IP Library › Granted Patent US 10,121,435
Granted Patent B2
US 10,121,435 · App. 15/062,265 · Granted Nov 6, 2018

Driver circuit, display device, and electronic device

Inventor: Atsushi Umezaki (Kanagawa, JP)
Assignee: Semiconductor Energy Laboratory Co., Ltd.
G09G3/3677G09G3/3648G11C19/184G11C19/28H01L27/1225G09G2300/0809G09G2310/0286
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Quick Facts
Patent No.
US 10,121,435
App. No.
15/062,265
Granted
Nov 6, 2018
Kind
B2
Abstract

To suppress malfunctions in a shift register circuit. A shift register having a plurality of flip-flop circuits is provided. The flip-flop circuit includes a transistor 11 , a transistor 12 , a transistor 13 , a transistor 14 , and a transistor 15 . When the transistor 13 or the transistor 14 is turned on in a non-selection period, the potential of a node A is set, so that the node A is prevented from entering into a floating state.

Claims (223)

1. A semiconductor device comprising:

a first transistor, a second transistor, a third transistor, a fourth transistor, a fifth transistor, and a sixth transistor;

wherein one of the first transistor, the second transistor, the third transistor, the fourth transistor, the fifth transistor, and the sixth transistor comprises a channel formation region that comprises an oxide semiconductor,

wherein one of a source and a drain of the first transistor is electrically connected to one of a source and a drain of the second transistor,

wherein the one of the source and the drain of the first transistor is electrically connected to one of a source and a drain of the third transistor,

wherein one of a source and a drain of the fourth transistor is electrically connected to one of a source and a drain of the fifth transistor,

wherein one of a source and a drain of the sixth transistor is electrically connected to the one of the source and the drain of the fifth transistor,

wherein the other of the source and the drain of the second transistor is electrically connected to the other of the source and the drain of the third transistor,

wherein the other of the source and the drain of the fourth transistor is electrically connected to the other of the source and the drain of the sixth transistor,

wherein a gate of the first transistor is electrically connected to the one of the source and the drain of the fourth transistor,

wherein a gate of the second transistor is electrically connected to a gate of the fifth transistor,

wherein a gate of the third transistor is electrically connected to a gate of the sixth transistor,

wherein the other of the source and the drain of the first transistor is electrically connected to a first wiring capable of supplying a first signal,

wherein a potential of the gate of the second transistor is changed depending on a potential of a second wiring capable of supplying a second signal, and

wherein the second wiring is not electrically connected to the first wiring.

2. The semiconductor device according to claim 1 , wherein the gate of the third transistor is electrically connected to a wiring capable of supplying clock signal.

3. The semiconductor device according to claim 1 , wherein the oxide semiconductor is InGaZnO.

4. The semiconductor device according to claim 1 , wherein a gate of the fourth transistor is electrically connected to the other of the source and the drain of the fourth transistor.

5. An electronic device comprising:

the semiconductor device according to claim 1 , and

an operation key, a speaker, an antenna, or a battery.

6. A semiconductor device comprising:

a pixel;

a driver circuit electrically connected to the pixel,

wherein the driver circuit comprises a first transistor, a second transistor, a third transistor, a fourth transistor, a fifth transistor, and a sixth transistor;

wherein one of the first transistor, the second transistor, the third transistor, the fourth transistor, the fifth transistor, and the sixth transistor comprises a channel formation region that comprises an oxide semiconductor,

wherein one of a source and a drain of the first transistor is electrically connected to one of a source and a drain of the second transistor,

wherein the one of the source and the drain of the first transistor is electrically connected to one of a source and a drain of the third transistor,

wherein one of a source and a drain of the fourth transistor is electrically connected to one of a source and a drain of the fifth transistor,

wherein one of a source and a drain of the sixth transistor is electrically connected to the one of the source and the drain of the fifth transistor,

wherein the other of the source and the drain of the second transistor is electrically connected to the other of the source and the drain of the third transistor,

wherein the other of the source and the drain of the fourth transistor is electrically connected to the other of the source and the drain of the sixth transistor,

wherein a gate of the first transistor is electrically connected to the one of the source and the drain of the fourth transistor,

wherein a gate of the second transistor is electrically connected to a gate of the fifth transistor,

wherein a gate of the third transistor is electrically connected to a gate of the sixth transistor,

wherein the other of the source and the drain of the first transistor is electrically connected to a first wiring capable of supplying a first signal,

wherein a potential of the gate of the second transistor is changed depending on a potential of a second wiring capable of supplying a second signal, and

wherein the second wiring is not electrically connected to the first wiring.

