Semiconductor device comprising a standard cell including a non-active fin area
Disclosed herein is a semiconductor device including two standard cells which are arranged adjacent to each other in an X direction. One of the two standard cells includes a plurality of first fins which extend in the X direction, and which are arranged along a boundary between the two standard cells in a Y direction. The other standard cell includes a plurality of second fins which extend in the X direction, and which are arranged along the boundary between the two standard cells in the Y direction. The plurality of second fins includes a dummy fin.
1. A semiconductor device comprising a standard cell including a fin transistor, the standard cell further comprising:
a plurality of first active fins which extend in a first direction, and which are arranged in a second direction that is perpendicular to the first direction along one end of the standard cell in the first direction;
a plurality of second active fins which extend in the first direction, and which are arranged in the second direction; and
two regions having two different conductivity types, which are arranged adjacent to each other in the second direction, wherein:
the plurality of first active fins and the plurality of second active fins are arranged in both the two regions having the two different conductivity types,
in one of the two regions that has one of the two conductivity types, a third active fin is arranged between at least one pair of first and second active fins, the third active fin intersecting with a plurality of first gate lines extending in the second direction, and
in the other region that has the other of the two conductivity types, a non-active fin area where no active fin is arranged at the same position as the third active fin in the first direction is provided.
2. The semiconductor device of claim 1 , wherein
each of the plurality of first active fins arranged in the other region is aligned with an associated one of the plurality of second active fins arranged in the other region.
3. The semiconductor device of claim 2 , wherein:
the plurality of first active fins arranged in the other region intersect with at least one second gate line extending in the second direction, and
the plurality of second active fins arranged in the other region intersect with least one third gate line extending in the second direction.
4. The semiconductor device of claim 3 , wherein
the first, second, and third gate lines are arranged at a predetermined pitch in the first direction.
5. The semiconductor device of claim 1 , wherein
the plurality of second active fins are arranged along the other end of the standard cell in the first direction.
6. The semiconductor device of claim 5 , wherein
the plurality of first active fins, the plurality of second active fins, and the third active fin arranged in the one of the two regions extend in the first direction between both ends of the standard cell.
7. A semiconductor device comprising a standard cell including a fin transistor, the standard cell further comprising:
a plurality of first active fins which extend in a first direction, and which are arranged in a second direction that is perpendicular to the first direction along one end of the standard cell in the first direction;
a plurality of second active fins which extend in the first direction, and which are arranged in the second direction; and
two regions having two different conductivity types which are arranged adjacent to each other in the second direction, wherein:
the plurality of first active fins and the plurality of second active fins are arranged in both the two regions having the two different conductivity types,
in one of the two regions that has one of the two conductivity types, a third active fin is arranged between at least one pair of first and second active fins, the third active fin intersecting with a plurality of first gate lines extending in the second direction, and
in the other region that has the other of the two conductivity types, a non-active fin area where no active fin is arranged at the same position as the third fin in the first direction is provided, and
a plurality of second gate lines extending in the second direction are arranged in the first direction in the non-active fin area.
8. The semiconductor device of claim 7 , wherein
each of the plurality of first active fins arranged in the other region is aligned with an associated one of the plurality of second active fins arranged in the other region.
9. The semiconductor device of claim 8 , wherein:
the plurality of first active fins arranged in the other region intersect with at least one third gate line extending in the second direction, and
the plurality of second active fins arranged in the other region intersect with at least one fourth gate line extending in the second direction.
10. The semiconductor device of claim 9 , wherein
the first, third, and fourth gate lines are arranged at a predetermined pitch in the first direction.
11. The semiconductor device of claim 7 , wherein
the plurality of second active fins are arranged along the other end of the standard cell in the first direction.
12. The semiconductor device of claim 11 , wherein
the plurality of first active fins, the plurality of second active fins, and the third active fin arranged in the one of the two regions extend in the first direction between both ends of the standard cell.
13. The semiconductor device of claim 7 , wherein
a dummy fin which does not contribute to any logical function is arranged in the non-active fin area.
14. The semiconductor device of claim 13 , wherein
each of the plurality of first active fins arranged in the other region is aligned with an associated one of the plurality of second active fins in the other region.
15. The semiconductor device of claim 14 , wherein:
the plurality of first active fins arranged in the other region intersect with at least one third gate line extending in the second direction, and
the plurality of second active fins arranged in the other region intersect with at least one fourth gate line extending in the second direction.
16. The semiconductor device of claim 15 , wherein
the first, third, and fourth gate lines are arranged at a predetermined pitch in the first direction.
17. The semiconductor device of claim 13 , wherein
the plurality of second active fins are arranged along the other end of the standard cell in the first direction.
18. The semiconductor device of claim 17 , wherein
the plurality of first active fins, the plurality of second active fins, and the third active fin arranged in the one of the two regions extend in the first direction between both ends of the standard cell.