IP Library Granted Patent US 12,652,989
Granted Patent B2
US 12,652,989 · App. 17/543,761 · Granted Jun 9, 2026

Supporting unit and substrate treating apparatus including the same

Inventors: Kang Seop Yun (Cheonan-si, KR); Chul Goo Kim (Sejong-si, KR); Jung Bong Choi (Suwon-si, KR); Soo Han Song (Goyang-si, KR)
Assignee: SEMES CO., LTD.
H01L21/67115H01L21/67051H01L21/6708H01L21/68785H01L21/6875H01L21/68792
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,652,989
App. No.
17/543,761
Granted
Jun 9, 2026
Kind
B2
Abstract

The inventive concept provides a substrate support unit comprising a chuck supporting and rotating a substrate; and a lamp unit provided below the substrate to heat the substrate, wherein the lamp unit comprises a first lamp having a reflective layer on the surface thereof, to block and/or reflect a light which is emitted from the first lamp but not directed to the substrate to direct the light to the substrate.

Claims (74)

1 . A substrate support unit supporting a substrate, the substrate support unit comprising:

a chuck supporting and rotating the substrate, wherein the chuck defines an inner space having an upper inner surface and a side inner surface connected to the upper inner surface;

a heating unit disposed within the inner space and provided below the upper inner surface of the inner space to heat the substrate, wherein the heating unit comprises a plurality of lamps along a plane parallel to the upper inner surface of the inner space, and wherein the plurality of lamps include a first lamp which is an outermost lamp among the plurality of lamps; and

a reflective layer provided on a first surface of the first lamp, wherein the reflective layer is provided only at the first lamp among the plurality of lamps and is disposed between the first surface of the first lamp and the side inner surface of the inner space,

wherein the reflective layer is disposed between the first surface of the first lamp and the side inner surface of the inner space,

wherein the heating unit further comprises:

a reflective plate disposed in the inner space of the chuck, and

wherein the reflective plate includes:

a body plate disposed under the plurality of lamps; and

a protrusion extending from an upper surface of the body plate toward the upper inner surface of the inner space, wherein the protrusion is disposed between a second surface, opposite to the first surface, of the first lamp and a second lamp adjacent to the first lamp.

2 . The substrate support unit of claim 1 ,

wherein the first surface of the first lamp has a first portion facing the side inner surface of the inner space and a second portion opposite to the first portion,

wherein the reflective layer is provided only in the first portion of the first portion and the second portion.

3 . The substrate support unit of claim 1 ,

wherein the protrusion further includes a curved side surface facing the first lamp and a side surface opposite to the curved side surface and facing the second lamp,

wherein the side surface of the protrusion extends vertically from the upper surface of the body plate toward the upper inner surface of the inner space, and

wherein the protrusion has a decreasing width between the curved side surface and the side surface thereof from the upper surface of the body plate toward the upper inner surface of the inner space.

4 . The substrate support unit of claim 3 ,

wherein the reflective layer is adjacent to the first lamp and reflects lights that are emitted from the first lamp toward the side inner surface of the inner space so that the reflected lights are directed toward the upper inner surface of the inner space.

5 . The substrate support unit of claim 1 ,

wherein the first lamp is provided as a ring shape and emits lights radially,

wherein the reflective layer reflects part of lights directed toward the side inner surface of the inner space so that the reflected lights are directed toward the upper inner surface of the inner space.

6 . A substrate treating apparatus comprising:

a bowl having an inner processing space;

a support unit supporting a substrate within the inner processing space of the bowl; and

a liquid supply unit supplying a treating liquid to the substrate supported by the support unit,

wherein the support unit comprises:

a chuck supporting and rotating a substrate, wherein the chuck defines an inner space having an upper inner surface and a side inner surface connected to the upper inner surface;

a heating unit disposed within the inner space and provided below the upper inner surface of the inner space to heat the substrate, wherein the heating unit comprises a plurality of lamps along a plane parallel to the upper inner surface of the inner space, wherein the plurality of lamps includes a first lamp which is an outermost lamp among the plurality of lamps; and

a reflective layer provided on a first surface of the first lamp, and

wherein the reflective layer is provided only at the first lamp among the plurality of lamps and is disposed between the first surface of the first lamp and the side inner surface of the inner space,

wherein the heating unit further comprises:

a reflective plate disposed in the inner space of the chuck, and

wherein the reflective plate includes:

a body plate disposed under the plurality of lamps; and

a protrusion extending from an upper surface of the body plate toward the upper inner surface of the inner space, wherein the protrusion is disposed between a second surface, opposite to the first surface, of the first lamp and a second lamp adjacent to the first lamp.

7 . The substrate treating apparatus of claim 6 ,

wherein the first lamp is provided as a ring shape,

wherein a surface of the first lamp has a first portion facing the side inner surface of the inner space and a second portion opposite to the first portion,

wherein the reflective layer is provided with the first portion only, and

wherein the first portion corresponds to the first surface.

