Article including thermal interface element and method of preparation
An article and method of forming the article is disclosed. The article includes a heat source, a heat-sink, and a thermal interface element having a plurality of freestanding nanosprings, a top layer, and a bottom layer. The nanosprings, top layer, and the bottom layers of the article include at least one inorganic material. The article can be prepared using a number of methods including the methods such as GLAD and electrochemical deposition.
1. An article comprising:
a heat source;
a heat-sink; and
a thermal interface element disposed in thermal communication with the heat source and the heat-sink through at least one solder layer, the thermal interface element comprising a top layer having an accommodative CTE with the heat source; a bottom layer having an accommodative CTE with the heat-sink; and a plurality of freestanding nanosprings between the top layer and bottom layers,
wherein the plurality of nanosprings consists essentially of inorganic material, and wherein the top layer, and the bottom layers have a thickness less than about 100 μm and comprise copper, aluminum, silver, platinum, tungsten, silicon, zinc oxide, silicon nitride, molybdenum, tantalum, or any combinations of the foregoing.
2. The article of claim 1 , wherein the inorganic material comprises a metallic material, an alloy, a ceramic, or a composite.
3. The article of claim 2 , wherein the inorganic material comprises copper, aluminum, silver, gold, platinum, tungsten, silicon, zinc oxide, silicon nitride, titanium, molybdenum, tantalum, or any combinations of the foregoing.
4. The article of claim 1 , wherein the plurality of nano springs has a median spring diameter in a range from about 10 nm to about 2 μm.
5. The article of claim 1 , wherein the thermal interface element comprises at least about 10 8 nanosprings/cm 2 .
6. The article of claim 1 , wherein the nano springs have a kinked structure.
7. The article of claim 1 , wherein the nano springs have a non-uniform diameter as a function of length.
8. The article of claim 7 , wherein the nanosprings have a cone structured diameter.
9. The article of claim 1 , wherein the heat source is an electronic device.
10. The article of claim 9 , wherein the electronic device comprises a semiconductor device.
11. The article of claim 1 , wherein at least one bonding layer exists between the top layer and the heat source.
12. The article of claim 1 , wherein at least one bonding layer exists between the bottom layer and the heat-sink.
13. A method of preparing an article comprising:
providing a heat source;
providing a heat-sink; and
disposing a thermal interface element in thermal communication with the heat source and the heat-sink using at least one solder layer, the thermal interface element comprising a top layer having an accommodative CTE with the heat source; a bottom layer having an accommodative CTE with the heat-sink; and a plurality of freestanding nanosprings between the top and bottom layers,
wherein the plurality of nanosprings consists essentially of inorganic material, and wherein the top and the bottom layers have a thickness less than about 100 μm and comprise copper, aluminum, silver, platinum, tungsten, silicon, zinc oxide, silicon nitride, molybdenum, tantalum, or any combinations of the foregoing.
14. The method of claim 13 , wherein disposing the thermal interface element comprises:
disposing a plurality of nanosprings on at least one side of a support;
disposing the top or bottom layer on at least one end of the plurality of nanosprings; and
disposing the thermal interface element in between the heat source and the heat-sink using the at least one solder layer.
15. The method of claim 14 , wherein disposing the plurality of nano springs is by a deposition method comprising chemical vapor deposition (CVD), physical vapor deposition (PVD), glancing angle deposition (GLAD), electrochemical deposition, plasma deposition, sol-gel deposition, or any combination thereof.
16. The method of claim 15 , wherein the deposition method comprises GLAD having a glancing angle in the range from about 78° to about 87°.
17. The method of claim 15 , wherein the deposition method comprises electrochemical deposition conducted over a template.
18. The method of claim 17 , wherein the deposition method comprises
providing a support;
positioning a mask over the support;
electrochemically depositing the nanospring materials over the mask to create a deposit of plurality of nano springs; and
removing the mask leaving the deposit behind,
wherein the mask comprises a porous membrane having tortuous pathways through the membrane thickness.
19. The method of claim 14 , wherein disposing the top or bottom layer is by a deposition method comprising chemical vapor deposition (CVD), physical vapor deposition (PVD), glancing angle deposition (GLAD), electro chemical deposition, plasma deposition, sol-gel deposition, or any combination thereof.
20. The method of claim 19 , wherein the deposition method comprises GLAD having a glancing angle in the range from about 0° to about 10°.
21. The method of claim 14 , wherein the top and bottom layers have a density greater than about 90%.
22. The method of claim 13 , wherein disposing the thermal interface element comprises:
disposing a plurality of nanosprings on at least two sides of a support;
disposing the cap on at least one end of the nanosprings; and
disposing the thermal interface element in between the heat source and the heat-sink using the at least one solder layer.
23. The method of claim 1 , wherein the solder layer comprises indium.