IP Library Granted Patent US 12,198,752
Granted Patent B2
US 12,198,752 · App. 18/206,422 · Granted Jan 14, 2025

High density memory with reference memory using grouped cells and corresponding operations

Inventors: Teng-Hao Yeh (Hsinchu, TW); Hang-Ting Lue (Hsinchu, TW); Cheng-Lin Sung (Taichung, TW); Yung-Feng Lin (Taoyuan, TW)
Assignee: MACRONIX INTERNATIONAL CO., LTD.
G11C11/4091G11C11/4074G11C11/4085G11C11/4094G11C11/4099G11C16/102G11C16/28
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Quick Facts
Patent No.
US 12,198,752
App. No.
18/206,422
Granted
Jan 14, 2025
Kind
B2
Abstract

A memory device includes a high density or 3D data memory and a 3D reference memory. The reference memory is used to generate a reference signal used to sense data in the data memory. Conversion circuitry converts signals from one memory cell or a group of memory cells in the reference memory into a reference signal. The reference signal is applied to a sense amplifier to sense data stored in a selected memory cell in the data memory.

Claims (47)

1. A memory, comprising:

a data memory comprising a plurality of memory cells on a plurality of bit lines;

a reference memory comprising a plurality of memory cells;

conversion circuitry to convert signals from a group of memory cells including more than one member in the plurality of memory cells in the reference memory into a reference signal; and

a sense amplifier, connected to the conversion circuitry and to a bit line in the plurality of bit lines in the data memory, to sense data stored in a selected memory cell in the data memory in response to comparison of a data signal from the selected memory cell and the reference signal,

wherein the memory includes first and second physically distinct regions, the first physically distinct region of the memory respectively comprising a first physically distinct portion of the reference memory and a first physically distinct portion of the data memory and the second physically distinct region of the memory respectively comprising a second physically distinct portion of the reference memory and a second physically distinct portion of the data memory, each of the first and the second physically distinct portions of the reference memory having one or more of the plurality of memory cells in the reference memory and each of the first and the second physically distinct portions of the data memory having one or more of the plurality of memory cells in the data memory,

wherein the conversion circuitry comprises a switch enabling, responsive to the selected memory cell being from the first physically distinct portion of the data memory of the first physically distinct region of the memory, selecting the group of memory cells from the first physically distinct portion of the reference memory of the first physically distinct region of the memory,

wherein the memory further comprises on chip control circuits to control a threshold voltage trim operation for the reference memory to a current level that is a factor higher than a target sensing current, and

wherein the threshold voltage trim operation affects at least some of the plurality of memory cells in the first physically distinct portion of the reference memory and at least some of the plurality of memory cells in the second physically distinct portion of the reference memory.

2. The memory of claim 1 , wherein the group of memory cells is disposed on a plurality of local reference bit lines and the plurality of local reference bit lines are connectable together for program operations in the reference memory.

3. The memory of claim 1 ,

wherein the reference memory comprises a stack structure including a plurality of slices, each slice including a stack of horizontal word lines in respective levels of the stack and a set of vertical conductors, the plurality of memory cells in the reference memory have horizontal channels between adjacent vertical conductors at the levels of horizontal word lines in the stack, and at least one of the plurality of slices includes the group of memory cells, and

wherein the switch is a first switch and the memory further comprises at least a second switch to disconnect at least one other one of the plurality of slices from the conversion circuitry.

4. The memory of claim 3 , wherein an edge layer of the stack is included in the first physically distinct region of the memory and an interior layer of the stack is included in the second physically distinct region of the memory.

5. The memory of claim 1 , wherein the memory includes a third physically distinct region that is physically distinct from the first and the second physically distinct regions of the memory, the third physically distinct region of memory comprising (i) a third physically distinct portion of the reference memory having one or more of the plurality of memory cells in the reference memory, and (ii) a third physically distinct portion of the data memory having one or more of the plurality of memory cells in the data memory.

6. The memory of claim 1 , further comprising a capacitor in a signal path from the reference memory to the conversion circuitry, the capacitor having a capacitance to compensate for different capacitances on paths from the reference memory and the data memory to the conversion circuitry.

