Substrate treatment apparatus having heating part
The present disclosure relates to a substrate treatment apparatus including: a chuck base having a ring-shaped spin chuck with chuck pins disposed on top thereof to support a substrate and a chuck support part located on the lower portion of the inner peripheral surface of the spin chuck; a back nozzle assembly mounted through a hollow portion formed at the center of the chuck base to spray treatment liquid onto a lower surface of the substrate; cover glass disposed between top of the spin chuck and the back nozzle assembly; and a heating part located inside the inner peripheral surface of the spin chuck in a space between the cover glass and the chuck support part, wherein the spin chuck is separably coupled to the chuck support part in an up-down direction.
1 . A substrate treatment apparatus having a heating part, comprising:
a chuck base having a ring-shaped spin chuck with chuck pins disposed on top thereof to support a substrate and a chuck support part located on a lower portion of an inner peripheral surface of the spin chuck;
a back nozzle assembly mounted through a hollow portion formed at a center of the chuck base to spray treatment liquid onto a lower surface of the substrate;
a cover glass disposed between a top of the spin chuck and the back nozzle assembly; and
a heating part located inside the inner peripheral surface of the spin chuck in a space between the cover glass and the chuck support part,
wherein the spin chuck is separably coupled to the chuck support part in an up-down direction.
2 . The substrate treatment apparatus according to claim 1 , wherein the chuck support part has a plurality of locking groove supports spaced apart from one another along an outer peripheral surface thereof, and the spin chuck has a plurality of locking protrusions protruding from the inner peripheral surface thereof in such a way as to be separably lockedly inserted into the locking groove supports in the up-down direction by means of fastening members.
3 . The substrate treatment apparatus according to claim 2 , wherein each locking groove support is formed by a groove concavely formed toward an inside of an outer peripheral surface of an upper portion of the chuck support part and a shelf part formed on a bottom of the groove in a thickness direction of the chuck support part, and the locking protrusions have complementary side peripheral surfaces to the locking groove supports.
4 . The substrate treatment apparatus according to claim 3 , wherein the fastening members are fixing bolts passing through the locking protrusions in up-down directions in such a way as to be fastened to the shelf part of the locking groove supports.
5 . The substrate treatment apparatus according to claim 2 , wherein tops of the locking protrusions are located on a same plane as tops of the chuck support part in a state where the locking protrusions and the locking groove supports are coupled to one another, and the fastening members are prevented from protruding from a top of the locking protrusions.
6 . The substrate treatment apparatus according to claim 2 , wherein an outer peripheral surface of the heating part has a shape corresponding to the inner peripheral surface of the spin chuck, and the heating part has a plurality of first grooves formed along the outer peripheral surface thereof to pass the locking protrusions therethrough.
7 . The substrate treatment apparatus according to claim 6 , further comprising a heat sink contacting a lower surface of the heating part, an outer peripheral surface of the heat sink having a shape that matches the outer peripheral surface of the heating part and having a plurality of second grooves formed along the outer peripheral surface of the heat sink to pass the locking protrusions therethrough.