Etching method and method for manufacturing DRAM capacitor
There is provided an etching method which includes: preparing a target substrate having a silicon portion, a silicon nitride film and a silicon oxide film; and selectively etching the silicon portion with respect to the silicon nitride film and the silicon oxide film by supplying a fluorine-containing gas and an inert gas which stay in an excited state to the target substrate.
1. An etching method, comprising:
preparing a target substrate including a silicon portion, a Ti-based film, a silicon nitride film formed on a surface of the silicon portion to support the Ti-based film, and a silicon oxide film; and
selectively etching the silicon portion with respect to the Ti-based film, the silicon nitride film, and the silicon oxide film by supplying a fluorine-containing gas and an inert gas maintained in an excited state to the target substrate so that the Ti-based film is allowed to remain while being supported by the silicon nitride film,
wherein the inert gas is a gas selected from a group consisting of an N 2 gas and noble gases.
2. The method of claim 1 , wherein an etching rate for the silicon portion is 100 nm/min or greater, and an etching selectivity of the silicon portion to the silicon nitride film and the silicon oxide film is 300 or greater.
3. The method of claim 1 , wherein the fluorine-containing gas is at least one selected from a group consisting of a hydrogen fluoride gas and a sulfur hexafluoride gas.
4. The method of claim 1 , wherein the fluorine-containing gas is a hydrogen fluoride gas.
5. The method of claim 1 , wherein the inert gas is at least one selected from a group consisting of the N 2 gas and an Ar gas.
6. The method of claim 1 , wherein a volume ratio of the fluorine-containing gas and the inert gas is in a range of 10:1 to 1:10.
7. The method of claim 1 , wherein a temperature of the target substrate at the time of etching is in a range of 20 to 60 degrees C.
8. The method of claim 1 , wherein a pressure at the time of etching is in a range of 66.5 to 266 Pa.
9. A method for manufacturing a DRAM capacitor, comprising:
preparing a semiconductor wafer having a structure in which an underlying silicon oxide film is formed on a semiconductor substrate, a sacrificial polysilicon film is formed on the silicon oxide film, a plurality of columnar recesses is formed in the sacrificial polysilicon film, a plurality of cylindrical TiN films serving as lower electrodes are formed in the respective columnar recesses and a silicon nitride film for supporting the cylindrical TiN films is formed on the sacrificial polysilicon film; and
selectively etching the sacrificial polysilicon film by supplying a hydrogen fluoride gas and an inert gas which are maintained in an excited state to the semiconductor wafer so that the plurality of cylindrical TiN films are allowed to remain as the lower electrodes for DRAM capacitors supported by the silicon nitride film,
wherein the inert gas is a gas selected from a group consisting of an N 2 gas and noble gases.
10. The method of claim 9 , wherein an etching rate for the sacrificial polysilicon film is 100 nm/min or greater, and an etching selectivity of the sacrificial polysilicon film to the silicon nitride film and the silicon oxide film is 300 or greater.
11. The method of claim 9 , wherein, in selectively etching the sacrificial polysilicon film, a sulfur hexafluoride gas maintained in an excited state is further supplied to the semiconductor wafer.
12. The method of claim 9 , wherein the inert gas is at least one selected from a group consisting of the N 2 gas and an Ar gas.
13. The method of claim 9 , wherein a volume ratio of the hydrogen fluoride gas and the inert gas is in a range of 10:1 to 1:10.
14. The method of claim 9 , wherein a temperature of the semiconductor wafer at the time of etching is in a range of 20 to 60 degrees C.
15. The method of claim 9 , wherein a pressure at the time of etching is in a range of 66.5 to 266 Pa.