7. The semiconductor device according to claim 6 , wherein the gate of the third transistor is electrically connected to a wiring capable of supplying clock signal.

8. The semiconductor device according to claim 6 , wherein the oxide semiconductor is InGaZnO.

9. The semiconductor device according to claim 6 , wherein a gate of the fourth transistor is electrically connected to the other of the source and the drain of the fourth transistor.

10. An electronic device comprising:

the semiconductor device according to claim 6 , and

an operation key, a speaker, an antenna, or a battery.

11. A semiconductor device comprising:

a driver circuit,

wherein the driver circuit comprises a first transistor, a second transistor, a third transistor, a fourth transistor, a fifth transistor, a sixth transistor, a seventh transistor, and an eighth transistor,

wherein one of the first transistor, the second transistor, the third transistor, the fourth transistor, the fifth transistor, the sixth transistor, the seventh transistor, and the eighth transistor comprises a channel formation region that comprises an oxide semiconductor,

wherein one of a source and a drain of the first transistor is directly connected to one of a source and a drain of the second transistor,

wherein the one of the source and the drain of the first transistor is directly connected to one of a source and a drain of the third transistor,

wherein one of a source and a drain of the fourth transistor is directly connected to one of a source and a drain of the fifth transistor,

wherein one of a source and a drain of the sixth transistor is directly connected to the one of the source and the drain of the fifth transistor,

wherein the other of the source and the drain of the fourth transistor is directly connected to the other of the source and the drain of the sixth transistor,

wherein a gate of the first transistor is directly connected to the one of the source and the drain of the fourth transistor,

wherein a gate of the second transistor is directly connected to a gate of the fifth transistor,

wherein a gate of the third transistor is directly connected to a gate of the sixth transistor,

wherein one of a source and a drain of the seventh transistor is directly connected to the gate of the second transistor,

wherein a gate of the seventh transistor is directly connected to the gate of the first transistor,

wherein one of a source and a drain of the eighth transistor is directly connected to the gate of the first transistor,

wherein the other of the source and the drain of the second transistor, the other of the source and the drain of the third transistor, the other of the source and the drain of the fifth transistor, the other of the source and the drain of the seventh transistor, and the other of the source and the drain of the eighth transistor are directly connected to one another,

wherein the other of the source and the drain of the first transistor is electrically connected to a first wiring capable of supplying a first signal,

wherein a potential of the gate of the second transistor is changed depending on a potential of a second wiring capable of supplying a second signal, and

wherein the second wiring is not electrically connected to the first wiring.

12. The semiconductor device according to claim 11 ,

wherein the gate of the third transistor is directly connected to a wiring capable of supplying clock signal,

wherein a capacitor is provided between the gate of the first transistor and the one of the source and the drain of the first transistor,

wherein the one of the source and the drain of the first transistor is directly connected to a pixel.

13. The semiconductor device according to claim 12 , wherein the oxide semiconductor is InGaZnO.

14. The semiconductor device according to claim 12 ,

wherein a gate of the fourth transistor is electrically connected to the other of the source and the drain of the fourth transistor,

wherein a capacitor is electrically connected to the gate of the second transistor.

15. An electronic device comprising:

the semiconductor device according to claim 12 , and

an operation key, a speaker, an antenna, or a battery.

16. The semiconductor device according to claim 11 , wherein the oxide semiconductor is InGaZnO.

17. The semiconductor device according to claim 11 ,

wherein a gate of the fourth transistor is electrically connected to the other of the source and the drain of the fourth transistor,

wherein a capacitor is electrically connected to the gate of the second transistor.

18. An electronic device comprising:

the semiconductor device according to claim 11 , and

an operation key, a speaker, an antenna, or a battery.

