Topographic phase control for overlay measurement
Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.
1. An imaging metrology tool comprising:
a calibration module operated by one or more processors configured to derive a dependency of an overlay error magnification on a level of defocusing, wherein the dependency is based on target pitch, target asymmetry, amplitude of a first diffraction order, topographic phase, and defocus, and wherein the amplitude of the first diffraction order is based on amplitudes from a plurality of symmetric rectangular areas, the target pitch, and a phase difference,
controlling the overlay error magnification, using the calibration module, by adjusting a focus position to reduce a factor that is defined by tan(ψ (1) −ψ (0) −2π(1−cos θ 1 )Δz/λ), wherein Δz is the level of defocusing, λ is an illumination wavelength, θ 1 is an illumination angle of the first diffraction order, and ψ (1) and ψ (0) are topographic phases of the first and the zeroth diffraction orders, respectively, and
an optical system configured to operate at a narrow spectral range, Δλ≤10 nm, at a narrow illumination numerical aperture, NA≤0.1, and at the focus position that corresponds to zero overlay error magnification according to the derived dependency.
2. The imaging metrology tool of claim 1 , wherein the optical system includes an optical assembly comprising beam splitters followed by a mirror configured to provide three respective focal locations approximately at a detection plane.
3. The imaging metrology tool of claim 1 , wherein the optical system includes a reticle at a field stop, optics, and beam splitters configured to provide three respective focal locations.
4. The imaging metrology tool of claim 2 , wherein the imaging metrology tool includes two of the beam splitters.
5. The imaging metrology tool of claim 2 , wherein the optical system provides three images having equal power and corresponding to the three respective focal locations.
6. The imaging metrology tool of claim 5 , wherein the three images are detected by a detector.
7. The imaging metrology tool of claim 3 , further comprising three detectors, wherein each of the three detectors detects one of the three respective focal locations.