IP Library › Granted Patent US 10,957,723
Granted Patent B2
US 10,957,723 · App. 16/847,933 · Granted Mar 23, 2021

Vehicle, display device and manufacturing method for a semiconductor device

Inventors: Toru Takayama (Kanagawa, JP); Junya Maruyama (Kanagawa, JP); Yuugo Goto (Kanagawa, JP); Hideaki Kuwabara (Kanagawa, JP); Shunpei Yamazaki (Tokyo, JP)
Assignee: Semiconductor Energy Laboratory Co., Ltd.
H01L27/1266B60R1/00B60R11/0229B60R11/04H01L21/6835H01L21/76251H01L27/1218H01L27/3244B60R2011/004B60R2300/202B60R2300/802H01L2221/6835H01L2221/68318H01L2221/68363H01L2221/68386H01L2227/323H01L2227/326
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Quick Facts
Patent No.
US 10,957,723
App. No.
16/847,933
Granted
Mar 23, 2021
Kind
B2
Abstract

To provide a semiconductor device in which a layer to be peeled is attached to a base having a curved surface, and a method of manufacturing the same, and more particularly, a display having a curved surface, and more specifically a light-emitting device having a light emitting element attached to a base with a curved surface. A layer to be peeled, which contains a light emitting element furnished to a substrate using a laminate of a first material layer which is a metallic layer or nitride layer, and a second material layer which is an oxide layer, is transferred onto a film, and then the film and the layer to be peeled are curved, to thereby produce a display having a curved surface.

Claims (13)

1. A method for manufacturing a semiconductor device, the method comprising:

forming a separation layer over a substrate;

forming a peeled layer over the separation layer;

condensing a laser light to form a liner beam;

irradiating the separation layer with the liner beam through the substrate; and

separating the substrate from the peeled layer,

wherein the peeled layer comprises a transistor comprising a semiconductor layer.

2. The method according to claim 1 ,

wherein the peeled layer is capable of curving in a first direction,

wherein a scan direction of the liner beam and a direction of a channel length of the transistor which is a direction from one of a source electrode and a drain electrode to the other of the source electrode and the drain electrode are each a second direction, and

wherein the first direction is perpendicular to the second direction.

3. The method according to claim 1 , wherein the separation layer comprises an amorphous silicon or a polysilicon.

4. The method according to claim 1 , wherein the liner beam is irradiated to a back surface of the separation layer through the substrate.

Priority Claims (1)
JP 2001-367412 · Nov 30, 2001 · national
Continuity (6)
Continuation 16444522 · Jun 18, 2019
Continuation 15347967 · Nov 10, 2016
Continuation 14457140 · Aug 12, 2014
Continuation 11877934 · Oct 24, 2007
Division 10303080 · Nov 25, 2002
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