19. A semiconductor device comprising:

a driver circuit,

wherein the driver circuit comprises a first transistor, a second transistor, a third transistor, a fourth transistor, a fifth transistor, a sixth transistor, a seventh transistor, and an eighth transistor,

wherein one of the first transistor, the second transistor, the third transistor, the fourth transistor, the fifth transistor, the sixth transistor, the seventh transistor, and the eighth transistor comprises a channel formation region that comprises an amorphous silicon,

wherein one of a source and a drain of the first transistor is directly connected to one of a source and a drain of the second transistor,

wherein the one of the source and the drain of the first transistor is directly connected to one of a source and a drain of the third transistor,

wherein one of a source and a drain of the fourth transistor is directly connected to one of a source and a drain of the fifth transistor,

wherein one of a source and a drain of the sixth transistor is directly connected to the one of the source and the drain of the fifth transistor,

wherein the other of the source and the drain of the fourth transistor is directly connected to the other of the source and the drain of the sixth transistor,

wherein a gate of the first transistor is directly connected to the one of the source and the drain of the fourth transistor,

wherein a gate of the second transistor is directly connected to a gate of the fifth transistor,

wherein a gate of the third transistor is directly connected to a gate of the sixth transistor,

wherein a gate of the fourth transistor is directly connected to the other of the source and the drain of the fourth transistor,

wherein one of a source and a drain of the seventh transistor is directly connected to the gate of the second transistor,

wherein a gate of the seventh transistor is directly connected to the gate of the first transistor,

wherein one of a source and a drain of the eighth transistor is directly connected to the gate of the first transistor,

wherein the other of the source and the drain of the second transistor, the other of the source and the drain of the third transistor, the other of the source and the drain of the fifth transistor, the other of the source and the drain of the seventh transistor, and the other of the source and the drain of the eighth transistor are directly connected to one another,

wherein one of the first transistor, the second transistor, the third transistor, the fourth transistor, the fifth transistor, the sixth transistor, and the seventh transistor comprises:

a gate electrode;

a gate insulating film over the gate electrode;

a first semiconductor layer over the gate insulating film;

a second semiconductor layer over the first semiconductor layer, the second semiconductor layer comprising a first region, a second region, a third region, a fourth region, and a fifth region;

a third semiconductor layer over the second semiconductor layer;

a fourth semiconductor layer over the second semiconductor layer;

a source electrode over the third semiconductor layer; and

a drain electrode over the fourth semiconductor layer,

wherein the first region overlaps with the first semiconductor layer, does not overlap with the third semiconductor layer, and does not overlap with the fourth semiconductor layer,

wherein the second region is located between the first semiconductor layer and the third semiconductor layer, and overlaps with the source electrode,

wherein the third region is located between the first semiconductor layer and the third semiconductor layer, and does not overlap with the source electrode,

wherein the fourth region is located between the first semiconductor layer and the fourth semiconductor layer, and overlaps with the drain electrode,

wherein the fifth region is located between the first semiconductor layer and the fourth semiconductor layer, and does not overlap with the drain electrode,

wherein a thickness of the second semiconductor layer in the first region is smaller than a thickness of the second semiconductor layer in the second region,

wherein a thickness of the second semiconductor layer in the first region is smaller than a thickness of the second semiconductor layer in the third region,

wherein a thickness of the second semiconductor layer in the first region is smaller than a thickness of the second semiconductor layer in the fourth region, and

wherein a thickness of the second semiconductor layer in the first region is smaller than a thickness of the second semiconductor layer in the fifth region.

20. The semiconductor device according to claim 19 ,

wherein the gate of the third transistor is directly connected to a wiring capable of supplying clock signal,

wherein a capacitor is provided between the gate of the first transistor and the one of the source and the drain of the first transistor,

wherein the one of the source and the drain of the first transistor is directly connected to a pixel.

21. The semiconductor device according to claim 20 , wherein a capacitor is electrically connected to the gate of the second transistor.

22. An electronic device comprising:

the semiconductor device according to claim 20 , and

an operation key, a speaker, an antenna, or a battery.

23. The semiconductor device according to claim 19 , wherein a capacitor is electrically connected to the gate of the second transistor.

24. An electronic device comprising:

the semiconductor device according to claim 19 , and

an operation key, a speaker, an antenna, or a battery.

25. The semiconductor device according to claim 19 ,

wherein the other of the source and the drain of the first transistor is electrically connected to a first wiring capable of supplying a first signal,

wherein a potential of the gate of the second transistor is changed depending on a potential of a second wiring capable of supplying a second signal, and

wherein the second wiring is not electrically connected to the first wiring.