7. The memory of claim 1 , wherein the conversion circuitry comprises a current-to-voltage converter and a current mirror circuit enabled to produce a reference current in response to combined current from the group of memory cells, the reference current being divided in magnitude by a ratio of relative effective transistor widths of two transistors of the current mirror circuit.

8. The memory of claim 7 , wherein the switch enables selectively connecting and disconnecting, to and from a current mirror gate reference, a reference tile.

9. The memory of claim 8 , further comprising an NMOS transistor having a gate terminal coupled to the current mirror gate reference and a drain terminal coupled to a current-to-voltage convertor to produce a voltage reference coupled to an input of the sense amplifier.

10. The memory of claim 1 , further comprising a current mirror circuit enabled to preserve process, voltage, and temperature (PVT) conditions in the reference memory.

11. The memory of claim 1 , wherein the data memory and the reference memory comprise respective matching memory structures in which a combination of signals from the plurality of memory cells in the reference memory tracks process, voltage, and temperature (PVT) characteristics of the plurality of memory cells in the data memory.

12. The memory of claim 1 , wherein the reference memory is configured to have process, voltage, and temperature (PVT) characteristics that match those of the data memory and the configuring comprises arranging the reference memory and the data memory to have a same three-dimensional arrangement.

13. The memory of claim 12 , wherein the configuring further comprises dimensioning the memory cells in the reference memory and the memory cells in the data memory to identical dimensions.

14. The memory of claim 12 ,

wherein the reference memory comprises a stack structure including a plurality of slices, each slice including a stack of horizontal word lines in respective levels of the stack and a set of vertical conductors, the plurality of memory cells in the reference memory have horizontal channels between adjacent vertical conductors at the levels of horizontal word lines in the stack, and at least one of the plurality of slices includes the group of memory cells,

wherein the configuring further comprises disposing an active one of the slices between dummy ones of the slices, and

wherein the active slice comprises the group of memory cells.

15. The memory of claim 12 , wherein the configuring further comprises including, in the first physically distinct region of the memory, the memory cells having relatively similar PVT conditions with respect to each other and including, in the second physically distinct region of the memory, the memory cells having relatively similar PVT conditions with respect to each other.

16. A memory, comprising:

a data memory comprising a plurality of memory cells on a plurality of bit lines;

a reference memory comprising a plurality of memory cells, the reference memory including inactive memory cells and an active group of memory cells, the active group of memory cells connected to local reference bit lines, and to a reference word line;

conversion circuitry to convert signals on the local reference bit lines from the active group of memory cells into a reference signal; and

a sense amplifier, connected to the conversion circuitry and to a bit line in the plurality of bit lines in the data memory, to sense data stored in a selected memory cell in the data memory in response to a data signal from the selected memory cell and the reference signal,

wherein the memory includes first and second physically distinct regions, the first physically distinct region of the memory respectively comprising a first physically distinct portion of the reference memory and a first physically distinct portion of the data memory and the second physically distinct region of the memory respectively comprising a second physically distinct portion of the reference memory and a second physically distinct portion of the data memory, each of the first and the second physically distinct portions of the reference memory having one or more of the plurality of memory cells in the reference memory and each of the first and the second physically distinct portions of the data memory having one or more of the plurality of memory cells in the data memory,

wherein the conversion circuitry comprises a switch enabling, responsive to the selected memory cell being from the first physically distinct portion of the data memory of the first physically distinct region of the memory, selecting the active group of memory cells from the first physically distinct portion of the reference memory of the first physically distinct region of the memory,

wherein the memory further comprises on chip control circuits to control a threshold voltage trim operation for the reference memory to a current level that is a factor higher than a target sensing current, and

wherein the threshold voltage trim operation affects at least some of the plurality of memory cells in the first physically distinct portion of the reference memory and at least some of the plurality of memory cells in the second physically distinct portion of the reference memory.

17. The memory of claim 16 , wherein an edge layer of a stack structure comprises the first physically distinct region of the memory and an interior layer of the stack structure comprises the second physically distinct region of the memory.

