Wafer level laser marking system for ultra-thin wafers using support tape

1. A wafer level marking method comprising:

providing a wafer, a wafer frame, and a support tape;

mounting the wafer and the wafer frame on the support tape; and

marking the wafer directly by optical energy applied to a surface of the wafer through the support tape, wherein the marking occurs as a direct result of an interaction between the optical energy and the wafer.

2. The method as claimed in claim 1 further comprising:

placing a backgrinding tape on the wafer;

backgrinding the wafer; and

removing the backgrinding tape from the wafer after mounting the wafer on the support tape.

3. The method as claimed in claim 1 further comprising:

providing a computer controlled marking system; and

wherein:

marking the wafer includes marking the wafer using a laser under computer control.

4. The method as claimed in claim 1 further comprising attaching electrical interconnects to the wafer.

5. The method as claimed in claim 1 further comprising singulating the wafer after marking.

6. A wafer level marking method comprising:

providing a wafer and a wafer frame to support the wafer;

mounting the wafer and the wafer frame on a support tape; and

marking the wafer by application of optical energy to a surface of the wafer through the support tape, wherein the support tape enables laser marking without incinerating the support tape, and wherein the marking occurs as a direct result of an interaction between the optical energy and the wafer.

7. The method as claimed in claim 6 further comprising:

placing a backgrinding tape on the wafer, wherein the backgrinding tape protects the active side of the wafer;

backgrinding the wafer further comprises removing as much as 96% of the wafer material; and

removing the backgrinding tape from the wafer after mounting the wafer on the support tape.

8. The method as claimed in claim 6 further comprising:

providing a computer controlled marking system comprising providing a control device, a camera and a laser source; and

wherein:

marking the wafer includes marking the wafer using a laser controlled by a computer, wherein the back side of the wafer is marked with identifying information.

9. The method as claimed in claim 6 further comprising attaching electrical interconnects to the wafer, wherein the electrical interconnects are wire bond, flip-chip, or wafer level chip scale.

10. The method as claimed in claim 6 further comprises singulating the wafer after marking, wherein the support tape remains intact during marking the wafer and singulating the wafer.

11. A wafer level marking system comprising:

a wafer;

a wafer frame configured to fit around the wafer;

a support tape for supporting the wafer and the wafer frame; and

a marking system for marking the wafer by application of optical energy to a surface of the wafer through the support tape, wherein the marking the wafer occurs as a direct result of an interaction between the optical energy and the wafer.

12. The system as claimed in claim 11 further comprising:

a backgrinding tape on the wafer for wafer backgrinding, and the backgrinding tape is more easily removable from the wafer than the support tape.

13. The system as claimed in claim 11 further comprising:

a computer controlled marking system; and

a laser controlled by the computer controlled marking system for marking the wafer.

14. The system as claimed in claim 11 further comprising:

electrical interconnects attached to the wafer.

15. The system as claimed in claim 11 wherein the wafer is marked without damage to the support tape.

16. The system as claimed in claim 11 wherein the marking system is for forming marks on the wafer without incinerating the support tape.

17. The system as claimed in claim 16 further comprises:

a backgrinding tape on the wafer for protecting the active side of the wafer, and the backgrinding tape is more easily removable from the wafer than the support tape.

18. The system as claimed in claim 16 wherein:

the surface is a back side of the wafer; and

the wafer is marked with identifying information marked on the back side of the wafer.

19. The system as claimed in claim 16 further comprising electrical interconnects attached to the wafer, wherein the electrical interconnects are wire bond, flip-chip, or wafer level chip scale.

20. The system as claimed in claim 16 wherein the wafer is laser marked without incineration of the support tape.