IP Library Granted Patent US 12,412,865
Granted Patent B2
US 12,412,865 · App. 17/671,732 · Granted Sep 9, 2025

Apparatus and method for bonding substrates

Inventors: Dominik Zinner (Zell an der Pram, AT); Thomas Wagenleitner (Aurolzmunster, AT); Jurgen Markus Suss (Scharding, AT); Thomas Plach (St. Florian am Inn, AT); Jurgen Mallinger (Senftenbach, AT)
Assignee: EV GROUP E. THALLNER GMBH
H01L24/75H01L21/67092H01L21/67288H01L21/6833H01L21/6838H01L24/83H01L2224/7555H01L2224/75724H01L2224/75725H01L2224/75744H01L2224/75745H01L2224/7592H01L2224/83201H01L2224/83908
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Quick Facts
Patent No.
US 12,412,865
App. No.
17/671,732
Granted
Sep 9, 2025
Kind
B2
Abstract

A method for bonding a first substrate to a second substrate on mutually facing contact surfaces of the substrates includes a device in which the first substrate is mounted on a first chuck and the second substrate is mounted on a second chuck. A plate is arranged between the second substrate and the second chuck. The second substrate with the plate is deformed with respect to the second chuck before and/or during the bonding.

Claims (27)

1. A device for bonding a first substrate to a second substrate at mutually facing contact surfaces of the first and second substrates, said device comprising:

a first chuck configured to mount the first substrate;

a second chuck configured to mount the second substrate;

a first plate arranged between the second substrate and the second chuck; and

bend-changing means configured to deform the first plate with the second substrate with respect to the second chuck,

wherein the deformation is controlled during bonding of the first substrate to the second substrate,

wherein the second chuck has first limiting elements configured to mechanically fix the first plate in a circumferential region on the first plate, and

wherein a thickness of the first plate is in a range between 0.1 mm and 10 mm.

2. The device according to claim 1 , further comprising a second plate arranged between the first substrate and the first chuck,

wherein the first substrate with the second plate is constructed in a deformable manner with respect to the first chuck for deformation thereof before and/or during the bonding.

3. The device according to claim 2 , wherein the first chuck and/or the second chuck have bending means and/or fluid-pressure loading means for setting and/or controlling the deformations.

4. The device according to claim 2 , wherein the first chuck and/or the second chuck have first fixing means for fixing the first plate and/or second plate.

5. The device according to claim 4 , wherein at least one of the first and second plates has second fixing means connected to the first fixing means of the first and/or second chuck for fixing the first and second substrates.

6. The device according to claim 2 , wherein at least one of the first and second plates has a Young's modulus of between 0.01 GPa and 1100 GPa.

7. The device according to claim 2 , further comprising bend-measuring means configured to detect the deformations.

8. The device according to claim 4 , wherein the first fixing means is annularly arranged.

9. The device according to claim 7 , wherein the bend-measuring means comprises sensors.

10. The device according to claim 9 , where the sensors are distance sensors.

11. The device according to claim 1 , wherein the first plate comprises:

a first plate side fixable on the second chuck using the first fixing means;

a second plate side arranged opposite the first plate side to fix the second substrate on the first plate using a second fixing means; and

at least one fixing-element connection configured to connect the second fixing means to the second chuck.

12. The device according to claim 1 , wherein the first limiting elements mechanically fix the first plate at a region of the first plate that protrudes beyond the second substrate.

13. The device according to claim 1 , wherein the first limiting elements clamp the first plate to the second chuck.

14. The device according to claim 2 , wherein the first chuck has second limiting elements configured to mechanically fix the second plate in a circumferential region on the second plate.

15. The device according to claim 14 , wherein the second limiting elements mechanically fix the second plate at a region of the second plate that protrudes beyond the first substrate.