18. A method of sensing memory, comprising:

converting signals from a group of memory cells into a reference signal, wherein the group of memory cells includes more than one member of a plurality of memory cells in a reference memory of a memory; and

sensing data stored in a selected memory cell in response to comparison of a data signal from the selected memory cell and the reference signal, wherein the selected memory cell is in a data memory of the memory, the data memory comprises a plurality of memory cells on a plurality of bit lines, and the data signal is carried on one of the bit lines,

wherein the memory includes first and second physically distinct regions, the first physically distinct region of the memory respectively comprising a first physically distinct portion of the reference memory and a first physically distinct portion of the data memory and the second physically distinct region of the memory respectively comprising a second physically distinct portion of the reference memory and a second physically distinct portion of the data memory, each of the first and the second physically distinct portions of the reference memory having one or more of the plurality of memory cells in the reference memory and each of the first and the second physically distinct portions of the data memory having one or more of the plurality of memory cells in the data memory,

wherein the converting signals comprises selecting, responsive to the selected memory cell being from the first physically distinct portion of the data memory of the first physically distinct region of the memory, the group of memory cells from the first physically distinct portion of the reference memory of the first physically distinct region of the memory,

wherein the method further includes controlling a threshold voltage trim operation for the reference memory to a current level that is a factor higher than a target sensing current and reducing current by the factor using a current mirror circuit that is enabled to preserve process, voltage, and temperature (PVT) conditions in the reference memory, and

wherein the threshold voltage trim operation affects at least some of the plurality of memory cells in the first physically distinct portion of the reference memory and at least some of the plurality of memory cells in the second physically distinct portion of the reference memory.

19. The method of sensing memory of claim 18 , wherein the reference memory comprises a stack structure including a plurality of slices, each slice including a stack of horizontal word lines in respective levels of the stack and a set of vertical conductors, the plurality of memory cells in the reference memory have horizontal channels between adjacent vertical conductors at the levels of horizontal word lines in the stack, and at least one of the plurality of slices includes the group of memory cells; and wherein the method further comprises disconnecting at least one other one of the plurality of slices from circuitry that performs the converting signals.

20. The method of sensing memory of claim 18 , wherein the controlling the threshold voltage trim operation for the reference memory is performed by a wafer sort tool.

