Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burs to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
1. An object holder for use in a physical process apparatus, the holder comprising:
a main body made of primarily SiSiC;
a heat transfer structure configured to exchange heat with the main body; and
a plurality of burls protruding from the main body and having end surfaces to support an object, a protruding body of each of the burls comprising SiC and the protruding bodies, and the SiC of the protruding bodies, are separated from each other by an open gap between them.
2. The holder of claim 1 , wherein the protruding body of each burl comprises a lower portion protruding from the main body and an upper body portion above the lower body portion, wherein the lower body portions are a different material than the upper body portions.
3. The holder of claim 2 , wherein the upper body portions comprise diamond-like carbon.
4. The holder of claim 3 , wherein the upper body portions are separated from each other such that they are unconnected by diamond-like carbon to each other.
5. The holder of claim 1 , wherein the SiC containing portions of the burls are formed from a single layer of SiC material.
6. The holder of claim 1 , wherein the physical process apparatus is a lithographic apparatus.
7. The holder of claim 1 , further comprising a thin-film stack forming an electric or electronic component.
8. The holder of claim 7 , wherein the component is a component selected from the group consisting of: an electrode, a heater, a sensor, a transistor and a logic device.
9. The holder of claim 1 , wherein each of the burls tapers away from the main body.
10. A lithographic apparatus, comprising:
a support structure configured to support a patterning device;
a projection system arranged to project a beam patterned by the patterning device onto a substrate; and
the holder according to claim 1 , wherein the object is the substrate.
11. An object holder for use in a lithographic apparatus, the holder comprising:
a main body made of primarily SiSiC;
a heat transfer structure configured to exchange heat with the main body;
a plurality of first burls protruding from the main body and having end surfaces to support an object, a protruding body of each of the first burls comprising SiC and the plurality of first burls comprising a diamond-like carbon at the end surfaces of the first burls, wherein the protruding bodies, and the SiC of the protruding bodies, are separated from each other by an open gap between them; and
a plurality of second burls protruding from the main body, the second burls arranged to support the holder on a structure.
12. A lithographic apparatus, comprising:
a support structure configured to support a patterning device;
a projection system arranged to project a beam patterned by the patterning device onto a substrate; and
the holder according to claim 11 , wherein the object is the substrate.
13. An object holder for use in a physical process apparatus, the holder comprising:
a main body having a first surface and a second surface opposite the first surface; and
a plurality of burls protruding from the main body at the first surface and having end surfaces to contact an object,
wherein a protruding body of each of the burls comprises a composite material that comprises (i) a particulate component comprising diamond particulate and (ii) a matrix component having the particulate component therein, and
wherein the protruding bodies, and the composite material of the protruding bodies, are separated from each other by an open gap between them.
14. The holder of claim 13 , wherein the main body is made of the composite material.
15. The holder of claim 13 , wherein the composite material is also provided at the second surface to contact a surface supporting the holder.
16. The holder of claim 13 , wherein the diamond particulate is arranged to contact the object.
17. The holder of claim 13 , wherein the matrix component comprises elemental silicon and/or silicon carbide.
18. The holder of claim 13 , wherein the particulate component further comprises at least one phase other than diamond.
19. The holder of claim 13 , comprising SiSiC and further comprising burls at the second surface.
20. A lithographic apparatus, comprising:
a support structure configured to support a patterning device;
a projection system arranged to project a beam patterned by the patterning device onto a substrate; and
the holder according to claim 13 , wherein the object is the substrate.