Extreme ultraviolet (EUV) radiation source apparatus, EUV lithography system, and method for generating extreme ultraviolet radiation
An EUV radiation source apparatus includes an EUV source vessel; a tin layer disposed in the EUV source vessel; a chamber disposed adjacent to the EUV source vessel; and a first filter disposed in the chamber, wherein the first filter includes a membrane and a mesh disposed on the membrane, and the membrane and the mesh are integrally formed. A method for generating EUV radiation includes: forming a first filter including a membrane and a mesh integrally formed with the membrane; disposing the first filter in a chamber adjacent to an EUV source vessel; and collecting fuel debris on the first filter in the chamber.
1 . An extreme ultraviolet (EUV) radiation source apparatus, comprising:
an EUV source vessel;
a tin layer disposed in the EUV source vessel;
a chamber disposed adjacent to the EUV source vessel;
a first filter disposed in the chamber, wherein the first filter is a debris filter and is configured to collect a first fuel debris generated from a collision of a laser beam and the tin layer; and
a rotatable carrier on which the first filter is disposed, wherein the rotatable carrier is configured to rotate the first filter about a center of the first filter so that a second fuel debris is collected on a fresh portion of the first filter, and
wherein the first filter includes a membrane and a mesh disposed on the membrane, and the membrane and the mesh are integrally formed.
2 . The apparatus of claim 1 , further comprising:
a first mirror disposed in the chamber,
wherein the first filter is disposed between the tin layer and the first mirror.
3 . The apparatus of claim 2 , wherein the first filter includes silicon.
4 . The apparatus of claim 1 , further comprising:
a first mirror disposed in the chamber; and
a second mirror disposed in the chamber and adjacent to the first mirror;
a second filter disposed between the first mirror and the second mirror.
5 . The apparatus of claim 4 , wherein the second filter is disposed at an aperture position.
6 . The apparatus of claim 4 , wherein the second filter is an out-of-band radiation filter.
7 . The apparatus of claim 4 , wherein the second filter includes silicon, EUV pellicles or zirconium.
8 . The apparatus of claim 1 , wherein the mesh is a hexagonal wire mesh.
9 . The apparatus of claim 1 , wherein a profile of a wire of the mesh is trapezoidal from a cross-sectional view.
10 . The apparatus of claim 1 , further comprising:
a second filter disposed adjacent to the first filter;
wherein the second filter is attached to the rotatable carrier.
11 . An extreme ultraviolet (EUV) radiation source apparatus, comprising:
a chamber;
an EUV source configured to supply an EUV radiation having an EUV light path traveling along the chamber through an exit port;
a first filter located in the EUV light path and configured to allow the EUV radiation to pass through; and
a rotatable carrier on which the first filter is disposed, wherein the first filter is a debris filter, and the rotatable carrier is configured to rotate the first filter about a center of the first filter after a used portion of the first filter is contaminated by a fuel debris generated from the EUV source, and
wherein the first filter includes a first membrane and a first mesh integrally formed with the first membrane.
12 . The apparatus of claim 11 , further comprising:
a mirror located in the EUV light path and within the chamber,
wherein the first filter is disposed between the mirror and the exit port.
13 . The apparatus of claim 11 , further comprising:
a reticle disposed in the chamber;
a mirror located in the EUV light path and disposed between the reticle and the exit port;
a second filter,
wherein the second filter is an out-of-band radiation filter and is disposed between the mirror and the reticle.
14 . The apparatus of claim 11 , further comprising:
a reticle disposed in the chamber;
a mirror located in the EUV light path and disposed between the reticle and the exit port; and
a second filter disposed between the mirror and the reticle,
wherein the first filter is disposed between the mirror and the exit port, and the second filter includes a second membrane and a second mesh integrally formed with the second membrane.
15 . A method for generating extreme ultraviolet (EUV) radiation, comprising:
forming a first filter including a membrane and a mesh integrally formed with the membrane;
disposing the first filter in a chamber adjacent to an EUV source vessel;
collecting a first fuel debris on a first portion of the first filter in the chamber;
rotating the first filter about a center of the first filter; and
collecting a second fuel debris on a second portion, different from the first portion, of the first filter.
16 . The method of claim 15 , further comprising:
providing an EUV light path in the chamber,
wherein the first filter is disposed in the EUV light path.
17 . The method of claim 15 , further comprising:
disposing the first filter on a rotatable carrier in the chamber;
disposing a second filter on the rotatable carrier and adjacent to the first filter;
rotating the rotatable carrier after the first fuel debris and the second fuel debris are collected on the first filter; and
collecting a third fuel debris on the second filter.
18 . The method of claim 15 , further comprising:
transmitting an EUV radiation through the first filter,
wherein a transmittance of the first filter is greater than 60%.
19 . The method of claim 15 , further comprising:
providing a mirror in the chamber, wherein the first filter is disposed between the mirror and the EUV source vessel;
providing a reticle in the chamber;
providing a second filter between the mirror and the reticle; and
transmitting an EUV radiation through the first filter and the second filter,
wherein a total transmittance of the first filter and the second filter is greater than 60%.
20 . The method of claim 15 , wherein the first filter is rotated at a predetermined interval.