Substrate support unit and substrate processing apparatus having the same including reflective member configured to reflect light toward substrate
The inventive concept relates to a substrate support unit. The substrate support unit includes a chuck stage having an inner space defined by a base surface and sidewalls, a heating unit provided in the inner space, the heating unit including a base plate having a disk shape with an opening in the center and a heat generation part mounted on the base plate and having heating light sources that emit light energy, a quartz window that covers the inner space and has an upper surface on which a substrate is placed, and a reflective member that reflects light energy lost in a lateral direction of the chuck stage toward the substrate.
1. An apparatus for supporting a substrate, the apparatus comprising:
a chuck stage having an inner space defined by a base surface and sidewalls;
a heating unit provided in the inner space, wherein the heating unit includes a base plate having a disk shape with an opening in the center and a heat generation part mounted on the base plate and having heating light sources configured to emit light energy;
a quartz window configured to cover the inner space, the quartz window having an upper surface on which the substrate is placed; and
a reflective member configured to reflect light energy lost in a lateral direction of the chuck stage toward the substrate.
2. The apparatus of claim 1 , wherein the reflective member is provided on an inner surface of an edge of the quartz window that surrounds the heat generation part.
3. The apparatus of claim 2 , wherein the inner surface of the edge of the quartz window is inclined so as to be closer to the center of the quartz window from top to bottom.
4. The apparatus of claim 2 , wherein the inner surface of the edge of the quartz window is formed to be concave toward an edge of the substrate.
5. The apparatus of claim 1 , wherein the reflective member is formed of a reflective plate or a reflective coating film.
6. The apparatus of claim 1 , further comprising:
a rotary part combined with the chuck stage to rotate the chuck stage, the rotary part having a hollow shape; and
a back nozzle inserted through the rotary part and located in the center of an upper portion of the chuck stage, the back nozzle being configured to spray a processing liquid onto a rear surface of the substrate.
7. The apparatus of claim 2 , wherein the heating light sources are formed of ring-shaped lamps concentrically arranged at different radii with respect to the center of the base plate.
8. The apparatus of claim 7 , wherein the base plate is formed of a reflector configured to reflect light energy of the lamps upwards.
9. The apparatus of claim 8 , wherein the base plate includes reflective protrusions located below the lamps and protruding in a protrusion shape to spread the light energy radiating from the lamps.
10. The apparatus of claim 9 , wherein each of the reflective protrusions has a triangular cross-section that becomes gradually wider away from the corresponding lamp.
11. The apparatus of claim 1 , wherein the base plate further includes an inclined reflective surface provided on a central portion of the base plate to increase a degree of concentration of light on a central region of the substrate.
12. The apparatus of claim 1 , wherein the base plate further includes a convex reflective surface provided on a central portion of the base plate to increase a degree of concentration of light on a central region of the substrate.
13. The apparatus of claim 1 , wherein the reflective member is provided on an inner surface of an edge of the quartz window that surrounds the heat generation part, and includes a curved reflective surface to concentrate the light energy of the heating light sources on a target at a predetermined location in an edge region of the substrate.
14. The apparatus of claim 13 , wherein a longitudinal section of the curved reflective surface has the shape of part of an ellipse.
15. The apparatus of claim 13 , wherein a longitudinal section of the curved reflective surface is part of an elliptical section with a luminous point of the heating light source and the target as two focal points of an ellipse.
16. The apparatus of claim 13 , wherein the target is located close to the center of a patterned section in the edge region of the substrate, other than an un-patterned section in the edge region thereof.
17. An apparatus for processing a substrate, the apparatus comprising:
a processing vessel that is open at the top;
a substrate support unit located in the processing vessel and configured to support the substrate;
a processing liquid supply unit configured to supply a processing liquid to the substrate placed on the substrate support unit; and
a heating unit provided in the substrate support unit and configured to emit light energy for heating the substrate,
wherein the substrate support unit includes:
a chuck stage having an inner space defined by a base surface and sidewalls;
a quartz window configured to cover the inner space, the quartz window having an upper surface on which the substrate is placed; and
a reflective member configured to reflect light energy lost in a lateral direction of the chuck stage toward the substrate.
18. The apparatus of claim 17 , wherein the reflective member is provided on an inner surface of an edge of the quartz window that surrounds a heat generation part.
19. The apparatus of claim 18 , wherein the inner surface of the edge of the quartz window is inclined so as to be closer to the center of the quartz window from top to bottom, or is formed to be concave toward an edge of the substrate.
20. The apparatus of claim 17 , wherein the heating unit includes:
a heat generation part provided in the substrate support unit and having ring-shaped lamps concentrically arranged at different radii with respect to the center of the substrate support unit; and
a reflective plate having reflective protrusions located below the lamps, the reflective protrusions protruding in a protrusion shape to spread light energy radiating from the lamps.
21. The apparatus of claim 20 , wherein the substrate support unit further includes:
a rotary part combined with the chuck stage to rotate the chuck stage, the rotary part having a hollow shape; and
a back nozzle inserted through the rotary part and located in the center of an upper portion of the chuck stage, the back nozzle being configured to spray a processing liquid onto a rear surface of the substrate, and
wherein each of the reflective protrusions is formed in a ring shape that has the same diameter as the corresponding lamp, the reflective protrusion having a triangular cross-section that becomes gradually wider away from the corresponding lamp.
22. The apparatus of claim 20 , wherein the reflective plate further includes a reflective surface provided on a central portion of the reflective plate to increase a degree of concentration of light on a central region of the substrate.
23. The apparatus of claim 22 , wherein the reflective surface has the shape of any one of a flat surface, a concave curved surface, or a convex curved surface.
24. The apparatus of claim 17 , wherein the reflective member is provided on an inner surface of an edge of the quartz window that surrounds a heat generation part, and includes a curved reflective surface to concentrate the light energy of a heating light sources on a target at a predetermined location in an edge region of the substrate.
25. The apparatus of claim 24 , wherein a longitudinal section of the curved reflective surface has the shape of part of an ellipse.
26. The apparatus of claim 24 ,
wherein a longitudinal section of the curved reflective surface is part of an elliptical section with a luminous point of the heating light source and the target as two focal points of an ellipse.
27. The apparatus of claim 24 , wherein the target is located close to the center of a patterned section in the edge region of the substrate, other than an un-patterned section in the edge region thereof.