IP Library Granted Patent US 11,935,736
Granted Patent B2
US 11,935,736 · App. 17/266,672 · Granted Mar 19, 2024

Substrate processing method and substrate processing apparatus

Inventors: Rintaro Higuchi (Koshi, JP); Tsunemoto Ogata (Koshi, JP); Mitsunori Nakamori (Koshi, JP)
Assignee: TOKYO ELECTRON LIMITED
H01L21/02057B08B3/022B08B7/0014B08B7/0057B08B7/04F26B3/02F26B3/28H01L21/67051H01L21/68764
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Quick Facts
Patent No.
US 11,935,736
App. No.
17/266,672
Granted
Mar 19, 2024
Kind
B2
Abstract

A substrate processing method for removing liquid on a substrate having an uneven pattern formed on a surface of the substrate and drying the substrate. The substrate processing method includes: forming a laminate having a two-layer structure including a first material in a solid state forming a lower layer and a second material in a solid state forming an upper layer, in a concave portion of the pattern; removing the second material from the concave portion by performing at least one of a heating process, a light-emitting process, and a reaction process using gas with respect to the second material to sublimate, decompose, and gas-react the second material; and removing the first material from the concave portion by performing at least one of the heating process, the light-emitting process, and the reaction process using gas with respect to the first material to sublimate, decompose, and gas-react the first material.

Claims (35)

1. A substrate processing method for removing liquid on a substrate having an uneven pattern formed on a surface of the substrate and drying the substrate, the substrate processing method comprising:

forming a laminate having a two-layer structure including a first material in a solid state forming a lower layer and a second material in a solid state forming an upper layer, in a concave portion of the pattern;

removing the second material from the concave portion by performing any one of a first heating process, a first reaction process using a first gas, and a first light-emitting process, wherein said first heating process uses sublimation to remove the second material, wherein said first reaction process uses a gas reaction to remove the second material, and wherein said first light-emitting process uses decomposition to remove the second material; and

removing the first material from the concave portion by performing any one of a second heating process, a second reaction process using a second gas, and a second light-emitting process, wherein said second heating process uses sublimation to remove the first material, wherein said second reaction process uses a gas reaction to remove the first material, and wherein said second light-emitting process uses decomposition to remove the first material,

wherein the forming the laminate in the concave portion includes:

forming the first material in the solid state by supplying a first solution including the first material and a first solvent to fill the pattern with the first solution and then drying the first solvent in the first solution; and

forming the second material in the solid state by supplying a second solution including the second material and a second solvent on the first material to fill the pattern with the second solution and then drying the second solvent in the second solution.

2. The substrate processing method of claim 1 , wherein the second material is made of a sublimable material, and

the sublimable material is removed from the concave portion through sublimation by heating the second material to a temperature higher than a sublimation temperature of the second material.

3. The substrate processing method of claim 2 , wherein the first material is made of a thermally decomposable polymer material, and

the thermally decomposable polymer material is removed from the concave portion by heating and thermally decomposing the thermally decomposable polymer material.

4. The substrate processing method of claim 2 , wherein the first material is made of a photodecomposable polymer material, and

the photodecomposable polymer material is removed from the concave portion by irradiating the photodecomposable polymer material with light.

5. The substrate processing method of claim 2 , wherein the first material is made of a gas-decomposable polymer material which is decomposable by an acidic gas or an alkaline gas, and

the gas-decomposable polymer material is removed from the concave portion by performing a gas reaction process using the acidic gas or the alkaline gas with respect to the gas-decomposable polymer material.

6. The substrate processing method of claim 2 , wherein the first material is made of an ozone-gas-decomposable polymer material which is decomposable by ozone gas, and

the ozone-gas-decomposable polymer material is removed from the concave portion by performing a gas reaction process using the ozone gas with respect to the ozone-gas-decomposable polymer material.

7. The substrate processing method of claim 2 , wherein, prior to the forming the laminate in the concave portion, rinsing is performed to supply a rinsing liquid to the substrate, and the rinsing liquid on the substrate is replaced with at least a solution of the first material.

8. The substrate processing method of claim 1 , wherein the first material is made of a thermally decomposable polymer material, and

the thermally decomposable polymer material is removed from the concave portion by heating and thermally decomposing the thermally decomposable polymer material.

9. The substrate processing method of claim 1 , wherein the first material is made of a photodecomposable polymer material, and

the photodecomposable polymer material is removed from the concave portion by irradiating the photodecomposable polymer material with light.

10. The substrate processing method of claim 1 , wherein the first material is made of a gas-decomposable polymer material which is decomposable by an acidic gas or an alkaline gas, and

the gas-decomposable polymer material is removed from the concave portion by performing a gas reaction process using the acidic gas or the alkaline gas with respect to the gas-decomposable polymer material.

11. The substrate processing method of claim 1 , wherein the first material is made of an ozone-gas-decomposable polymer material which is decomposable by ozone gas, and

the ozone-gas-decomposable polymer material is removed from the concave portion by performing a gas reaction process using the ozone gas with respect to the ozone-gas-decomposable polymer material.

12. The substrate processing method of claim 1 , wherein, prior to the forming the laminate in the concave portion, rinsing is performed to supply a rinsing liquid to the substrate, and the rinsing liquid on the substrate is replaced with at least a solution of the first material.

13. A substrate processing method for removing liquid on a substrate having an uneven pattern formed on a surface of the substrate and drying the substrate, the substrate processing method comprising:

forming a laminate having a two-layer structure including a first material in a solid state forming a lower layer and a second material in a solid state forming an upper layer, in a concave portion of the pattern;

removing the second material from the concave portion by performing any one of a first heating process, a first reaction process using a first gas, and a first light-emitting process, wherein said first heating process uses sublimation to remove the second material, wherein said first reaction process uses a gas reaction to remove the second material, and wherein said first light-emitting process uses decomposition to remove the second material; and

removing the first material from the concave portion by performing any one of a second heating process, a second reaction process using a second gas, and a second light-emitting process, wherein said second heating process uses sublimation to remove the first material, wherein said second reaction process uses a gas reaction to remove the first material, and wherein said second light-emitting process uses decomposition to remove the first material,

wherein the forming the laminate in the concave portion includes:

supplying a solution containing the first material, the second material, and a solvent so as to fill the pattern with the solution;

separating the solution into a first solution containing the first material of the lower layer and a second solution containing the second material of the upper layer using a difference in specific gravity; and

after the separating of the solution, drying the solvent in the first solution and the second solution so as to form the laminate including the first material and the second material in the solid state.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 11, 2021
From: HIGUCHI, RINTARO; OGATA, TSUNEMOTO; NAKAMORI, MITSUNORI
To: TOKYO ELECTRON LIMITED
Reel/Frame 055234/0659 →
Priority Claims (1)
JP 2018-154985 · Aug 21, 2018 · national
Continuity (1)
Related Publication 20210313171A1 · Oct 7, 2021
Cited By (1)
US 12,308,261