Continuity (2)
Continuation 17368705 · Jul 6, 2021
Related Publication 20230317143A1 · Oct 5, 2023
References Cited (180)
US 4219829A · Dorda et al. · 1980 [cited by applicant]
US 4987090A · Hsu et al. · 1991 [cited by applicant]
US 5293345A · Iwahashi · 1994 [cited by applicant]
US 5586073A · Hiura et al. · 1996 [cited by applicant]
US 6034882A · Johnson et al. · 2000 [cited by applicant]
US 6107882A · Gabara et al. · 2000 [cited by applicant]
US 6313486B1 · Kencke et al. · 2001 [cited by applicant]
US 6317362B1 · Nomura et al. · 2001 [cited by applicant]
US 6385097B1 · Liao et al. · 2002 [cited by applicant]
US 6486027B1 · Noble et al. · 2002 [cited by applicant]
US 6576385B2 · Bode et al. · 2003 [cited by applicant]
US 6593624B2 · Walker · 2003 [cited by applicant]
US 6829598B2 · Milev · 2004 [cited by applicant]
US 6906940B1 · Lue · 2005 [cited by applicant]
US 6960499B2 · Nandakumar et al. · 2005 [cited by applicant]
US 7081377B2 · Cleeves · 2006 [cited by applicant]
US 7129538B2 · Lee et al. · 2006 [cited by applicant]
US 7177169B2 · Scheuerlein · 2007 [cited by applicant]
US 7324381B2 · Gallo et al. · 2008 [cited by applicant]
US 7368358B2 · Ouyang et al. · 2008 [cited by applicant]
US 7646041B2 · Chae et al. · 2010 [cited by applicant]
US 7747668B2 · Nomura et al. · 2010 [cited by applicant]
US 7948024B2 · Kim et al. · 2011 [cited by applicant]
US 8045355B2 · Ueda · 2011 [cited by applicant]
US 8154128B2 · Lung · 2012 [cited by applicant]
US 8174865B2 · Rhie et al. · 2012 [cited by applicant]
US 8203187B2 · Lung et al. · 2012 [cited by applicant]
US 8275728B2 · Pino · 2012 [cited by applicant]
US 8331149B2 · Choi et al. · 2012 [cited by applicant]
US 8432719B2 · Lue · 2013 [cited by applicant]
US 8564045B2 · Liu · 2013 [cited by applicant]
US 8589320B2 · Breitwisch et al. · 2013 [cited by applicant]
US 8630114B2 · Lue · 2014 [cited by applicant]
US 8860124B2 · Lue et al. · 2014 [cited by applicant]
US 9064903B2 · Mitchell et al. · 2015 [cited by applicant]
US 9111617B2 · Shim et al. · 2015 [cited by applicant]
US 9147468B1 · Lue · 2015 [cited by applicant]
US 9177966B1 · Rabkin et al. · 2015 [cited by applicant]
US 9379129B1 · Lue et al. · 2016 [cited by applicant]
US 9397110B2 · Lue · 2016 [cited by applicant]
US 9401371B1 · Lee et al. · 2016 [cited by applicant]
US 9430735B1 · Vali et al. · 2016 [cited by applicant]
US 9431099B2 · Lee et al. · 2016 [cited by applicant]
US 9520485B2 · Lue · 2016 [cited by applicant]
US 9524980B2 · Lue · 2016 [cited by applicant]
US 9536969B2 · Yang et al. · 2017 [cited by applicant]
US 9589982B1 · Cheng et al. · 2017 [cited by applicant]
US 9698156B2 · Lue · 2017 [cited by applicant]
US 9698185B2 · Chen et al. · 2017 [cited by applicant]
US 9710747B2 · Kang et al. · 2017 [cited by applicant]
US 9754953B2 · Tang et al. · 2017 [cited by applicant]
US 9922716B2 · Hsiung et al. · 2018 [cited by applicant]
US 10043819B1 · Lai et al. · 2018 [cited by applicant]
US 10121553B2 · Harari · 2018 [cited by applicant]
US 10211218B2 · Lue · 2019 [cited by applicant]
US 10242737B1 · Lin et al. · 2019 [cited by applicant]
US 10403637B2 · Lue · 2019 [cited by applicant]
US 10777566B2 · Lue · 2020 [cited by applicant]
US 10790023B2 · Harari · 2020 [cited by applicant]
US 10910393B2 · Lai et al. · 2021 [cited by applicant]
US 11069704B2 · Lai et al. · 2021 [cited by applicant]
US 11710519B2 · Yeh · 2023 [cited by examiner]
US 20010055838A1 · Walker et al. · 2001 [cited by applicant]
US 20020028541A1 · Lee et al. · 2002 [cited by applicant]
US 20030122181A1 · Wu · 2003 [cited by applicant]
US 20040245547A1 · Stipe · 2004 [cited by examiner]