26. A semiconductor device comprising:

a first transistor, a second transistor, a third transistor, a fourth transistor, a fifth transistor, a sixth transistor, and a seventh transistor;

wherein one of the first transistor, the second transistor, the third transistor, the fourth transistor, the fifth transistor, the sixth transistor, and the seventh transistor comprises a channel formation region comprising an amorphous silicon,

wherein one of a source and a drain of the first transistor is electrically connected to one of a source and a drain of the second transistor,

wherein the one of the source and the drain of the first transistor is electrically connected to one of a source and a drain of the third transistor,

wherein one of a source and a drain of the fourth transistor is electrically connected to one of a source and a drain of the fifth transistor,

wherein one of a source and a drain of the sixth transistor is electrically connected to the one of the source and the drain of the fifth transistor,

wherein the other of the source and the drain of the second transistor is electrically connected to the other of the source and the drain of the third transistor,

wherein the other of the source and the drain of the fourth transistor is electrically connected to the other of the source and the drain of the sixth transistor,

wherein a gate of the first transistor is electrically connected to the one of the source and the drain of the fourth transistor,

wherein a gate of the second transistor is electrically connected to a gate of the fifth transistor,

wherein a gate of the third transistor is electrically connected to a gate of the sixth transistor,

wherein one of a source and a drain of the seventh transistor is electrically connected to the gate of the second transistor,

wherein a gate of the seventh transistor is electrically connected to the gate of the first transistor,

wherein the gate of the third transistor is electrically connected to a wiring capable of supplying clock signal,

wherein one of the first transistor, the second transistor, the third transistor, the fourth transistor, the fifth transistor, the sixth transistor, and the seventh transistor comprises:

a gate electrode;

a gate insulating film over the gate electrode;

a first semiconductor layer over the gate insulating film;

a second semiconductor layer over the first semiconductor layer, the second semiconductor layer comprising a first region, a second region, a third region, a fourth region, and a fifth region;

a third semiconductor layer over the second semiconductor layer;

a fourth semiconductor layer over the second semiconductor layer;

a source electrode over the third semiconductor layer; and

a drain electrode over the fourth semiconductor layer,

wherein the first region overlaps with the first semiconductor layer, does not overlap with the third semiconductor layer, and does not overlap with the fourth semiconductor layer,

wherein the second region is located between the first semiconductor layer and the third semiconductor layer, and overlaps with the source electrode,

wherein the third region is located between the first semiconductor layer and the third semiconductor layer, and does not overlap with the source electrode,

wherein the fourth region is located between the first semiconductor layer and the fourth semiconductor layer, and overlaps with the drain electrode,

wherein the fifth region is located between the first semiconductor layer and the fourth semiconductor layer, and does not overlap with the drain electrode,

wherein a thickness of the second semiconductor layer in the first region is smaller than a thickness of the second semiconductor layer in the second region,

wherein a thickness of the second semiconductor layer in the first region is smaller than a thickness of the second semiconductor layer in the third region,

wherein a thickness of the second semiconductor layer in the first region is smaller than a thickness of the second semiconductor layer in the fourth region, and

wherein a thickness of the second semiconductor layer in the first region is smaller than a thickness of the second semiconductor layer in the fifth region.

27. The semiconductor device according to claim 26 , wherein a gate of the fourth transistor is electrically connected to the other of the source and the drain of the fourth transistor.

28. A semiconductor device comprising:

a pixel;

a driver circuit electrically connected to the pixel,

wherein the driver circuit comprises a first transistor, a second transistor, a third transistor, a fourth transistor, a fifth transistor, a sixth transistor, and a seventh transistor;

wherein one of the first transistor, the second transistor, the third transistor, the fourth transistor, the fifth transistor, the sixth transistor, and the seventh transistor comprises a channel formation region comprising an amorphous silicon,

wherein one of a source and a drain of the first transistor is electrically connected to one of a source and a drain of the second transistor,

wherein the one of the source and the drain of the first transistor is electrically connected to one of a source and a drain of the third transistor,

wherein one of a source and a drain of the fourth transistor is electrically connected to one of a source and a drain of the fifth transistor,

wherein one of a source and a drain of the sixth transistor is electrically connected to the one of the source and the drain of the fifth transistor,

wherein the other of the source and the drain of the second transistor is electrically connected to the other of the source and the drain of the third transistor,

wherein the other of the source and the drain of the fourth transistor is electrically connected to the other of the source and the drain of the sixth transistor,

wherein a gate of the first transistor is electrically connected to the one of the source and the drain of the fourth transistor,

wherein a gate of the second transistor is electrically connected to a gate of the fifth transistor,

wherein a gate of the third transistor is electrically connected to a gate of the sixth transistor,

wherein one of a source and a drain of the seventh transistor is electrically connected to the gate of the second transistor,

