Low-VOC cleaning substrates and compositions containing a quaternary ammonium compound
A cleaning composition for sanitizing and/or disinfecting hard surfaces, comprising: a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.
1. A cleaning composition consisting of:
i. about 0.01-2% by weight of one or more quaternary ammonium compounds;
ii. about 0.001-1% by weight of a surfactant selected from the group consisting of: lauryl sulfate, lauryl ether sulfate, cocamidopropylbetaine, alkyl polyglycoside, and any combinations or mixtures thereof;
iii. about 0.1-2% by weight of a first solvent selected from the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof;
iv. about 0.1-2% by weight of a second solvent that is different from the first solvent, the second solvent being selected from the group consisting of: alcohols, diols, C1-10 alkyl ethers of alkylene glycols, short chain carboxylic acids, and any mixtures or combinations thereof;
v. at least about 90% by weight of water; and
vi. optionally, one or more adjuncts selected from the group consisting of: buffers in a non-salt form, fragrances, perfumes, defoamers, hydrotropes, enzymes, bleaching agents, dyes, colorants, additional solvents and preservatives; and
wherein the cleaning composition has a cloud point that is 95° F. or less.
2. The cleaning composition as defined in claim 1 , wherein the composition comprises a buffer in a non-salt form.
3. The cleaning composition as defined in claim 1 , wherein the composition comprises a fragrance.
4. The cleaning composition as defined in claim 1 , wherein the surfactant is an alkyl polyglycoside.
5. The cleaning composition as defined in claim 1 , wherein said first solvent includes a C1-10 alkyl ether of alkylene glycol.
6. The cleaning composition as defined in claim 1 , wherein the first solvent includes a C1-10 alkyl ether of propylene glycol.
7. The cleaning composition as defined in claim 1 , wherein the second solvent is an alcohol.
8. A cleaning composition consisting of:
i. about 0.01-2% by weight of one or more quaternary ammonium compounds;
ii. about 0.001-1% by weight of an alkyl polyglycoside surfactant;
iii. about 0.1-2% by weight of a first solvent selected from the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof;
iv. about 0.1-2% by weight of a second solvent that is different from the first solvent, the second solvent being selected from the group consisting of: alcohols, diols, C1-10 alkyl ethers of alkylene glycols, short chain carboxylic acids, and any mixtures or combinations thereof;
v. about 0.001-1% by weight of a buffer in a non-salt form;
vi. at least about 90% by weight of water; and
vii. optionally, one or more adjuncts selected from the group consisting of: fragrances, perfumes, defoamers, hydrotropes, enzymes, bleaching agents, dyes, colorants, additional solvents and preservatives; and
wherein the cleaning composition has a cloud point that is 95° F. or less.
9. The cleaning composition as defined in claim 8 , wherein the buffer is monoethanolamine.
10. The cleaning composition as defined in claim 8 , wherein the composition comprises a fragrance.
11. The cleaning composition as defined in claim 8 , wherein said one or more quaternary ammonium compounds comprises at least one of n-alkyldimethylbenzylammonium chloride or n-alkyldimethylethylbenzylammonium chloride.
12. The cleaning composition as defined in claim 8 , wherein said cleaning composition has a cloud point of 90° F. or less.
13. The cleaning composition as defined in claim 8 , wherein the first solvent includes a C1-10 alkyl ether of alkylene glycol.
14. The cleaning composition as defined in claim 8 , wherein the second solvent is an alcohol.
15. A cleaning composition consisting of:
i. about 0.01-2% by weight of one or more quaternary ammonium compounds,
ii. about 0.15-1.5% by weight of an alkyl polyglycoside surfactant;
iii. about 0.1-2% by weight of a first solvent selected from the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof,
iv. about 0.01-2% by weight of a second solvent, the second solvent being one or more alcohols;
v. one or more buffers in a non-salt form;
vi. one or more fragrances;
vii. at least 90% by weight of water; and
wherein the cleaning composition has a cloud point that is 95° F. or less.
16. The cleaning composition as defined in claim 15 , wherein said buffer is monoethanolamine.
17. The cleaning composition as defined in claim 15 , wherein the first solvent includes a C1-10 alkyl ether of propylene glycol.
18. The cleaning composition as defined in claim 15 , wherein said one or more quaternary ammonium compounds comprises at least one of n-alkyldimethylbenzylammonium chloride or n-alkyldimethylethylbenzylammonium chloride.
19. The cleaning composition as defined in claim 15 , wherein said second solvent is ethanol.