US 20050280061A1 · Lee · 2005 [cited by applicant]
US 20050287793A1 · Blanchet et al. · 2005 [cited by applicant]
US 20060072357A1 · Wicker · 2006 [cited by applicant]
US 20060233028A1 · Suitou et al. · 2006 [cited by applicant]
US 20070002639A1 · Ogawa et al. · 2007 [cited by applicant]
US 20070019469A1 · Motoki · 2007 [cited by applicant]
US 20070158736A1 · Arai et al. · 2007 [cited by applicant]
US 20080037336A1 · Kouno · 2008 [cited by applicant]
US 20080101109A1 · Haring-Bolivar et al. · 2008 [cited by applicant]
US 20080117678A1 · Shieh et al. · 2008 [cited by applicant]
US 20090097321A1 · Kim et al. · 2009 [cited by applicant]
US 20090122598A1 · Toda et al. · 2009 [cited by applicant]
US 20090184360A1 · Jin et al. · 2009 [cited by applicant]
US 20100182828A1 · Shima et al. · 2010 [cited by applicant]
US 20100202208A1 · Endo et al. · 2010 [cited by applicant]
US 20100270593A1 · Lung et al. · 2010 [cited by applicant]
US 20110018051A1 · Kim et al. · 2011 [cited by applicant]
US 20110063915A1 · Tanaka et al. · 2011 [cited by applicant]
US 20110106742A1 · Pino · 2011 [cited by applicant]
US 20110140070A1 · Kim · 2011 [cited by applicant]
US 20110286258A1 · Chen et al. · 2011 [cited by applicant]
US 20110297912A1 · Samachisa et al. · 2011 [cited by applicant]
US 20110299340A1 · Samachisa et al. · 2011 [cited by applicant]
US 20120033518A1 · Hung et al. · 2012 [cited by applicant]
US 20120044742A1 · Narayanan · 2012 [cited by applicant]
US 20120112264A1 · Lee et al. · 2012 [cited by applicant]
US 20120235111A1 · Osano et al. · 2012 [cited by applicant]
US 20130075684A1 · Kinoshita et al. · 2013 [cited by applicant]
US 20130119455A1 · Chen et al. · 2013 [cited by applicant]
US 20140063949A1 · Tokiwa · 2014 [cited by applicant]
US 20140119127A1 · Lung et al. · 2014 [cited by applicant]
US 20140149773A1 · Huang et al. · 2014 [cited by applicant]
US 20140192581A1 · Achter et al. · 2014 [cited by applicant]
US 20140268996A1 · Park · 2014 [cited by applicant]
US 20150008500A1 · Fukumoto et al. · 2015 [cited by applicant]
US 20150179661A1 · Huo et al. · 2015 [cited by applicant]
US 20150340369A1 · Lue · 2015 [cited by applicant]
US 20150364187A1 · Kim et al. · 2015 [cited by applicant]
US 20160005762A1 · Lue · 2016 [cited by applicant]
US 20160043100A1 · Lee et al. · 2016 [cited by applicant]
US 20160085444A1 · Tanzawa · 2016 [cited by applicant]
US 20160093366A1 · Lin · 2016 [cited by examiner]
US 20160141299A1 · Hong · 2016 [cited by applicant]
US 20160141337A1 · Shimabukuro et al. · 2016 [cited by applicant]
US 20160181315A1 · Lee et al. · 2016 [cited by applicant]
US 20160247579A1 · Jeda et al. · 2016 [cited by applicant]
US 20160308114A1 · Kim et al. · 2016 [cited by applicant]
US 20160329341A1 · Shimabukuro et al. · 2016 [cited by applicant]
US 20160336064A1 · Seo et al. · 2016 [cited by applicant]
US 20160343421A1 · Pyo · 2016 [cited by applicant]
US 20160358661A1 · Vali et al. · 2016 [cited by applicant]
US 20170084748A1 · Yang · 2017 [cited by applicant]
US 20170092370A1 · Harari · 2017 [cited by applicant]
US 20170148517A1 · Harari · 2017 [cited by applicant]
US 20170169887A1 · Widjaja · 2017 [cited by applicant]
US 20170243879A1 · Yu et al. · 2017 [cited by applicant]
US 20170270405A1 · Kurokawa · 2017 [cited by applicant]
US 20170287928A1 · Kanamori et al. · 2017 [cited by applicant]
US 20170309634A1 · Noguchi et al. · 2017 [cited by applicant]
US 20170316833A1 · Ihm et al. · 2017 [cited by applicant]
US 20170317096A1 · Shin et al. · 2017 [cited by applicant]
US 20180121790A1 · Kim et al. · 2018 [cited by applicant]
