Semiconductor device and method of providing a thermal dissipation path through RDL and conductive via
A semiconductor device has a conductive via formed around a perimeter of the semiconductor die. First and second conductive layers are formed on opposite sides of the semiconductor die and thermally connected to the conductive via. An insulating layer is formed over the semiconductor die. A portion of the insulating layer is removed to expose the first conductive layer and a thermal dissipation region of semiconductor die. A thermal via is formed through the insulating layer to the first conductive layer. A thermally conductive layer is formed over the thermal dissipation region and thermal via. A thermal conduction path is formed from the thermal dissipation region through the thermally conductive layer, thermal via, first conductive layer, conductive via, and second conductive layer. The thermal conduction path terminates in an external thermal ground point. The thermally conductive layer provides shielding for electromagnetic interference.
1. A method of making a semiconductor device, comprising:
providing a semiconductor die;
forming first and second conductive vias around a perimeter of the semiconductor die;
forming first and second conductive layers on a front side of the semiconductor die, the first conductive layer being electrically connected between the first conductive via and a contact pad of the semiconductor die, the second conductive layer being thermally connected to the second conductive via;
forming third and fourth conductive layers on a backside of the semiconductor die opposite the front side of the semiconductor die, the third conductive layer being electrically connected to the first conductive via, the fourth conductive layer being thermally connected to the second conductive via;
forming an insulating layer over the semiconductor die;
removing a portion of the insulating layer to expose the first and second conductive layers and a thermal dissipation region of semiconductor die;
forming a thermal via through the insulating layer to the second conductive layer; and
forming a thermally conductive layer over the insulating material and thermal dissipation region and thermal via.
2. The method of claim 1 , further including forming an under bump metallization over the first and second conductive layers.
3. The method of claim 1 , further including forming a thermal conduction path from the thermal dissipation region through the thermally conductive layer, thermal via, second conductive layer, second conductive via, and fourth conductive layer.
4. The method of claim 1 , further including forming an electrical conduction path from the contact pad through the first conductive layer, first conductive via, and third conductive layer.
5. The method of claim 1 , wherein the thermally conductive layer provides shielding for electromagnetic interference.
6. The method of claim 1 , further including:
stacking a plurality of the semiconductor die; and
forming a thermal conduction path from the thermal dissipation region through the thermally conductive layer, thermal via, second conductive layer, second conductive via, and fourth conductive layer of each semiconductor die.
7. The method of claim 1 , further including:
providing a substrate having a thermal ground point;
mounting the semiconductor die to the substrate; and
thermally connecting the fourth conductive layer to the thermal ground point.
8. A method of making a semiconductor device, comprising:
providing a semiconductor die;
forming a conductive via around a perimeter of the semiconductor die;
forming a first conductive layer on a front side of the semiconductor die, the first conductive layer being thermally connected to the conductive via;
forming a second conductive layer on a backside of the semiconductor die opposite the front side of the semiconductor die, the second conductive layer being thermally connected to the conductive via;
forming an insulating layer over the semiconductor die;
removing a portion of the insulating layer to expose a thermal dissipation region of semiconductor die;
forming a thermal via through the insulating layer to the first conductive layer; and
forming a thermally conductive layer over the thermal dissipation region and thermal via.
9. The method of claim 8 , further including forming an under bump metallization over the first conductive layer.
10. The method of claim 8 , further including forming a thermal conduction path from the thermal dissipation region through the thermally conductive layer, thermal via, first conductive layer, conductive via, and second conductive layer.
11. The method of claim 8 , wherein the thermal conductive layer provides shielding for electromagnetic interference.
12. The method of claim 8 , further including:
stacking a plurality of the semiconductor die; and
forming a thermal conduction path from the thermal dissipation region through the thermally conductive layer, thermal via, first conductive layer, conductive via, and second conductive layer of each semiconductor die.
13. The method of claim 8 , further including:
providing a substrate having a thermal ground point;
mounting the semiconductor die to the substrate; and
thermally connecting the second conductive layer to the thermal ground point.
14. A method of making a semiconductor device, comprising:
providing a semiconductor die;
forming a conductive via around a perimeter of the semiconductor die;
forming a first conductive layer on a front side of the semiconductor die, the first conductive layer being thermally connected to the conductive via; and
forming a thermally conductive layer over a thermal dissipation region of the semiconductor die, the semiconductor die having a thermal dissipation path from the thermal dissipation region through the thermally conductive layer, first conductive layer, and conductive via.
15. The method of claim 14 , further including:
forming a second conductive layer on a backside of the semiconductor die opposite the front side of the semiconductor die, the second conductive layer being thermally connected to the conductive via;
forming an insulating layer over the semiconductor die;
removing a portion of the insulating layer to expose the thermal dissipation region of the semiconductor die;
forming a thermal via through the insulating layer to the first conductive layer; and
forming the thermally conductive layer over the thermal dissipation region and thermal via.
16. The method of claim 15 , further including:
providing a substrate having a thermal ground point;
mounting the semiconductor die to the substrate; and
thermally connecting the second conductive layer to the thermal ground point.
17. The method of claim 14 , further including forming an under bump metallization over the first conductive layer.
18. The method of claim 14 , wherein the thermally conductive layer provides shielding for electromagnetic interference.
19. The method of claim 14 , further including:
stacking a plurality of the semiconductor die; and
forming a thermal conduction path from the thermal dissipation region through the thermally conductive layer, first conductive layer, and conductive via of each semiconductor die.