Semiconductor manufacturing method and semiconductor manufacturing device
The semiconductor manufacturing device includes: a lower substrate support base configured to support a diamond substrate; an upper substrate support base configured to support a semiconductor substrate; a support base drive unit configured to move the lower substrate support base and the upper substrate support base to bring the diamond substrate and the semiconductor substrate into close contact with each other under a state in which a pressure is applied to the diamond substrate and the semiconductor substrate in a thickness direction; and a second mechanism configured to deform a surface of the upper substrate support base opposed to the lower substrate support base so that a surface of the semiconductor substrate opposed to the diamond substrate forms a parallel surface or a parallel plane with respect to a surface of the diamond substrate opposed to the semiconductor substrate.
1. A semiconductor manufacturing method, comprising:
a first substrate arranging step of arranging a diamond substrate on a first substrate support base;
a second substrate arranging step of arranging a semiconductor substrate on a second substrate support base provided so as to be opposed to the first substrate support base;
a support base moving step of, after the first substrate arranging step and the second substrate arranging step, moving one or both of the first substrate support base and the second substrate support base to bring the diamond substrate and the semiconductor substrate into close contact with each other under a state in which a pressure is applied to the diamond substrate and the semiconductor substrate in a thickness direction of the semiconductor substrate;
a first substrate support base deforming step of deforming a surface of the first substrate support base opposed to the second substrate support base in conformity with a shape of a surface of the diamond substrate opposed to the first substrate support base; and a second substrate support base deforming step of, after the first substrate support base deforming step, deforming a surface of the second substrate support base opposed to the first substrate support base so that a surface of the semiconductor substrate opposed to the diamond substrate forms a parallel surface or a parallel plane with respect to a surface of the diamond substrate opposed to the semiconductor substrate,
wherein structures of the first substrate support base and the second substrate support base are configured so that the shape of the surface of the first substrate support base opposed to the second substrate support base and the shape of the surface of the second substrate support base opposed to the first substrate support base can be deformed,
wherein by deforming the structures, the surface of the first substrate support base opposed to the second substrate support base is deformed from a first state of the first substrate support base having a first amount of curvature to a second state of the first substrate support base having an increased amount of curvature, and the surface of the second substrate support base opposed to the first substrate support base is deformed from a first state of the second substrate support base having a second amount of curvature to a second state of the second substrate support base having an increased amount of curvature.
2. The semiconductor manufacturing method according to claim 1 , wherein the first substrate support base deforming step includes, before the first substrate arranging step, deforming the surface of the first substrate support base opposed to the second substrate support base so that the surface of the first substrate support base opposed to the second substrate support base forms a parallel surface or a parallel plane with respect to the surface of the diamond substrate opposed to the first substrate support base.
3. The semiconductor manufacturing method according to claim 1 , wherein the semiconductor substrate has a dimension in the thickness direction of 20 μm or less.
4. The semiconductor manufacturing method according to claim 1 , further comprising a first substrate surface activating step of activating the surface of the diamond substrate.
5. The semiconductor manufacturing method according to claim 1 , wherein the second substrate support base deforming step includes deforming the surface of the second substrate support base opposed to the first substrate support base in conformity with a shape of a surface of the diamond substrate opposed to the second substrate support base.
6. The semiconductor manufacturing method according to claim 5 ,
wherein the first substrate support base deforming step includes deforming the surface of the first substrate support base opposed to the second substrate support base in conformity with a warped shape of a surface of the diamond substrate opposed to the first substrate support base, and
wherein the second substrate support base deforming step includes deforming the surface of the second substrate support base opposed to the first substrate support base in conformity with a warped shape of the surface of the diamond substrate opposed to the second substrate support base.
7. A semiconductor manufacturing device, comprising:
a first substrate support base configured to support a diamond substrate;
a second substrate support base, which is provided so as to be opposed to the first substrate support base, and which is configured to support a semiconductor substrate;
a support base driver configured to move one or both of the first substrate support base and the second substrate support base to bring the diamond substrate and the semiconductor substrate into close contact with each other under a state in which a pressure is applied to the diamond substrate and the semiconductor substrate in a thickness direction of the semiconductor substrate;
a second mechanism configured to deform a surface of the second substrate support base opposed to the first substrate support base so that a surface of the semiconductor substrate opposed to the diamond substrate forms a parallel surface or a parallel plane with respect to a surface of the diamond substrate opposed to the semiconductor substrate; and
the semiconductor manufacturing device comprising a first mechanism configured to deform to a non-planar shape the surface of the first substrate support base facing towards the second substrate support base in conformity with a surface of the diamond substrate facing towards the first substrate support base,
wherein the first mechanism is configured to deform to the non-planar shape the surface of the first substrate support base facing towards the second substrate support base in conformity with the surface of the diamond substrate facing forwards the first substrate support base without deforming the diamond substrate,
wherein the support base driver is configured to bring the diamond substrate and the semiconductor substrate into close contact with each other under the state in which the pressure is applied to the diamond substrate and the semiconductor substrate in the thickness direction of the semiconductor substrate without deforming the diamond substrate.
8. The semiconductor manufacturing device according to claim 7 ,
wherein the second substrate support base is configured to support the semiconductor substrate so that the surface of the semiconductor substrate opposed to the diamond substrate is deformable, and
wherein, when the pressure is applied to the diamond substrate and the semiconductor substrate in the thickness direction, the surface of the semiconductor substrate opposed to the diamond substrate is formed into a parallel surface or a parallel plane with respect to a surface of the diamond substrate opposed to the semiconductor substrate through use of the pressure.
9. A semiconductor manufacturing device, comprising:
a first substrate support base configured to support a diamond substrate;
a second substrate support base, which is provided so as to be opposed to the first substrate support base, and which is configured to support a semiconductor substrate;
a support base driver configured to move one or both of the first substrate support base and the second substrate support base to bring the diamond substrate and the semiconductor substrate into close contact with each other under a state in which a pressure is applied to the diamond substrate and the semiconductor substrate in a thickness direction of the semiconductor substrate; and
a first substrate fixing jig, which is provided between the diamond substrate and the first substrate support base, and has a surface opposed to the diamond substrate being a parallel surface or a parallel plane with respect to a surface of the diamond substrate opposed to the first substrate support base,
wherein the second substrate support base is configured to support the semiconductor substrate so that a surface of the semiconductor substrate opposed to the diamond substrate is deformable, and
wherein, when the pressure is applied to the diamond substrate and the semiconductor substrate in the thickness direction, the surface of the semiconductor substrate opposed to the diamond substrate is formed into a parallel surface or a parallel plane with respect to a surface of the diamond substrate opposed to the semiconductor substrate through use of the pressure,
wherein the support base driver is configured to bring the diamond substrate and the semiconductor substrate into close contact with each other under the state in which the pressure is applied to the diamond substrate and the semiconductor substrate in the thickness direction of the semiconductor substrate without deforming the diamond substrate.