Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
1. A substrate holder for use in a lithographic apparatus, the substrate holder comprising:
a main body having a first side of the main body and a second side of the main body opposite to the first side;
a plurality of first burls at the first side of the main body and having end surfaces to support a substrate; and
a plurality of second burls at the second side of the main body,
wherein each of the first burls and/or second burls has a cross-sectional width in a range of about 250 μm to about 500 μm, and
wherein the main body is grounded.
2. The substrate holder of claim 1 , wherein each of the first burls comprise a first body portion protruding from the main body and a second body portion located further from the main body than the first body portion, wherein the first body portions comprise a different material than the second body portions.
3. The substrate holder of claim 1 , wherein the first burls comprise a material selected from: diamond, diamond-like carbon, SiC, SiO 2 , TiN, cubic boron nitride, silicon nitride, titanium, titanium carbide, cordierite or aluminum nitride.
4. The substrate holder of claim 3 , wherein the material comprises diamond or diamond-like carbon.
5. The substrate holder of claim 1 , further comprising a layer between the plurality of first burls.
6. The substrate holder of claim 1 , further comprising a heater provided to the main body and configured to control a temperature of the substrate and/or the main body.
7. A lithographic apparatus, comprising:
a support structure configured to support a patterning device;
a projection system arranged to project a beam patterned by the patterning device onto a substrate; and
a substrate holder arranged to hold the substrate, the substrate holder being according to claim 1 .
8. A substrate holder for use in a lithographic apparatus, the substrate holder comprising:
a main body having a first side of the main body and a second side of the main body opposite to the first side;
a plurality of first burls at the first side of the main body and having end surfaces to support a substrate;
a plurality of second burls at the second side of the main body,
wherein spacing between the first burls and/or between the second burls is between about 1.5 mm to about 3 mm, and
wherein the main body is grounded.
9. The substrate holder of claim 8 , further comprising a layer between the plurality of first burls.
10. The substrate holder of claim 8 , wherein at least a distal portion of each of the first burls comprises a material selected from: diamond, diamond-like carbon, SiC, SiO 2 , TiN, cubic boron nitride, silicon nitride, titanium, titanium carbide, cordierite or aluminum nitride.
11. The substrate holder of claim 8 , wherein the main body comprises at least one material selected from: Zerodur ceramic, cordierite, SiSiC, SiC, aluminum nitride (AlN), SiSiC, ceramic or glass-ceramic.
12. The substrate holder of claim 8 , wherein the main body is formed of a different material from the first and/or second burls.
13. The substrate holder of claim 8 , further comprising a heater provided to the main body and configured to control a temperature of the substrate and/or the main body.
14. A lithographic apparatus, comprising:
a support structure configured to support a patterning device;
a projection system arranged to project a beam patterned by the patterning device onto a substrate; and
a substrate holder arranged to hold the substrate, the substrate holder being according to claim 8 .
15. A substrate holder for use in a lithographic apparatus, the substrate holder comprising:
a main body having a first side of the main body and a second side of the main body opposite to the first side;
a plurality of first burls at the first side of the main body and having end surfaces to support a substrate; and
a plurality of second burls at the second side of the main body,
wherein the main body comprises at least one material selected from: cordierite, SiSiC, SiC, Zerodur ceramic, Invar alloy, ULE glass, aluminum nitride (AlN), ceramic, glass-ceramic, fused silica, boron nitride, or silicon nitride, and
wherein the main body is grounded.
16. The substrate holder of claim 15 , further comprising a heater provided to the main body and configured to control a temperature of the substrate and/or the main body.
17. The substrate holder of claim 15 , wherein (1) the main body has a thickness in a range of 1 mm to 50 mm, (2) each of the first burls and/or second burls has a height in a range of about 5 μm to about 250 μm, and/or (3) a total area of all the burls on one side of the main body is less than 3% of the total surface area of the main body.
18. The substrate holder of claim 15 , wherein each of the first burls comprise a first body portion protruding from the main body and a second body portion located further from the main body than the first body portion, wherein the first body portions comprise a different material than the second body portions, and wherein the second body portions comprise a material selected from: diamond, diamond-like carbon, SiC, SiO 2 , TiN, cubic boron nitride, silicon nitride, titanium, titanium carbide, cordierite or aluminum nitride.
19. The substrate holder of claim 15 , wherein the number of first burls distributed across the substrate holder is more than 10,000.
20. A lithographic apparatus, comprising:
a support structure configured to support a patterning device;
a projection system arranged to project a beam patterned by the patterning device onto a substrate; and
a substrate holder arranged to hold the substrate, the substrate holder being according to claim 15 .