Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography
A method of generating a mask design having optical proximity correction features disposed therein. The methods includes the steps of obtaining a desired target pattern having features to be imaged on a substrate; determining a first interference map based on the target pattern, which defines areas of constructive interference between at least one of the features to be imaged and a field area adjacent the at least one feature; placing a first set of assist features having a first phase in the mask design based on the areas of constructive interference defined by the first interference map; determining a second interference map based on the first set of assist features, which defines areas of constructive interference between assist features of the first set of assist features and a field area adjacent at least one of the assist features of the first set of assist features; and placing a second set of assist features having a second phase in the mask design based on the areas of constructive interference defined by the second interference map, wherein the first phase does not equal the second phase.
1. A method of generating a mask design having optical proximity correction features disposed therein, said method comprising the steps of:
obtaining a target pattern having features to be imaged on a substrate;
generating a first interference map based on said target pattern, said first interference map defining areas of constructive interference between at least one of said features to be imaged and a field area adjacent said at least one feature;
placing a first set of assist features having a first phase in the mask design based on the areas of constructive interference defined by said first interference map;
generating a second interference map based on said first set of assist features, said second interference map defining areas of constructive interference between assist features of said first set of assist features and a field area adjacent at least one of said assist features of said first set of assist features; and
placing a second set of assist features having a second phase in the mask design based on the areas of constructive interference defined by the second interference map, wherein said first phase does not equal said second phase.
2. The method of claim 1 , wherein each assist feature in said second set of assist features exhibits an 180° phase-shift relative to each assist feature in said first set of assist features.
3. The method of claim 1 , further comprising the step of defining an exclusion region which surrounds at least one feature in said target pattern,
wherein neither an assist feature from the first set of assist features nor an assist feature from the second set of assist features is positioned within the exclusion region.
4. The method of claim 1 , wherein the assist features in the first set of assist features enhance the printing of said features of the desired target and are disposed in constructive areas of interferences, and assist features in the second set of assist features negate constructive interference occurring between assist features contained in the first set of assist features.
5. The method of claim 1 , wherein the first interference map defines intensity levels of the field relative to the featured to be images, said first interference map being capable of representing both positive and negative values of intensity relative to a non-zero DC level,
wherein regions of the field having intensity values which are positive relative to said non-zero DC level correspond to constructive areas of interference, and regions of the field having intensity values which are negative relative to said non-zero DC level correspond to destructive areas of interference areas.
6. The method of claim 1 , wherein the second interference map defines intensity levels of the field relative to the first set of assist features, said second interference map being capable of representing both positive and negative values of intensity relative to a non-zero DC level,
wherein regions of the field having intensity values which are positive relative to said non-zero DC level correspond to constructive areas of interference, and regions of the field having intensity values which are negative relative to said non-zero DC level correspond to destructive areas of interference areas.
7. A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate files corresponding to a mask for use in an lithographic imaging process, said generation of said files comprising the steps of:
obtaining a target pattern having features to be imaged on a substrate;
generating a first interference map based on said target pattern, said first interference map defining areas of constructive interference between at least one of said features to be imaged and a field area adjacent said at least one feature;
placing a first set of assist features having a first phase in the mask design based on the areas of constructive interference defined by said first interference map;
generating a second interference map based on said first set of assist features, said second interference map defining areas of constructive interference between assist features of said first set of assist features and a field area adjacent at least one of said assist features of said first set of assist features; and
placing a second set of assist features having a second phase in the mask design based on the areas of constructive interference defined by the second interference map, wherein said first phase does not equal said second phase.
8. The computer program product of claim 7 , wherein each assist feature in said second set of assist features exhibits an 180° phase-shift relative to each assist feature in said first set of assist features.
9. The computer program product of claim 7 , wherein said generator of said files further comprising the step of defining an exclusion region which surrounds at least one feature in said target pattern,
wherein neither an assist feature from the first set of assist features nor an assist feature from the second set of assist features is positioned within the exclusion region.
10. The computer program product of claim 7 , wherein the assist features in the first set of assist features enhance the printing of said features of the target and are disposed in constructive areas of interferences, and assist features in the second set of assist features negate constructive interference occurring between assist features contained in the first set of assist features.
11. The computer program product of claim 7 , wherein the first interference map defines intensity levels of the field relative to the featured to be images, said first interference map being capable of representing both positive and negative values of intensity relative to a non-zero DC level,
wherein regions of the field having intensity values which are positive relative to said non-zero DC level correspond to constructive areas of interference, and regions of the field having intensity values which are negative relative to said non-zero DC level correspond to destructive areas of interference areas.
12. The computer program product of claim 7 , wherein the second interference map defines intensity levels of the field relative to the first set of assist features, said second interference map being capable of representing both positive and negative values of intensity relative to a non-zero DC level,
wherein regions of the field having intensity values which are positive relative to said non-zero DC level correspond to constructive areas of interference, and regions of the field having intensity values which are negative relative to said non-zero DC level correspond to destructive areas of interference areas.