Light emitting display device and manufacturing method thereof
A light emitting display device includes: a light emitting element; a second transistor connected to a scan line; a first transistor which applies a current to the light emitting element; a capacitor connected to a gate electrode of the first transistor; and a third transistor connected to an output electrode of the first transistor and the gate electrode of the first transistor. Channels of the second transistor, the first transistor, and the third transistor are disposed in a polycrystalline semiconductor layer, and a width of a channel of the third transistor is in a range of about 1 μm to about 2 μm, and a length of the channel of the third transistor is in a range of about 1 μm to about 2.5 μm.
1. A light emitting display device, comprising:
a light emitting element;
a second transistor connected to a scan line;
a first transistor which applies a current to the light emitting element;
a capacitor connected to a gate electrode of the first transistor; and
a third transistor connected to an output electrode of the first transistor and the gate electrode of the first transistor,
wherein a channel of the third transistor includes a polycrystalline semiconductor, and
a width of a channel of the third transistor is in a range of 1 μm to 2 μm, and a length of the channel of the third transistor is in a range of 1 μm to 2.5 μm.
2. The light emitting display device of claim 1 , wherein
the third transistor has a dual structure.
3. The light emitting display device of claim 2 , wherein
the width of the channel of the third transistor is in a range of ⅓ to ½ of a width of the channel of the first transistor.
4. The light emitting display device of claim 1 , further comprising:
a fourth transistor which initializes the gate electrode of the first transistor to an initializing voltage,
wherein a width of a channel of the fourth transistor is in a range of 1 μm to 2 μm, and a length of the channel of the fourth transistor is in a range of 1 μm to 2.5 μm.
5. The light emitting display device of claim 4 , wherein
the fourth transistor has a dual structure.
6. The light emitting display device of claim 5 , wherein
the width of the channel of the fourth transistor is in a range of ⅓ to ½ of a width of the channel of the first transistor.
7. The light emitting display device of claim 6 , further comprising:
a fifth transistor connected between the first transistor and a driving voltage line; and
a sixth transistor connected between the light emitting element and the first transistor,
wherein the length of the channel of the third transistor is in a range of ⅓ to ½ of a length of a channel of the fifth transistor or the sixth transistor.
8. The light emitting display device of claim 7 , wherein
the length of the channel of the fourth transistor is in a range of ⅓ to ½ of a length of a channel of the fifth transistor or the sixth transistor.
9. The light emitting display device of claim 7 , wherein
the third transistor has a single structure.
10. The light emitting display device of claim 9 , wherein
a width of a channel of the second transistor is in a range of 1 μm to 2 μm, and
a length of the channel of the second transistor is in a range of 1 μm to 2.5 μm.
11. The light emitting display device of claim 10 , wherein
the width of the channel of the second transistor is in a rage of ⅓ to ½ of a width of the channel of the first transistor.
12. The light emitting display device of claim 10 , wherein
the length of the channel of the second transistor is in a range of ⅓ to ½ of a length of a channel of the fifth transistor or the sixth transistor.
13. The light emitting display device of claim 1 , further comprising:
a gate insulating film covering the polycrystalline semiconductor layer,
wherein the gate insulating film is defined by one of a single layer of a silicon oxide film and a double layer of a silicon nitride film and the silicon oxide film,
wherein the gate insulating film has a thickness value in a range of 800 Å to 1200 Å,
wherein the thickness value of the gate insulating film is a thickness of the single layer of the silicon oxide film or a converted thickness of the double layer of the silicon nitride film and the silicon oxide film to the thickness of the single layer of the silicon oxide film.
14. The light emitting display device of claim 1 , wherein
the light emitting display device is driven even at a low frequency of 60 Hz or less.