US 20180182776A1 · Kim · 2018 [cited by applicant]
US 20180350823A1 · Or-Bach et al. · 2018 [cited by applicant]
US 20190148393A1 · Lue · 2019 [cited by applicant]
US 20190220249A1 · Lee et al. · 2019 [cited by applicant]
US 20190244662A1 · Lee et al. · 2019 [cited by applicant]
US 20190286419A1 · Lin et al. · 2019 [cited by applicant]
US 20190319044A1 · Harari · 2019 [cited by applicant]
US 20190385656A1 · Lee · 2019 [cited by examiner]
US 20200026993A1 · Otsuka · 2020 [cited by applicant]
US 20200098784A1 · Nagashima et al. · 2020 [cited by applicant]
US 20200227432A1 · Lai et al. · 2020 [cited by applicant]
US 20200258572A1 · Bandyopadhyay et al. · 2020 [cited by applicant]
US 20200343252A1 · Lai et al. · 2020 [cited by applicant]
US 20200381450A1 · Lue et al. · 2020 [cited by applicant]
US 20210257035A1 · Pachamuthu · 2021 [cited by examiner]
US 20220343960A1 · Guo · 2022 [cited by examiner]
US 20230009065A1 · Yeh et al. · 2023 [cited by applicant]
US 20230317143A1 · Yeh et al. · 2023 [cited by applicant]
CN 109360593A · 2019 [cited by applicant]
TW 533528B · 2003 [cited by applicant]
TW I310559B · 2009 [cited by applicant]
WO 2017091338A1 · 2017 [cited by applicant]
EP Communication Pursuant to Article 94(3) from 21199663.2, dated Apr. 6, 2024, 11 pages. [cited by applicant]
Marotta et al., “Memory Circuit Technologies,” Chapter 3 of Nonvolatile Memory Technologies with Emphasis on Flash (book) Jan. 1, 2008, 90 pages. [cited by applicant]
U.S. Office Action from U.S. Appl. No. 17/368,700 dated Feb. 29, 2024, 13 pages. [cited by applicant]
Chen et al., “Eyeriss: an Energy-Efficient reconfigurable accelerator for deep convolutional neural networks,” IEEE ISSCC, Jan. 31-Feb. 4, 2016, 3 pages. [cited by applicant]
Choi et al., “Performance Breakthrough in NOR Flash Memory with Dopant-Segregated Schottky-Barrier (DSSB) Sonos Device”, 2009 Symposium onVLSI Technology Digest of Technical Papers, Jun. 16-18, 2009, pp. 1-2. [cited by applicant]
Gonugondla et al., “Energy-Efficient Deep In-memory Architecture for NAND Flash Memories,” IEEE International Symposium on Circuits and Systems (ISCAS), May 27-30, 2018, 5 pages. [cited by applicant]
Hsu et al., “Study of Sub-30nm Thin Film Transistor (TFT) Charge-Trapping (CT) Devices for 3D NAND Flash Application”, IEDM 2009 IEEE International, Dec. 7-9, 2009, p. 1-4. [cited by applicant]
Hubert et al., “A Stacked SONOS Technology, Up to 4 Levels and 6nm Crystalline Nanowires, With Gate-All-Around an Independent Gates (Flash), Suitable for Full 3D Integration,” IEEE 2009, Dec. 7-9, 2009, pp. 27.6.1-27.6.… [cited by applicant]
Jang et al., “Vertical Cell Array Using TCAT (Terabit Cell Array Transistor) Technology for Ultra High Density NAND Flash Memory,” 2009 Symposium on VLSI Technology Digest of Technical Papers, Jun. 16-18, 2009, pp. 192-… [cited by applicant]
Johnson et al., “512-Mb PROM With a Three-Dimensional Array of Diode/Antifuse Memory Cells,” IEEE Journal of Solid-State Circuits, vol. 38, No. 11, Nov. 2003, pp. 1920-1928. [cited by applicant]
Jung et al., “Three Dimensionally Stacked NAND Flash Memory Technology Using Stacking Single Crystal Si Layers on ILD and TANOS Structure for Beyond 30nm Node,” International Electron Devices Meeting, 2006. IEDM '06, De… [cited by applicant]
Katsumata et al., “Pipe-shaped BiCS flash memory with 16 stacked layers and multi-level-cell operation for ultra high density storage devices,” 2009 Symp. on VLSI Technology, Jun. 16-18, 2009, 2 pages. [cited by applicant]
