Granted Patent B2

US 12,193,734 · App. 17/886,685 · Granted Jan 14, 2025

Inventors: Mirko Georgiev Mirkov (Chelmsford, MA); Rafael Armando Sierra (Palmer, MA)

Assignee: CYNOSURE, LLC

A61B18/203A61N5/0616H01S3/0627H01S3/08018H01S3/094076H01S3/1024H01S3/1106H01S3/1109H01S3/1121A61B2018/0047A61N5/067H01S3/0092H01S3/08054H01S3/093H01S3/094038H01S3/094084H01S3/107H01S3/1611H01S3/1623H01S3/1633H01S3/1643H01S3/1673

Abstract

Claims (45)

1. An apparatus for delivery of pulsed treatment radiation comprising:

a pump radiation source generating pumping pulses at a first wavelength,

a wavelength-shifting oscillator defining a resonant cavity comprising a first laser gain material, and

an optical amplifier comprising a second laser gain material that is different from the first laser gain material, wherein the oscillator output wavelength varies in response to controlled temperature changes, wherein the oscillator temperature is controlled to emit a maximum energy amplified output pulse from the optical amplifier at a second wavelength.

2. The apparatus of claim 1 , wherein the resonant cavity of the wavelength-shifting oscillator has a round trip time shorter than the duration of the pumping pulses.

3. The apparatus of claim 1 , wherein the oscillator output wavelength varies with the peak amplification wavelength of the optical amplifier.

4. The apparatus of claim 1 , wherein the oscillator output second wavelength varies so that the amplified output pulse has minimal pulse duration.

5. The apparatus of claim 1 , wherein the pumping pulses at the first wavelength are sub nanosecond pulses.

6. The apparatus of claim 1 , wherein the oscillator temperature is controlled to range between about 0° C. and about 100° C.

7. The apparatus of claim 1 , wherein the oscillator temperature is controlled to range between about 20° C. and about 80° C.

8. The apparatus of claim 1 , wherein the oscillator temperature is controlled to range between about 30° C. and about 70° C.

9. The apparatus of claim 1 , wherein the wavelength-shifting oscillator operates without use of a modelocker or a Q-switch.

10. The apparatus of claim 1 , wherein the wavelength-shifting oscillator emits a subnanosecond pulse.

11. The apparatus of claim 1 , wherein a lasing medium of the wavelength-shifting oscillator comprises a neodymium-doped crystal.

12. The apparatus of claim 1 , wherein a lasing medium of the wavelength-shifting oscillator comprises a solid state crystal medium selected from the group consisting of neodymium-doped yttrium-aluminum garnet (Nd:YAG) crystals, neodymium-doped pervoskite (Nd:YAP or Nd:YAlO 3 ) crystals, and neodymium-doped yttrium-lithium-fluoride (Nd:YAF) crystals.

13. The apparatus of claim 1 , wherein a lasing medium of the wavelength-shifting oscillator comprises a neodymium-doped, vanadate (Nd:YVO 4 ) crystal.

14. The apparatus of claim 1 further comprising a polarizer embedded within the wavelength-shifting oscillator.

15. The apparatus of claim 1 , wherein a lasing medium of the wavelength-shifting oscillator is a polarizing medium.

16. The apparatus of claim 1 further comprising a frequency-doubling crystal.

17. The apparatus of claim 16 , wherein the frequency-doubling crystal comprises a nonlinear crystal material.

18. The apparatus of claim 16 , wherein the frequency-doubling waveguide comprises a lithium triborate (LiB 3 O 5 ) material or a KTP material.

19. The apparatus of claim 1 , wherein the pump radiation source is a mode-locked laser.

20. The apparatus of claim 19 , wherein the mode-locked laser comprises an alexandrite laser.

21. The apparatus of claim 19 , wherein the mode-locked laser generates pulsed laser energy having at least about 100 mJ/pulse.

22. The apparatus of claim 1 further comprising a treatment beam delivery system configured to apply a treatment beam in the form of the second wavelength to a target tissue.

23. The apparatus of claim 1 , wherein the wavelength-shifting oscillator emits a laser energy having at least about 100 mJ/pulse.

24. The apparatus of claim 1 further comprising a second harmonic generator, wherein the pulsed treatment radiation at the second wavelength from the optical amplifier is transmitted through the second harmonic generator and is converted to a third wavelength.

25. The apparatus of claim 24 , wherein the wavelength-shifting oscillator followed by the optical amplifier and the second harmonic generator emits a laser energy having at least about 100 mJ/pulse.

26. A method of delivering pulsed treatment radiation comprising:

generating pumping pulses, using a pump radiation source, wherein one or more pumping pulses are at a first wavelength and a first pulse duration;

transmitting the pumping pulses to a wavelength-shifting oscillator and then from the oscillator to an optical amplifier, the oscillator comprising a first laser gain material;

varying the temperature of the first laser gain material such that the oscillator output wavelength varies;

controlling the temperature of the first laser gain material to emit a maximum energy output from the optical amplifier; and

emitting pulsed treatment radiation at a second wavelength from the optical amplifier, the optical amplifier comprising a second laser gain material that is different from the first laser gain material.

27. The method of claim 26 further comprising applying a treatment beam to a patient, the treatment beam comprising pulsed treatment radiation.

28. The method of claim 26 wherein the pulsed treatment radiation comprises a subnanosecond pulse.

29. The method of claim 26 further comprising applying one or more subnanosecond pulses to a patient.

30. The method of claim 26 further comprising applying one or more subnanosecond pulses to a tattoo or a region of skin pigmentation.

31. The method of claim 26 , wherein the optical amplifier emits a laser energy having at least about 100 mJ/pulse.

32. The method of claim 26 , further comprising a second harmonic generator, wherein the pulsed treatment radiation at the second wavelength from the optical amplifier is transmitted through the second harmonic generator and is converted to a third wavelength.

33. The method of claim 32 , wherein the wavelength-shifting oscillator followed by the optical amplifier and the second harmonic generator emits a laser energy having at least about 100 mJ/pulse.

34. A system for generating picosecond pulses, the system consisting essentially of:

a pump radiation source generating pumping pulses at a first wavelength,

a wavelength-shifting oscillator defining a resonant cavity comprising a first laser gain material, and

an optical amplifier comprising a second laser gain material that is different from the first laser gain material, wherein the oscillator output wavelength varies in response to controlled temperature changes, wherein the oscillator temperature is controlled to emit a maximum energy amplified output pulse from the optical amplifier at a second wavelength.

Assignments (2)

Continuity (7)

References Cited (400)