Substrate processing apparatus and substrate processing method
A light emitting element is positioned at a position right below one principal surface of a substrate rotating about an axis of rotation and away from an end surface of the substrate toward the axis of rotation. The light emitting element is arranged as to be inclined from a horizontal plane so that the light emitting surface faces a peripheral edge part of the substrate. Light emitted from the light emitting surface of the light emitting element is irradiated to a lower surface peripheral edge part of the substrate or a region near the lower surface peripheral edge part. As a result, a processing by the processing liquid is possible in a short time.
1. A substrate processing apparatus, comprising:
a substrate holder configured to hold a substrate substantially horizontally, the substrate holder being rotatable about a predetermined axis of rotation;
a rotating mechanism configured to rotate the substrate holder about the axis of rotation;
a heating mechanism including a light emitting element and configured to heat the substrate by irradiating light to one principal surface of the substrate, the light emitting element arranged at a position right below the one principal surface of the substrate rotating about the axis of rotation and away from an end surface of the substrate toward the axis of rotation so that the light emitting element inclines from a horizontal plane and faces a peripheral edge part of the substrate, thereby irradiating the light emitted from a light emitting surface of the light emitting element directly to the peripheral edge part of the substrate; and
a processing liquid discharge mechanism configured to discharge a processing liquid to another principal surface of the substrate heated by the heating mechanism.
2. The substrate processing apparatus according to claim 1 , wherein:
the heating mechanism includes an inclination angle adjuster configured to adjust an inclination angle of the light emitting surface with respect to the horizontal plane.
3. The substrate processing apparatus according to claim 2 , wherein:
the inclination angle adjuster is configured to adjust the inclination angle according to type of the substrate.
4. The substrate processing apparatus according to claim 2 , wherein:
the inclination angle adjuster continuously or intermittently changes the inclination angle while the light is continuously emitted from the light emitting surface.
5. The substrate processing apparatus according to claim 2 , wherein:
the inclination angle adjuster is configured to adjust the inclination angle so that the light emitting surface is horizontal, whereby a gap while the substrate is loaded and unloaded between outside of the apparatus and the substrate holder is wider than the gap while the light is emitted from the light emitting surface, the gap being a distance between the heating mechanism and the substrate holder in a vertical direction.
6. The substrate processing apparatus according to claim 1 , further comprising a light shielding member configured to shield reflected light reflected by the one principal surface of the substrate by surrounding the heating mechanism from a side opposite to the axis of rotation.
7. The substrate processing apparatus according to claim 1 , further comprising a heat sink, wherein:
the light emitting element has a bottom surface opposite to the light emitting surface, and
the heat sink is configured to support the light emitting surface while being held in close contact with the bottom surface of the light emitting element.
8. The substrate processing apparatus according to claim 7 , wherein:
the heat sink includes a bottom surface and an inclined surface that is finished to be inclined downward in a radial direction from the axis of rotation; and
the bottom surface of the light emitting element is supported by the inclined surface of the heat sink.