Method for low temperature wafer bonding and bonded structure
A low temperature wafer bonding method and a bonded structure are provided. The method includes: providing a first substrate having a plurality of metal pads and a first dielectric layer close to the metal pads, where the metal pads and the first dielectric layer are on a top surface of the first substrate; providing a second substrate having a plurality of semiconductor pads and a second dielectric layer close to the semiconductor pads, where the semiconductor pads and the second dielectric layer are on a top surface of the second substrate; disposing at least one of the metal pads in direct contact with at least one of the semiconductor pads, and disposing the first dielectric layer in direct contact with the second dielectric layer; and bonding the metal pads with the semiconductor pads, and bonding the first dielectric layer with the second dielectric layer.
1. A low temperature wafer bonding method, comprising:
providing a first substrate comprising a plurality of metal pads and a first dielectric layer close to the metal pads, where the metal pads and the first dielectric layer are on a top surface of the first substrate;
providing a second substrate having a plurality of semiconductor pads and a second dielectric layer close to the semiconductor pads, where the semiconductor pads and the second dielectric layer are on a top surface of the second substrate;
disposing at least one of the metal pads in direct contact with at least one of the semiconductor pads, and disposing the first dielectric layer in direct contact with the second dielectric layer; and
under pressure applied to the first substrate and the second substrate, bonding the metal pads with the semiconductor pads, and bonding the first dielectric layer with the second dielectric layer.
2. The method according to claim 1 , wherein the step of disposing at least one of the metal pads in direct contact with at least one of the semiconductor pads, and disposing the first dielectric layer in direct contact with the second dielectric layer comprises:
keeping the first substrate in parallel with the second substrate, and aligning the first substrate with the second substrate optically, and matching up in position the plurality of metal pads with the plurality of semiconductor pads; and
disposing the first dielectric layer in direct contact with the second dielectric layer under vacuum.
3. The method according to claim 1 , wherein the step of bonding the metal pads with the semiconductor pads comprises:
under the pressure applied to the first substrate and the second substrate, heating the first substrate and the second substrate to 100° C.-450° C. so that the metal pads protrude its original surface due to thermal expansion, bonding the metal pads with the semiconductor pads, and bonding the first dielectric layer with the second dielectric layer.
4. The method according to claim 1 , wherein the metal pads have a size less than that of the semiconductor pads, and when the metal pads and the semiconductor pads are in contact, each of the metal pad's surface falls into that of a corresponding semiconductor pad, and portions of the semiconductor pads beyond the metal pads are in contact and bonded with the first dielectric layer.
5. The method according to claim 1 , wherein material of the metal pads comprises aluminum, gold, nickel, or an alloy thereof.
6. The method according to claim 1 , wherein material of the semiconductor pads comprises germanium, silicon, or an alloy thereof.
7. The method according to claim 1 , further comprising chemical mechanical polishing bonding area of the first dielectric layer and the second dielectric layer to produce a surface having roughness less than about 3.0 nm.
8. The method according to claim 1 , wherein the metal pads and the semiconductor pads have a thickness less than about 2000 nm.
9. The method according to claim 1 , wherein the metal pads have a top surface flush with or lower than that of the first dielectric layer, and the semiconductor pads have a top surface flush with or lower than that of the second dielectric layer.
10. The method according to claim 1 , wherein the metal pads have a top surface protruding from that of the first dielectric layer, and the semiconductor pads are formed in grooves in the second dielectric layer and have a top surface lower than that of the second dielectric layer; or the semiconductor pads have a top surface protruding from that of the second dielectric layer, and the metal pads are formed in grooves in the first dielectric layer and have a top surface lower than that of the first dielectric layer.
11. A bonded structure of wafers formed with the method in claim 1 , comprising: a first substrate comprising a plurality of metal pads, a first dielectric layer close to the metal pads, a second substrate comprising a plurality of semiconductor pads, and a second dielectric layer close to the semiconductor pads, wherein the metal pads and the first dielectric layer are on a top surface of the first substrate, and the semiconductor pads and the second dielectric layer are on a top surface of the second substrate; the metal pads and the semiconductor pads are aligned correspondingly, disposed in contact and bonded with each other; and the first dielectric layer and the second dielectric layer are aligned correspondingly, disposed in contact and bonded with each other.
12. The bonded structure according to claim 11 , wherein the bonded structure comprises a seamless bonded interface.
13. The bonded structure according to claim 11 , wherein the metal pads have a size less than that of the semiconductor pads and each of the metal pad's surface falls into that of a corresponding semiconductor pad, and portions of the semiconductor pads beyond the metal pads are brought into contact and bonded with the first dielectric layer.
14. The bonded structure according to claim 11 , wherein the wafer comprises at least one PN junction.