IP Library Granted Patent US 10,032,931
Granted Patent B2
US 10,032,931 · App. 13/243,244 · Granted Jul 24, 2018

Switching element

Inventors: Hideo Hosono (Kanagawa, JP); Masahiro Hirano (Tokyo, JP); Hiromichi Ota (Aichi, JP); Toshio Kamiya (Kanagawa, JP); Kenji Nomura (Tokyo, JP)
Assignees: JAPAN SCIENCE AND TECHNOLOGY AGENCY; CANON KABUSHIKI KAISHA; TOKYO INSTITUTE OF TECHNOLOGY
H01L29/78696C23C14/0021C23C14/086C23C14/28C23C14/3414H01L21/02554H01L21/02565H01L21/02631H01L27/1225H01L29/7869H01L29/78693
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Quick Facts
Patent No.
US 10,032,931
App. No.
13/243,244
Granted
Jul 24, 2018
Kind
B2
Abstract

A switching element of LCDs or organic EL displays which uses a thin film transistor device, includes: a drain electrode, a source electrode, a channel layer contacting the drain electrode and the source electrode, wherein the channel layer comprises indium-gallium-zinc oxide having a transparent, amorphous state of a composition equivalent to InGaO 3 (ZnO) m (wherein m is a natural number less than 6) in a crystallized state, and the channel layer has a semi-insulating property represented by an electron mobility of more than 1 cm 2 /(V·sec) and an electron carrier concentration is less than 10 18 /cm 3 , a gate electrode, and a gate insulating film positioned between the gate electrode and the channel layer.

Claims (11)

1. A switching thin film transistor device for driving LCDs or organic EL displays, comprising:

a drain electrode;

a source electrode;

a channel layer contacting the drain electrode and the source electrode,

wherein the channel layer comprises indium-gallium-zinc oxide having a transparent, amorphous state of a composition equivalent to InGaO 3 (ZnO) m (wherein m is a natural number less than 6) in a crystallized state, and

the channel layer has a semi-insulating property represented by an electron mobility measured at room temperature of more than 1 cm 2 /(V·sec) and an electron carrier concentration less than 10 16 /cm 3 determined by Hall-effect measurement at room temperature;

a gate electrode; and

a gate insulating film positioned between the gate electrode and the channel layer.

2. The switching thin film transistor device according to claim 1 , wherein the gate insulating film contains one or more selected from Al 2 O 3 , Y 2 O 3 , or HfO 2 .

3. The switching thin film transistor device according to claim 1 , wherein the substrate is one of a glass plate, a plastic plate or a plastic film.

4. The switching thin film transistor device according to claim 1 , wherein the device is one of a staggered or inverted staggered structure.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 2, 2013
From: JAPAN SCIENCE AND TECHNOLOGY AGENCY
To: JAPAN SCIENCE AND TECHNOLOGY AGENCY; CANON KABUSHIKI KAISHA; TOKYO INSTITUTE OF TECHNOLOGY
Reel/Frame 030728/0079 →
Priority Claims (2)
JP 2004-071477 · Mar 12, 2004 · national
JP 2004-325938 · Nov 10, 2004 · national
Continuity (3)
Division 12504116 · Jul 16, 2009
Division 10592431
Related Publication 20120012838A1 · Jan 19, 2012
Cited By (1)
US 12,300,702