM.

6. A semiconductor memory device according to claim 2 , wherein the semiconductor device is DRAM.

7. A semiconductor memory device according to claim 3 , wherein the semiconductor device is DRAM.

8. A semiconductor memory device according to claim 4 , wherein the semiconductor device is DRAM.

9. A semiconductor memory device according to claim 1 ,

wherein the first rectangle region, the third rectangle region, and the second rectangle region are sequentially arranged in a first direction,

wherein the plurality of first bonding pads are arranged in a second direction which is across the first direction.

10. A semiconductor memory device according to claim 9 ,

wherein the plurality of first bonding pads are arranged in two rows in the second direction.

Assignments (3)
MERGER Recorded Jun 11, 2009
From: HITACHI ULSI ENGINEERING CORPORATION
To: HITACHI ULSI SYSTEMS CO., LTD.
Reel/Frame 022804/0711 →
CHANGE OF NAME Recorded Jun 10, 2009
From: HITACHI VLSI ENGINEERING CORPORATION
To: HITACHI ULSI ENGINEERING CORPORATION
Reel/Frame 022804/0659 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 10, 2009
From: HITACHI ULSI SYSTEMS CO., LTD.
To: HITACHI, LTD.
Reel/Frame 022804/0672 →
Priority Claims (4)
JP 12-277132 · Nov 1, 1988 · national
JP 12-279239 · Nov 7, 1988 · national
JP 11-14423 · Jan 24, 1989 · national
JP 11-65840 · Mar 20, 1989 · national
Continuity (12)
Continuation 1068326000 · Oct 14, 2003
Continuation 1025498000 · Sep 26, 2002
Continuation 1000003200 · Dec 4, 2001
Continuation 0971426800 · Nov 17, 2000
Continuation 0954791700 · Apr 11, 2000
Continuation 0936120300 · Jul 27, 1999
Continuation 0861838100 · Mar 19, 1996
Continuation 0845541100 · May 31, 1995
Continuation 0815962100 · Dec 1, 1993
Division 0789957200 · Jun 18, 1992
Continuation 0742490400 · Oct 18, 1989
Related Publication 20050179058A1 · Aug 18, 2005