Rotating target for extreme ultraviolet source with liquid metal
An extreme ultraviolet (EUV) light source includes a vacuum chamber with a rotating target assembly therein. The rotating target assembly has an annular groove with a distal wall relative to an axis of rotation. The distal wall includes a porous region. The rotating target assembly is rotated to form a target by centrifugal force with a layer of molten metal on a distal wall of an annular groove in the rotating target assembly.
1. A system comprising:
a vacuum chamber; and
a rotating target assembly having an annular groove with a distal wall relative to an axis of rotation, wherein the rotating target is disposed in the vacuum chamber, and wherein the distal wall includes a porous region.
2. The system of claim 1 , wherein the rotating target assembly has a proximal wall opposite the distal wall to form the annular groove.
3. The system of claim 1 , further comprising a rotation system coupled with the rotating target assembly, wherein the rotation system is configured to rotate the rotating target assembly around the axis of rotation.
4. The system of claim 1 , wherein the vacuum chamber includes an input window and an output window or an input window and optics.
5. The system of claim 4 , wherein a proximal wall of the annular groove is configured to provide a line of sight between the distal wall and both the input window and the output window or both the input window and the optics during laser pulses.
6. The system of claim 1 , further comprising a laser source configured to direct a laser beam at the distal wall.
7. The system of claim 1 , further comprising a molten metal disposed inside the annular groove.
8. The system of claim 7 , wherein the molten metal is disposed on the porous region.
9. The system of claim 1 , wherein the porous region has pores that are less than 1 mm in diameter.
10. The system of claim 1 , wherein the porous region has a thickness from 1-5 mm extending into the annular groove from the distal wall.
11. The system of claim 1 , wherein the porous region is fabricated of titanium, stainless steel, aluminum, or molybdenum.
12. The system of claim 1 , wherein the porous region has a varying depth across the distal wall.
13. A method comprising:
rotating a rotating target assembly in a vacuum chamber thereby forming a target by centrifugal force as a layer of molten metal is disposed on a distal wall of an annular groove in the rotating target assembly, wherein the distal wall includes a porous region;
directing a pulsed laser beam through an input window of the vacuum chamber;
irradiating the target on the distal wall with the pulsed laser beam; and
directing a generated short-wavelength radiation beam from the target.
14. The method of claim 13 , wherein a proximal wall of the annular groove is configured to provide a line of sight between the distal wall and both the input window and an output window or both the input window and optics during the directing.
15. The method of claim 13 , wherein the molten metal is disposed on the porous region.
16. The method of claim 13 , wherein the porous region has pores that are less than 1 mm in diameter.
17. The method of claim 13 , wherein the porous region has a thickness from 1-5 mm extending into the annular groove.
18. The method of claim 13 , wherein the porous region is fabricated of titanium, stainless steel, aluminum, or molybdenum.
19. The method of claim 13 , wherein the porous region is disposed under a surface of the target during the rotating.
20. The method of claim 13 , wherein the layer of molten metal has a depth larger than a height of the porous region in a direction perpendicular to an axis of rotation of the rotating target assembly during the rotating.
21. The method of claim 13 , wherein the short-wavelength radiation beam is directed through an output window of the vacuum chamber or through optics in the vacuum chamber.