Low resistance and defect free epitaxial semiconductor material for providing merged FinFETs
A gate structure is formed straddling a first portion of a plurality of semiconductor fins that extend upwards from a topmost surface of an insulator layer. A dielectric spacer is formed on sidewalls of the gate structure and straddling a second portion of the plurality of semiconductor fins. Epitaxial semiconductor material portions that include a non-planar bottommost surface and a non-planar topmost surface are grown from at least the exposed sidewalls of each semiconductor fin not including the gate structure or the gate spacer to merge adjacent semiconductor fins. A gap is present beneath epitaxial semiconductor material portions and the topmost surface of the insulator layer. A second epitaxial semiconductor material is formed on the epitaxial semiconductor material portions and thereafter the second epitaxial semiconductor material is converted into a metal semiconductor alloy.
1. A method of forming a semiconductor device comprising:
providing a plurality of semiconductor fins extending upward from a topmost surface of an insulator layer;
forming a gate structure straddling a first portion of each semiconductor fin of said plurality semiconductor fins;
forming a dielectric spacer on a sidewall of each side of said gate structure and straddling a second portion of each semiconductor fin of said plurality of semiconductor fins;
merging an adjacent pair of semiconductor fins of said plurality of semiconductor fins, wherein said merging comprises forming an epitaxial semiconductor material portion comprising a first epitaxial semiconductor material and having a non-planar bottommost surface and a non-planar topmost surface on at least sidewalls of each exposed semiconductor fin portion;
forming a second epitaxial semiconductor material that comprises a different semiconductor material than said first epitaxial semiconductor material on said bottommost surface and topmost surface of each epitaxial semiconductor material portion; and
converting said second epitaxial semiconductor material into a metal semiconductor alloy.
2. The method of claim 1 , wherein said forming said epitaxial semiconductor material portions comprises an epitaxial growth process that is performed at a pressure from 1 mtorr to 750 torr.
3. The method of claim 2 , wherein epitaxial growth process is performed at a temperature from 200° C. to 900° C.
4. The method of claim 2 , wherein each epitaxial semiconductor material portion is triangular in shape and having a base in direct physical contact with an exposed semiconductor fin portion of each semiconductor fin of said plurality of semiconductor fins, and two slanted sidewalls that converge at a tip.
5. The method of claim 2 , wherein each epitaxial semiconductor material portion is diamond shaped having two slanted sidewalls that converge at a tip located over an exposed semiconductor fin portion of each semiconductor fin, and two other slanted sidewalls that converge at a tip located over the gap.
6. The method of claim 2 , wherein a dopant is introduced during said epitaxial growth of said epitaxial semiconductor material portions.
7. The method of claim 2 , wherein a dopant is introduced after said epitaxial growth of said epitaxial semiconductor material portions.
8. The method of claim 1 , wherein each epitaxial semiconductor material portion comprises a silicon germanium alloy, and the second epitaxial semiconductor material comprises silicon.
9. The method of claim 1 , wherein said converting said second epitaxial semiconductor material into a metal semiconductor alloy comprises:
forming a metal semiconductor alloy forming metal on said second epitaxial semiconductor material; and
annealing.
10. The method of claim 9 , wherein said metal semiconductor alloy forming metal is selected from one of Ni, Pt, Pd, Ti, W, and Co.
11. The method of claim 1 , wherein said forming said gate structure comprises formation of a functional gate structure comprises a gate dielectric portion and an overlying gate conductor portion.
12. The method of claim 1 , wherein said forming said gate structure comprising formation of a sacrificial gate structure, and wherein said sacrificial gate structure is replaced with a functional gate structure after said merging said adjacent pair of semiconductor fins of said plurality of semiconductor fins.
13. The method of claim 1 , providing said plurality of semiconductor fins comprises:
providing a semiconductor-on-insulator substrate comprising, from bottom to top, a handle substrate, an insulator layer, and a topmost semiconductor layer; and
patterning said topmost semiconductor layer.
14. The method of claim 13 , wherein said patterning comprises a sidewall image transfer process.
15. The method of claim 1 , wherein prior to said merging said adjacent pair of semiconductor fins of said plurality of semiconductor fins, source/drain regions are formed into exposed portions of each semiconductor fin.
16. The method of claim 15 , wherein said source/drain regions are formed by gas phase doping, plasma doping or a gas cluster ion beam process.