8 . The substrate treating apparatus of claim 6 ,

wherein the chuck comprises a chuck stage and a transmission plate in combination defining the inner space, and

wherein the transmission plate is adjacent to the substrate and is transparent.

9 . The substrate treating apparatus of claim 8 , further comprising:

a chuck pin upwardly protruding from the chuck stage during processing and supporting an edge of the substrate.

10 . The substrate treating apparatus of claim 8 ,

wherein the heating unit is provided to be non-rotatory while the chuck is rotating.

11 . The substrate treating apparatus of claim 9 ,

wherein the reflective layer is adjacent to the first lamp and a first end portion of the reflective layer is located on a line passing a center of the first lamp and a contact point of the chuck pin at which the substrate supported by the chuck pin is to be placed.

12 . The substrate treating apparatus of claim 6 ,

wherein when viewed in a cross-sectional view, the protrusion includes a curved side surface facing the first lamp and a side surface opposite to the curved side surface.

13 . A substrate treating apparatus comprising:

a bowl with an inner processing space;

a support unit supporting a substrate inside the inner processing space of the bowl;

a liquid supply unit supplying a treating liquid to the substrate supported by the support unit,

wherein the support unit comprises:

a chuck stage supporting and rotating the substrate;

a heating unit heating the substrate supported by the chuck stage;

a transmission plate placed between the substrate supported by the support unit and the heating unit, transmitting a light emitted from the heating unit,

wherein the chuck stage and the transmission plate define an inner space having an upper inner surface and a side inner surface connected to the upper inner surface,

wherein the heating unit is disposed within the inner space and provided below the upper inner surface of the inner space to heat the substrate,

wherein the heating unit comprises a plurality of lamps along a plane parallel to the upper inner surface of the inner space, and

wherein the plurality of lamps include a first lamp which is an outermost lamp among the plurality of lamps and is provided as a ring shape;

a reflective layer provided on a first surface of the first lamp; and

a reflective plate disposed in the inner space,

wherein the reflective layer is provided only at the first lamp among the plurality of lamps and is disposed between the first surface of the first lamp and the side inner surface of the inner space,

wherein a surface of the first lamp has a first portion facing the side inner surface of the inner space and a second portion opposite to the first portion,

wherein the reflective layer is provided only in the first portion of the first portion and the second portion,

wherein the reflective layer partially covers an outer surface of the ring shape to direct lights emitted from the first lamp toward the upper inner surface of the inner space,

wherein the partially covered outer surface of the ring shape corresponds to the first surface of the first lamp, and

wherein the reflective plate includes:

a body plate disposed under the plurality of lamps; and

a protrusion extending from an upper surface of the body plate toward the upper inner surface of the inner space, wherein the protrusion is disposed between a second surface, opposite to the first surface, of the first lamp and a second lamp adjacent to the first lamp.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 7, 2021
From: YUN, KANG SEOP; KIM, CHUL GOO; CHOI, JUNG BONG; SONG, SOO HAN
To: SEMES CO., LTD.
Reel/Frame 058314/0094 →
Priority Claims (1)
KR 10-2020-0169609 · Dec 7, 2020 · national
Continuity (1)
Related Publication 20220181168A1 · Jun 9, 2022
References Cited (23)
US 4789771A · Robinson · 1988 [cited by examiner]
US 5294778A · Carman · 1994 [cited by examiner]
US 6108491A · Anderson · 2000 [cited by examiner]
US 6570134B2 · Suzuki · 2003 [cited by examiner]
US 6600138B2 · Hauf · 2003 [cited by examiner]
US 6638188B2 · Kleinpell · 2003 [cited by applicant]
US 6707011B2 · Tay et al. · 2004 [cited by applicant]
US 6746350B2 · Hartman · 2004 [cited by applicant]
US 7772527B2 · Choi · 2010 [cited by examiner]
US 11043403B2 · Kim · 2021 [cited by applicant]
US 20060291832A1 · Ito · 2006 [cited by examiner]
US 20150034133A1 · Kim · 2015 [cited by examiner]
US 20160013079A1 · Choi · 2016 [cited by examiner]
US 20160348240A1 · Burrows · 2016 [cited by examiner]
US 20190110336A1 · Cong · 2019 [cited by examiner]
US 20190311923A1 · Kim · 2019 [cited by examiner]
US 20190318946A1 · Kim · 2019 [cited by examiner]
CN 1507648 · 2004 [cited by applicant]
CN 110349885 · 2019 [cited by applicant]
KR 1020140047564 · 2014 [cited by applicant]
KR 1020170026901 · 2017 [cited by applicant]
KR 1020190117373 · 2019 [cited by applicant]
KR 1020190131916 · 2019 [cited by applicant]