Germanium photodetector
A method for forming a photodetector device includes forming an insulator layer on a substrate, forming a germanium (Ge) layer on the insulator layer and a portion of the substrate, forming a second insulator layer on the Ge layer, patterning the Ge layer, forming a capping insulator layer on the second insulator layer and a portion of the first insulator layer, heating the device to crystallize the Ge layer resulting in an single crystalline Ge layer, implanting n-type ions in the single crystalline Ge layer, heating the device to activate n-type ions in the single crystalline Ge layer, and forming electrodes electrically connected to the single crystalline n-type Ge layer.
1. A method for forming a photodetector device, the method including:
forming a Ge layer on a substrate, wherein holes define a majority carrier of the Ge layer;
forming an insulator layer on the Ge layer;
implanting n-type ions in the Ge layer;
activating the n-type ions in the Ge layer to form a single crystalline n-type Ge layer; and
forming electrodes electrically connected to the single crystalline n-type Ge layer.
2. The method of claim 1 , wherein the single crystalline Ge layer is formed by an epitaxial process.
3. The method of claim 1 , wherein the method further includes forming a germanide region between the electrodes and the single crystalline n-type Ge layer.
4. The method of claim 3 , wherein forming the germanide regions comprises depositing a layer of metal on an exposed portion of the single crystalline n-type Ge layer and heating the device to diffuse the metal into the single crystalline n-type Ge layer.
5. The method of claim 3 , wherein the metal is selected from the group consisting of titanium, nickel, palladium, platinum, tantalum, copper, tungsten, cobalt, zirconium, and molybdenum.
6. The method of claim 4 , wherein the layer of metal includes titanium.
7. The method of claim 4 , wherein the device is heated to diffuse the metal at a temperature greater than 300 ° C.
8. The method of claim 1 , wherein the method further includes:
determining whether the device is an n-type device following the activation of the n-type ions in the single crystalline Ge layer; and
implanting additional n-type ions in the single crystalline Ge layer and activating the additional n-type ions in the single crystalline Ge layer responsive to determining that the device is not an n-type device.
9. The method of claim 1 , wherein patterning the first insulator layer comprises anisotropically etching.
10. The method of claim 1 , wherein the electrodes are formed from titanium, copper or a metallic alloy.
11. The method of claim 1 , wherein the substrate is a single crystalline silicon material.
12. The method of claim 1 , wherein the insulator layer is silicon nitride or silicon oxide.
13. The method of claim 1 , wherein the insulator layer is formed by a low pressure chemical vapor deposition process.
14. The method of claim 1 , wherein the insulator layer is formed by a plasma enhanced chemical vapor deposition process.