IP Library Granted Patent US 9,425,382
Granted Patent B2
US 9,425,382 · App. 14/949,869 · Granted Aug 23, 2016

Sensor protective coating

Inventors: Dubravka Bilic (Scottsdale, AZ); Stephen R. Hooper (Mesa, AZ)
Assignee: FREESCALE SEMICONDUCTOR, INC.
H01L41/0973B81B7/0035B81B7/0058B81C1/00825B81C1/00896H01L41/0926B81B2201/0264B81C2201/053
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Quick Facts
Patent No.
US 9,425,382
App. No.
14/949,869
Filed
Nov 23, 2015
Granted
Aug 23, 2016
Kind
B2
Examiner
LEE, CALVIN
Art Unit
2896
USPC
257/419
Abstract

A microelectromechanical system (MEMS) sensor device includes a substrate, a support structure supported by the substrate, a membrane supported by the support structure and spaced from the substrate, and a polymer layer covering the membrane.

Claims (37)

1. A microelectromechanical system (MEMS) sensor device comprising:

a substrate;

a support structure supported by the substrate;

a membrane supported by the support structure and spaced from the substrate;

a polymer layer covering the membrane; and

a dielectric layer that laterally surrounds the membrane and the support structure, wherein the dielectric layer establishes a hermetically sealed cavity between the membrane and the substrate.

2. The MEMS sensor device of claim 1 , wherein the polymer layer covers the dielectric layer.

3. The MEMS sensor device of claim 1 , further comprising a reference cell covered by the dielectric layer so that ambient pressure does not deflect a membrane of the reference cell.

4. The MEMS sensor device of claim 1 , wherein the sensor device is not enclosed by a cap.

5. The MEMS sensor device of claim 1 , further comprising a bond pad supported by the substrate, wherein the polymer layer is patterned to not cover the bond pad.

6. The MEMS sensor device of claim 1 , wherein the polymer layer comprises a photoresist material.

7. The MEMS sensor device of claim 1 , wherein the polymer layer comprises a parylene material or a polyimide material.

8. The MEMS sensor device of claim 1 , further comprising a reference cell completely covered by the dielectric layer.

9. The MEMS sensor device of claim 8 , wherein the polymer layer covers the reference cell.

10. A microelectromechanical system (MEMS) sensor device comprising:

a substrate;

a support structure supported by the substrate;

a membrane supported by the support structure and spaced from the substrate, the membrane having a periphery;

a dielectric layer disposed along the periphery of the membrane to define an opening in the dielectric layer over the membrane; and

a polymer layer disposed in the opening and covering the membrane;

wherein the dielectric layer establishes a hermetically sealed cavity between the membrane and the substrate.

11. The MEMS sensor device of claim 10 , wherein the polymer layer covers the dielectric layer.

12. The MEMS sensor device of claim 10 , wherein the dielectric layer laterally surrounds the membrane and the support structure.

13. The MEMS sensor device of claim 10 , further comprising a reference cell covered by the dielectric layer so that ambient pressure does not deflect a membrane of the reference cell.

14. The MEMS sensor device of claim 10 , further comprising a reference cell completely covered by the dielectric layer.

15. A microelectromechanical system (MEMS) sensor device comprising:

a substrate;

a support structure supported by the substrate;

a membrane supported by the support structure and spaced from the substrate by a gap, the membrane having a periphery;

a dielectric layer disposed along the periphery of the membrane to seal the gap, the dielectric layer having an opening over the membrane; and

a polymer layer disposed in the opening;

wherein the polymer layer is in contact with the membrane and the dielectric layer to cover the membrane and the dielectric layer, and

wherein the dielectric layer establishes a hermetically sealed cavity between the membrane and the substrate.

16. The MEMS sensor device of claim 15 , wherein the dielectric layer laterally surrounds the membrane and the support structure.

17. The MEMS sensor device of claim 15 , wherein the polymer layer comprises a photoresist material.

18. The MEMS sensor device of claim 15 , wherein the polymer layer comprises a parylene material or a polyimide material.

19. The MEMS sensor device of claim 15 , further comprising a reference cell completely covered by the dielectric layer.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 23, 2026
From: NXP USA, INC.
To: STMICROELECTRONICS INTERNATIONAL N.V.
Reel/Frame 075219/0798 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050744/0097 →
MERGER Recorded Jan 3, 2017
From: FREESCALE SEMICONDUCTOR, INC.
To: NXP USA, INC.
Reel/Frame 041144/0363 →
SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 039138/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 4, 2015
From: BILIC, DUBRAVKA; HOOPER, STEPHEN R.
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037210/0788 →
Continuity (2)
Division 14069633 · Nov 1, 2013
Related Publication 20160075553A1 · Mar 17, 2016