wherein a gate of the seventh transistor is electrically connected to the gate of the first transistor,

wherein the gate of the third transistor is electrically connected to a wiring capable of supplying clock signal,

wherein one of the first transistor, the second transistor, the third transistor, the fourth transistor, the fifth transistor, the sixth transistor, and the seventh transistor comprises:

a gate electrode;

a gate insulating film over the gate electrode;

a first semiconductor layer over the gate insulating film;

a second semiconductor layer over the first semiconductor layer, the second semiconductor layer comprising a first region, a second region, a third region, a fourth region, and a fifth region;

a third semiconductor layer over the second semiconductor layer;

a fourth semiconductor layer over the second semiconductor layer;

a source electrode over the third semiconductor layer; and

a drain electrode over the fourth semiconductor layer,

wherein the first region overlaps with the first semiconductor layer, does not overlap with the third semiconductor layer, and does not overlap with the fourth semiconductor layer,

wherein the second region is located between the first semiconductor layer and the third semiconductor layer, and overlaps with the source electrode,

wherein the third region is located between the first semiconductor layer and the third semiconductor layer, and does not overlap with the source electrode,

wherein the fourth region is located between the first semiconductor layer and the fourth semiconductor layer, and overlaps with the drain electrode,

wherein the fifth region is located between the first semiconductor layer and the fourth semiconductor layer, and does not overlap with the drain electrode,

wherein a thickness of the second semiconductor layer in the first region is smaller than a thickness of the second semiconductor layer in the second region,

wherein a thickness of the second semiconductor layer in the first region is smaller than a thickness of the second semiconductor layer in the third region,

wherein a thickness of the second semiconductor layer in the first region is smaller than a thickness of the second semiconductor layer in the fourth region, and

wherein a thickness of the second semiconductor layer in the first region is smaller than a thickness of the second semiconductor layer in the fifth region.

29. The semiconductor device according to claim 28 , wherein a gate of the fourth transistor is electrically connected to the other of the source and the drain of the fourth transistor.

30. A semiconductor device comprising:

a driver circuit,

wherein the driver circuit comprises a first transistor, a second transistor, a third transistor, a fourth transistor, a fifth transistor, and a sixth transistor;

wherein one of the first transistor, the second transistor, the third transistor, the fourth transistor, the fifth transistor, and the sixth transistor comprises a channel formation region that comprises an oxide semiconductor,

wherein one of a source and a drain of the first transistor is directly connected to one of a source and a drain of the second transistor,

wherein the one of the source and the drain of the first transistor is directly connected to one of a source and a drain of the third transistor,

wherein one of a source and a drain of the fourth transistor is directly connected to one of a source and a drain of the fifth transistor,

wherein one of a source and a drain of the sixth transistor is directly connected to the one of the source and the drain of the fifth transistor,

wherein the other of the source and the drain of the second transistor is electrically connected to the other of the source and the drain of the third transistor,

wherein the other of the source and the drain of the fourth transistor is electrically connected to the other of the source and the drain of the sixth transistor,

wherein a gate of the first transistor is directly connected to the one of the source and the drain of the fourth transistor,

wherein a gate of the second transistor is directly connected to a gate of the fifth transistor,

wherein the other of the source and the drain of the first transistor is electrically connected to a first wiring capable of supplying a first signal,

wherein a potential of the gate of the second transistor is changed depending on a potential of a second wiring capable of supplying a second signal, and

wherein the second wiring is not electrically connected to the first wiring.

31. The semiconductor device according to claim 30 , wherein a gate of the third transistor is electrically connected to a wiring capable of supplying clock signal.

32. The semiconductor device according to claim 30 , wherein the oxide semiconductor is InGaZnO.

33. The semiconductor device according to claim 30 , wherein a gate of the fourth transistor is electrically connected to the other of the source and the drain of the fourth transistor.

34. An electronic device comprising:

the semiconductor device according to claim 30 , and

an operation key, a speaker, an antenna, or a battery.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 9, 2016
From: UMEZAKI, ATSUSHI
To: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Reel/Frame 038507/0201 →
Priority Claims (1)
JP 2008-157400 · Jun 17, 2008 · national
Continuity (5)
Continuation 14644372 · Mar 11, 2015
Continuation 14305367 · Jun 16, 2014
Continuation 13675077 · Nov 13, 2012
Continuation 12477338 · Jun 3, 2009
Related Publication 20160190174A1 · Jun 30, 2016
Cited By (8)
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