Kim et al. “Novel Vertical-Stacked-Array-Transistor (VSAT) for Ultra-High-Density and Cost-Effective NAND Flash Memory Devices and SSD (Solid State Drive)”, Jun. 2009 Symposium on VLSI Technolgy Digest of Technical Pape… [cited by applicant]
Kim et al., “Multi-Layered Vertical Gate NAND Flash Overcoming Stacking Limit for Terabit Density Storage,” 2009 Symposium on VLSI Technology Digest of Technical Papers, Jun. 16-18, 2009, pp. 188-189. [cited by applicant]
Kim et al., “Novel 3-D Structure for Ultra High Density Flash Memory with VRAT (Vertical-Recess-Array-Transistor) and PIPE (Planarized Integration on the same PlanE),” IEEE 2008 Symposium on VLSI Technology Digest of Te… [cited by applicant]
Lai et al. “Highly Reliable MA BE-SONOS (Metal-Al203 Bandgap Engineered SONOS) Using a SiO2 Buffer Layer,” VLSI Technology, Systems and Applications 2008, VLSI-TSA International Symposium on Apr. 21-23, 2008, pp. 58-59. [cited by applicant]
Lai et al., “A Multi-Layer Stackable Thin-Film Transistor (TFT) NAND-Type Flash Memory,” Electron Devices Meeting, 2006, IEDM '06 International, Dec. 11-13, 2006, pp. 1-4. [cited by applicant]
Lue et al., “A Novel 3D AND-type NVM Architecture Capable of High-density, Low-power In-Memory Sum-of-Product Computation for Artificial Intelligence Application,” IEEE VLSI, Jun. 18-22, 2018, 2 pages. [cited by applicant]
Lue et al., “A Novel Buried-Channel FinFET BE-SONOS NAND Flash with Improved Memory Window and Cycling Endurance”, 2009 Symposium on VLSI Technology Digest of Technical Papers, p. 224-225. [cited by applicant]
Meena, et al., “Overview of emerging nonvolatile memory technologies,” Nanoscale Reearch Letters 9:526, Oct. 2, 2014, 34 pages. [cited by applicant]
Ohzone et al., “Ion-Implanted Thin Polycrystalline-Silicon High-Value Resistors for High-Density Poly-Load Static RAM Applications,” IEEE Trans. on Electron Devices, vol. ED-32, No. 9, Sep. 1985, 8 pages. [cited by applicant]
Paul et al., “Impact of a Process Variation on Nanowire and Nanotube Device Performance”, IEEE Transactions on Electron Devices, vol. 54, No. 9, Sep. 2007, p. 2369-2376. [cited by applicant]
Rincon-Mora, et al., “Bandgaps in the crosshairs: What's the trim target?” IEEE, The Georgia Tech Analog & Power IC Labroator, Oct. 18, 2006, 5 pages. [cited by applicant]
Sakai et al., “A Buried Giga-Ohm Resistor (BGR) Load Static RAM Cell,” IEEE Symp. on VLSI Technology, Digest of Papers, Sep. 10-12, 1984, 2 pages. [cited by applicant]
Schuller et al., “Neuromorphic Computing: From Materials to Systems Architecture,” US Dept. of Energy, Oct. 29-30, 2015, Gaithersburg, MD, 40 pages. [cited by applicant]
Seo et al., “A Novel 3-D Vertical FG NAND Flash Memory Cell Arrays Using the Separated Sidewall Control Gate (S-SCG) for Highly Reliable MLC Operation,” 2011 3rd IEEE International Memory Workshop (IMW), May 22-25, 2011… [cited by applicant]
Soudry, et al. “Hebbian learning rules with memristors,” Center for Communication and Information Technologies CCIT Report #840, Sep. 1, 2013, 16 pages. [cited by applicant]
Tanaka et al., “Bit Cost Scalable Technology with Punch and Plug Process for Ultra High Density Flash Memory,” VLSI Technology, 2007 IEEE Symposium on Jun. 12-14, 2007, pp. 14-15. [cited by applicant]
Wang et al., “Three-Dimensional NAND Flash for Vector-Matrix Multiplication,” IEEE Trans. on Very Large Scale Integration Systems (VLSI), vol. 27, No. 4, Apr. 2019, 4 pages. [cited by applicant]
Whang, SungJin et al. “Novel 3-dimensional Dual Control-gate with Surrounding Floating-gate (DC-SF) NAND flash cell for 1Tb file storage application,” 2010 IEEE Int'l Electron Devices Meeting (IEDM), Dec. 6-8, 2010, 4 p… [cited by applicant]