Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
1. A substrate holder for use in a lithographic apparatus, the substrate holder comprising:
a main body having a surface;
a plurality of first burls provided on a first side of the main body and having end surfaces to support a substrate, wherein the first burls each comprise a lower body portion protruding from the main body and an upper body portion above the lower body portion, wherein the lower body portions are a different material than the upper body portions, the upper body portions comprise a material selected from: diamond, diamond-like carbon, SiC, SiO 2 , TiN, cubic boron nitride, silicon nitride, titanium, titanium carbide, cordierite or aluminum nitride; and
a second plurality of burls provided on a second side of the main body, the second side being opposite of the first side,
wherein the main body has a thickness in a range of 1 mm to 50 mm.
2. The substrate holder according to claim 1 , wherein the main body is formed of a different material than the first and/or second burls.
3. A lithographic apparatus, comprising:
a support structure configured to support a patterning device;
a projection system arranged to project a beam patterned by the patterning device onto a substrate; and
a substrate holder arranged to hold the substrate, the substrate holder being according to claim 1 .
4. The substrate holder according to claim 1 , wherein the main body comprises at least one material selected from: Zerodur ceramic, cordierite, SiSiC, SiC, AlN, SiSiC, ceramic or glass-ceramic.
5. The substrate holder according to claim 1 , wherein the burls project from the main body by a distance selected from the range of from 1 to 250 μm.
6. The substrate holder according to claim 1 , wherein each of the first burls has a cylindrical or tapered shape.
7. The substrate holder according to claim 1 , wherein the number of first burls distributed across the substrate holder is more than 10,000.
8. A substrate holder for use in a lithographic apparatus, the substrate holder comprising:
a main body;
a plurality of first burls provided on a first side of the main body and having end surfaces to support a substrate, wherein the first burls each comprise a lower body portion protruding from the main body and an upper body portion above the lower body portion, wherein the lower body portions are a different material than the upper body portions; and
a plurality of second burls provided on a second side of the main body,
wherein each of the first burls and/or second burls has a height in a range of about 5 μm to about 250 μm.
9. The substrate holder according to claim 8 , wherein the main body is formed of a different material from the first and/or second burls.
10. The substrate holder according to claim 8 , wherein the main body comprises at least one material selected from: Zerodur ceramic, cordierite, SiSiC, SiC, AlN, SiSiC, ceramic or glass-ceramic.
11. The substrate holder according to claim 8 , wherein each of the first burls has a cylindrical or tapered shape.
12. The substrate holder according to claim 8 , wherein the number of first burls distributed across the substrate holder is more than 10,000.
13. The substrate holder according to claim 8 , wherein a spacing between first burls and/or between second burls is in a range of about 1.5 mm to about 3 mm.
14. A lithographic apparatus, comprising:
a support structure configured to support a patterning device;
a projection system arranged to project a beam patterned by the patterning device onto a substrate; and
a substrate holder arranged to hold the substrate, the substrate holder being according to claim 8 .
15. A substrate holder for use in a lithographic apparatus, the substrate holder comprising:
a main body comprising at least one material selected from: Zerodur ceramic, cordierite, SiSiC, SiC, AlN, SiSiC, ceramic or glass-ceramic;
a plurality of first burls provided on a first side of the main body and having end surfaces to support a substrate, wherein the first burls each comprise a lower body portion protruding from the main body and an upper body portion above the lower body portion, wherein the lower body portions are a different material than the upper body portions; and
a plurality of second burls provided on a second side of the main body,
wherein a total area of all the burls on one side of the main body is less than 3% of the total surface area of the main body.
16. The substrate holder according to claim 15 , wherein each of the first burls has a cylindrical or tapered shape.
17. The substrate holder according to claim 15 , wherein the main body has thickness in a range of about 1 mm to about 50 mm.
18. The substrate holder according to claim 15 , wherein a spacing between first burls and/or between second burls is in a range of about 1.5 mm to about 3 mm.
19. The substrate holder according to claim 15 , wherein the number of first burls distributed across the substrate holder is more than 10,000.
20. A lithographic apparatus, comprising:
a support structure configured to support a patterning device;
a projection system arranged to project a beam patterned by the patterning device onto a substrate; and
a substrate holder arranged to hold the substrate, the substrate holder being according to claim 15 .