IP Library Granted Patent US 11,271,025
Granted Patent B2
US 11,271,025 · App. 16/818,080 · Granted Mar 8, 2022

Solid-state imaging device and electronic apparatus

Inventor: Hiromi Okazaki (Kanagawa, JP)
Assignee: SONY CORPORATION
H01L27/1463H01L27/14621H01L27/14623H01L27/14627H01L27/14629H01L27/14636H01L27/14645H01L27/14656
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,271,025
App. No.
16/818,080
Granted
Mar 8, 2022
Kind
B2
Abstract

A solid-state imaging device includes a semiconductor layer on which a plurality of pixels are arranged along a light-receiving surface being a main surface of the semiconductor layer, photoelectric conversion units provided for the respective pixels in the semiconductor layer, and a trench element isolation area formed by providing an insulating layer in a trench pattern formed on a light-receiving surface side of the semiconductor layer, the trench element isolation area being provided at a position displaced from a pixel boundary between the pixels.

Claims (38)

1. A light detecting device comprising:

a semiconductor substrate having a first side as a light-receiving side;

a trench region disposed in the semiconductor substrate at the first side;

a first region of the semiconductor substrate comprising at least a portion of a first photodiode, wherein:

the first region is surrounded by the trench region at the first side in a plan view, and

the first region corresponds with a first color filter in a depth direction of the semiconductor substrate; and

a second region of the semiconductor substrate comprising at least a portion of a second photodiode, wherein:

the second region is surrounded by the trench region at the first side in the plan view,

the second region corresponds with a second color filter in the depth direction of the semiconductor substrate, and

a first area of the first region in the plan view at the first side is larger than a second area of the second region in the plan view at the first side.

2. The light detecting device according to claim 1 , wherein the trench region surrounds the first region in a first rectangular shape at the first side in the plan view, and the trench region surrounds the second region in a second rectangular shape at the first side in the plan view.

3. The light detecting device according to claim 2 , wherein a first side of the first rectangular shape is a same length as a first side of the second rectangular shape in the plan view, and a second side of the first rectangular shape is a different length than a second side of the second rectangular shape in the plan view.

4. The light detecting device according to claim 2 , wherein a side of the first rectangular shape is a same length as a side of the second rectangular shape in the plan view, and a first area of the first rectangular shape is larger than a second area of the second rectangular shape in the plan view.

5. The light detecting device according to claim 2 , wherein a first side of the first rectangular shape is a different length than a first side of the second rectangular shape in the plan view, and wherein the first rectangular shape and the second rectangular shape are each approximately a square shape.

6. The light detecting device according to claim 1 , further comprising a division area disposed between the first region and the second region in the semiconductor substrate.

7. The light detecting device according to claim 6 , wherein the division area is disposed at least on a side of the semiconductor substrate that is opposite to the light-receiving side of the semiconductor substrate in a cross-section view.

8. The light detecting device according to claim 7 , wherein the division area comprises p-type impurities.

9. The light detecting device according to claim 7 , wherein the division area is in contact with the trench region.

10. The light detecting device according to claim 1 , wherein a first insulating film is disposed on the semiconductor substrate, and a second insulating film is disposed on the first insulating film.

11. The light detecting device according to claim 10 , wherein the first insulating film and the second insulating film are disposed in the trench region.

12. The light detecting device according to claim 1 , wherein a light-shielding unit is disposed on the semiconductor substrate.

13. The light detecting device according to claim 1 , wherein a first on-chip lens is disposed at a light-receiving side of the first color filter in a cross-section view, and wherein a second on-chip lens is disposed at a light-receiving side of the second color filter in the cross-section view.

14. The light detecting device according to claim 1 , wherein the first color filter corresponds to a first color and the first color filter is disposed at the first side of the semiconductor substrate.

15. The light detecting device according to claim 14 , wherein the second color filter corresponds to a second color and the second color filter is disposed at the first side of the semiconductor substrate.

16. The light detecting device according to claim 1 , wherein the first color filter is configured to filter light of a different wavelength range than the second color filter.

17. An electronic apparatus comprising:

a semiconductor substrate having a first side as a light-receiving side;

a trench region disposed in the semiconductor substrate at the first side;

a first region of the semiconductor substrate comprising at least a portion of a first photodiode, wherein:

the first region is surrounded by the trench region at the first side in a plan view, and

the first region corresponds with a first color filter in a depth direction of the semiconductor substrate; and

a second region of the semiconductor substrate comprising at least a portion of a second photodiode, wherein:

the second region is surrounded by the trench region at the first side in the plan view,

the second region corresponds with a second color filter in the depth direction of the semiconductor substrate, and

a first area of the first region in the plan view at the first side is larger than a second area of the second region in the plan view at the first side.

18. The electronic apparatus according to claim 17 , wherein the trench region surrounds the first region in a first rectangular shape at the first side in the plan view, and the trench region surrounds the second region in a second rectangular shape at the first side in the plan view.

19. The electronic apparatus according to claim 18 , wherein a first side of the first rectangular shape is a same length as a first side of the second rectangular shape in the plan view, and a second side of the first rectangular shape is a different length than a second side of the second rectangular shape in the plan view.

20. The electronic apparatus according to claim 18 , wherein a side of the first rectangular shape is a same length as a side of the second rectangular shape in the plan view, and a first area of the first rectangular shape is larger than a second area of the second rectangular shape in the plan view.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 27, 2020
From: OKAZAKI, HIROMI
To: SONY CORPORATION
Reel/Frame 052252/0976 →
Priority Claims (1)
JP 2013-109636 · May 24, 2013 · national
Continuity (5)
Continuation 15850947 · Dec 21, 2017
Continuation 15449662 · Mar 3, 2017
Continuation 15084912 · Mar 30, 2016
Continuation 14279632 · May 16, 2014
Related Publication 20200212084A1 · Jul 2, 2020