Granted Patent B2

US 12,195,877 · App. 17/778,923 · Granted Jan 14, 2025

Inventors: Silvio Preti (Baranzate, IT); Maurilio Meschia (Baranzate, IT)

Assignee: LPE S.P.A.

C30B25/16C30B25/08C30B25/12C30B25/14

Abstract

Claims (19)

1. A reaction chamber for an epitaxial reactor, comprising:-a susceptor element ( 3 ) comprising a curved slab ( 32 ) and a plane slab ( 31 ) forming a cylindrical body with a pass-through hole ( 30 ) along a longitudinal axis thereof,-a device for supporting substrates in the reaction chamber, the device comprising

a disc-shaped element ( 422 ) having a first face ( 422 A) adapted to be upperly positioned when the device is being used and a second face ( 422 B) adapted to be lowerly positioned when the device is being used, said disc-shaped element ( 422 ) being adapted to receive a gas flow to rotate the device about an axis thereof,

a substrate support element ( 424 ) in a single piece with said disc-shaped element ( 422 ) and adjacent to said first face ( 422 A),

a shaft ( 426 ) defining an axis (X) of the shaft in a longitudinal direction, the shaft ( 426 ) coaxial to said disc-shaped element ( 422 ), in a single piece with said disc-shaped element and having a first end ( 426 A) at said second face ( 422 B);

wherein said shaft ( 426 ) has at a second end ( 426 B) thereof at least a protrusion ( 428 A) whose rotation is adapted to be detected by a pyrometer ( 430 ) or a thermographic camera, and

wherein the shaft ( 426 ) crosses the plane slab ( 31 ) of the susceptor element ( 3 ) and the protrusion ( 428 A) is located inside the pass-through hole ( 30 );

wherein the longitudinal direction of the axis (X) of the shaft extends transverse to a longitudinal axis of the pass-through hole ( 30 ) of the susceptor element ( 3 );

wherein the disc-shaped element is rotatably housed in a seat of the plane slab ( 31 ): and

wherein the plane slab ( 31 ) has an inner duct ( 416 ) within the plane slab ( 31 ) adapted to let flow the gas flow to rotate said device for supporting substrates.

2. The reaction chamber according to claim 1 , wherein the rotation of said at least a protrusion is adapted to be detected by a pyrometer.

3. The reaction chamber according to claim 1 , wherein said shaft has two protrusions or three protrusions or four protrusions at a second end thereof whose rotation is adapted to be detected by a pyrometer or by a thermographic camera, said protrusions being equal between them.

4. The reaction chamber according to claim 1 , wherein said at least a protrusion is a plate extending perpendicularly to an axis of the shaft.

5. The reaction chamber according to claim 1 , wherein the disc-shaped element, the substrate support, and the shaft are entirely made of graphite.

6. The reaction chamber according to claim 1 , wherein said shaft is mechanically fixed to said disc-shaped element.

7. The reaction chamber according to claim 1 , wherein said protrusion is mechanically fixed to said shaft.

8. The reaction chamber according to claim 1 , comprising a protection socket surrounding said shaft for a portion thereof.

9. The reaction chamber according to claim 1 , wherein said seat plane slab has a pass-through hole traversed by the shaft of said device.

10. The reaction chamber of claim 1 , comprising a control electronic unit electrically connected to the thermographic camera or a pyrometer, and adapted to estimate or determine a rotation speed of a substrate-supporting device of said reaction chamber based on electrical signals received from said thermographic camera or from said pyrometer.

11. The reaction chamber of claim 10 , wherein said control electronic unit is electrically connected to a Mass Flow Controller of said reaction chamber and is adapted to set a rotation gas flow based on said estimated or determined rotation speed.

Assignments (1)

Priority Claims (1)

Continuity (1)

References Cited (31)