Chip package using interposer substrate with through-silicon vias
A microelectronic package includes an interposer with through-silicon vias that is formed from a semiconductor substrate and one or more semiconductor dies coupled to the interposer. A first signal redistribution layer formed on the first side of the interposer electrically couples the one or more semiconductor dies to the through-silicon vias. A second redistribution layer is formed on a second side of the interposer, and is electrically coupled to the through-silicon vias. In some embodiments, a mold compound is connected to an edge surface of the interposer and is configured to stiffen the microelectronic package.
1. A microelectronic package, comprising:
an interposer that is formed from a semiconductor substrate and includes a plurality of through-silicon vias;
a semiconductor die coupled to a first surface of the interposer;
a mold compound connected to an edge surface of the interposer and configured to stiffen the microelectronic package; and
a packaging substrate coupled to a second surface of the interposer, wherein the first surface of the interposer is opposite to the second surface of the interposer.
2. The microelectronic package of claim 1 , wherein the mold compound is formed between the semiconductor die and the first surface of the interposer.
3. The microelectronic package of claim 2 , further comprising one or more passive devices that are coupled to the first surface of the interposer and disposed within about 1 mm of the semiconductor die.
4. The microelectronic package of claim 2 , wherein the mold compound is formed via an injection molding process.
5. The microelectronic package of claim 1 , further comprising a second semiconductor die coupled to the first surface of the interposer.
6. The microelectronic package of claim 5 , wherein the mold compound is formed between the first semiconductor die and the second semiconductor die.
7. The microelectronic package of claim 1 , further comprising a signal redistribution layer that is formed on the second surface of the interposer and is electrically coupled to the plurality of through-silicon vias.
8. The microelectronic package of claim 7 , wherein a portion of the signal distribution layer is formed on the mold compound connected to the edge surface of the interposer.
9. The microelectronic package of claim 1 , wherein the mold compound is connected to a surface of the packaging substrate.
10. The microelectronic package of claim 1 , further comprising one or more semiconductor dies that are coupled to the packaging substrate.
11. The microelectronic package of claim 10 , wherein the mold compound is connected to an edge surface of one of the one or more semiconductor dies coupled to the packaging substrate.
12. The microelectronic package of claim 10 , wherein the mold compound is formed between at least one of the semiconductor dies coupled to the packaging substrate and the packaging substrate.
13. The microelectronic package of claim 12 , further comprising one or more passive devices that are coupled to the substrate and disposed within about 1 mm of at least one of the semiconductor dies coupled to the packaging substrate.