16. The device according to claim 14 , wherein the second limiting elements clamp the second plate to the first chuck.

Continuity (2)
Division 16632643
Related Publication 20220173068A1 · Jun 2, 2022
References Cited (70)
US 5273553A · Hoshi et al. · 1993 [cited by applicant]
US 6214692B1 · Thallner · 2001 [cited by applicant]
US 6706618B2 · Takisawa et al. · 2004 [cited by applicant]
US 8147630B2 · George · 2012 [cited by applicant]
US 9538582B2 · Cheng et al. · 2017 [cited by applicant]
US 9888527B2 · Lin et al. · 2018 [cited by applicant]
US 10109487B2 · Kurz et al. · 2018 [cited by applicant]
US 10483212B2 · Sugaya et al. · 2019 [cited by applicant]
US 10504730B2 · Kurz et al. · 2019 [cited by applicant]
US 10512124B2 · Cheng et al. · 2019 [cited by applicant]
US 10636662B2 · Kurz et al. · 2020 [cited by applicant]
US 10748770B2 · Kurz et al. · 2020 [cited by applicant]
US 10861699B2 · Kurz et al. · 2020 [cited by applicant]
US 11107685B2 · Nakamura et al. · 2021 [cited by applicant]
US 11211338B2 · Sugaya et al. · 2021 [cited by applicant]
US 11251045B2 · Kurz et al. · 2022 [cited by applicant]
US 11315813B2 · Wagenleitner et al. · 2022 [cited by applicant]
US 11527410B2 · Kurz et al. · 2022 [cited by applicant]
US 20020110328A1 · Bischel · 2002 [cited by examiner]
US 20020182038A1 · Takisawa et al. · 2002 [cited by applicant]
US 20060141742A1 · Fournel et al. · 2006 [cited by applicant]
US 20080210380A1 · Mizuno · 2008 [cited by applicant]
US 20100266373A1 · George · 2010 [cited by examiner]
US 20110214809A1 · Sugiyama · 2011 [cited by applicant]
US 20110253315A1 · George · 2011 [cited by examiner]
US 20120077329A1 · Broekaart et al. · 2012 [cited by applicant]
US 20140027431A1 · Cheng et al. · 2014 [cited by applicant]
US 20150201462A1 · Lin et al. · 2015 [cited by applicant]
US 20150210057A1 · Wagenleithner · 2015 [cited by examiner]
US 20150214082A1 · Huang et al. · 2015 [cited by applicant]
US 20150357226A1 · Liu et al. · 2015 [cited by applicant]
US 20160009070A1 · Hayashi et al. · 2016 [cited by applicant]
US 20160204020A1 · Huang · 2016 [cited by examiner]
US 20170098571A1 · Cheng et al. · 2017 [cited by applicant]
US 20170140955A1 · Liu et al. · 2017 [cited by applicant]
US 20170278803A1 · Sugaya et al. · 2017 [cited by applicant]
US 20180076037A1 · Kurz et al. · 2018 [cited by applicant]
US 20180122845A1 · Kim et al. · 2018 [cited by applicant]
US 20190019677A1 · Kurz et al. · 2019 [cited by applicant]
US 20190210348A1 · Wagenleitner et al. · 2019 [cited by applicant]
US 20200043860A1 · Sugaya et al. · 2020 [cited by applicant]
US 20200045777A1 · Cheng et al. · 2020 [cited by applicant]
US 20200066529A1 · Kurz et al. · 2020 [cited by applicant]
US 20200219726A1 · Kurz et al. · 2020 [cited by applicant]
US 20200335341A1 · Kurz et al. · 2020 [cited by applicant]
US 20210074544A1 · Kurz et al. · 2021 [cited by applicant]
US 20220130674A1 · Kurz et al. · 2022 [cited by applicant]
JP 766093 · 1995 [cited by applicant]
JP 2000127034A · 2000 [cited by applicant]
JP 2009010072A · 2009 [cited by applicant]
JP 2012508988A · 2012 [cited by applicant]
JP 2013187393A · 2013 [cited by applicant]
JP 2013258377A · 2013 [cited by applicant]
JP 2017118066A · 2017 [cited by applicant]
KR 1020120004917A · 2012 [cited by applicant]
TW 201030890A1 · 2010 [cited by applicant]
TW 201405682A · 2014 [cited by applicant]
TW 201513172A · 2015 [cited by applicant]
TW 201621991A · 2016 [cited by applicant]
TW 201633367A · 2016 [cited by applicant]
TW 201642386A · 2016 [cited by applicant]
WO WO2012083978A1 · 2012 [cited by applicant]
WO WO2014202106A1 · 2014 [cited by applicant]
WO WO2015082020A1 · 2015 [cited by applicant]
WO WO2015113641A1 · 2015 [cited by applicant]
WO WO2017140348A1 · 2017 [cited by applicant]
International Search Report from corresponding International Patent Application No. PCT/EP2017/073930, dated Jan. 15, 2018. [cited by applicant]
Office Action issued in related Taiwan Patent Application No. 110111309 dated Feb. 8, 2022. [cited by applicant]
Office Action issued in related Taiwan Patent Application No. 108130088 dated Feb. 9, 2022. [cited by applicant]
Notification of Grounds for Rejection issued in Japanese Patent Application No. 2024-044179 dated Feb. 18, 2025. [cited by applicant]