Integrated circuit structure and method
A semiconductor device includes a first plurality of dies encapsulated by an encapsulant, an interposer over the first plurality of dies, an interconnect structure over and electrically connected to the interposer, and a plurality of conductive pads on a surface of the interconnect structure opposite the interposer. The interposer includes a plurality of embedded passive components. Each die of the first plurality of dies is electrically connected to the interposer. The interconnect structure includes a solenoid inductor in a metallization layer of the interconnect structure.
1. A semiconductor device, comprising:
a first plurality of dies encapsulated by an encapsulant;
an interposer over the first plurality of dies, the interposer comprising a plurality of embedded passive components, each die of the first plurality of dies being electrically connected to the interposer;
an interconnect structure over and electrically connected to the interposer, the interconnect structure comprising a solenoid inductor in a metallization layer of the interconnect structure;
a plurality of conductive pads on a surface of the interconnect structure opposite the interposer; and
a first component attached to conductive pads of the plurality of conductive pads, wherein the first component is electrically coupled to the solenoid inductor, and wherein the solenoid inductor is a voltage regulator module for the first component.
2. The semiconductor device of claim 1 further comprising a first package encapsulated by the encapsulant, the first package being electrically connected to the interposer, the first package comprising static random access memory (SRAM) circuitry.
3. The semiconductor device of claim 2 , wherein the SRAM circuitry is in a first die of the first package and a second die of the first package comprises a system-on-chip.
4. The semiconductor device of claim 3 , wherein a third die of the first package comprises an input/output device.
5. The semiconductor device of claim 1 , wherein the first component comprises a pulse width modulation (PWM) controller.
6. The semiconductor device of claim 1 , wherein a first connector is attached to conductive pads of the plurality of conductive pads.
7. The semiconductor device of claim 6 , wherein the first connector is a first optical connector.
8. The semiconductor device of claim 7 , wherein a second optical connector is electrically coupled to a respective embedded passive component of the plurality of embedded passive components of the interposer, the second optical connector being on an opposite side of the interposer from the first optical connector.
9. The semiconductor device of claim 8 , wherein the second optical connector is encapsulated by the encapsulant.
10. The semiconductor device of claim 1 , wherein the interposer is a wafer comprising silicon.
11. A semiconductor device, comprising:
a first molding compound around a first die and a second die;
an interposer over the first die, the second die, and the first molding compound, the interposer comprising static random access memory (SRAM) circuitry, the first die and the second die each being electrically coupled to the interposer;
a conductive via on the interposer;
a third die bonded to and electrically coupled to the interposer;
a second molding compound around the conductive via and the third die;
an interconnect structure over the conductive via, the third die, and the second molding compound, the interconnect structure comprising a solenoid inductor; and
a plurality of contact pads on the interconnect structure opposite the conductive via, the third die, and the second molding compound.
12. The semiconductor device of claim 11 , wherein the interposer is a wafer, the wafer comprising silicon.
13. The semiconductor device of claim 11 , wherein the third die is an integrated passive device.
14. The semiconductor device of claim 11 , wherein the first die is electrically coupled to the interposer with a metal-metal bond.
15. A semiconductor device, comprising:
an interposer, wherein the interposer is a wafer comprising silicon, and wherein the interposer comprises a plurality of conductive pads on a first side of the interposer;
a first die and a second die bonded to the plurality of conductive pads, wherein the first die and the second die are electrically coupled to the interposer;
a first molding compound on the first side of the interposer and around the first die and the second die;
an interconnect structure on a second side of the interposer, wherein the interconnect structure comprises a solenoid inductor with a magnetic core;
a bolt through the interposer and the interconnect structure;
a plurality of contact pads on the interconnect structure opposite the interposer; and
a first device bonded to the interconnect structure, wherein the first device is electrically coupled to the plurality of contact pads.
16. The semiconductor device of claim 15 , wherein the first die and the second die are bonded to the interposer by metal-metal bonds and oxide-oxide bonds.
17. The semiconductor device of claim 15 , wherein the interposer comprises a plurality of embedded passive components.
18. The semiconductor device of claim 15 , wherein the interposer comprises static random access memory (SRAM) circuitry.
19. The semiconductor device of claim 15 , further comprising a conductive via and a third die between the interposer and the interconnect structure, wherein the conductive via and the third die are electrically coupled to the interposer and the interconnect structure.
20. The semiconductor device of claim 19 , wherein the third die is an integrated passive device.