Dynamic bonding gap control and tool for wafer bonding
A method includes placing a first wafer on a first wafer stage, placing a second wafer on a second wafer stage, and pushing a center portion of the first wafer to contact the second wafer. A bonding wave propagates from the center portion to edge portions of the first wafer and the second wafer. When the bonding wave propagates from the center portion to the edge portions of the first wafer and the second wafer, a stage gap between the top wafer stage and the bottom wafer stage is reduced.
1. A method comprising:
placing a first wafer on a first wafer stage;
placing a second wafer on a second wafer stage in opposition to the first wafer stage;
pushing a center portion of the first wafer to contact the second wafer, wherein a bonding wave propagates from the center portion to edge portions of the first wafer and the second wafer; and
when the bonding wave propagates from the center portion to the edge portions of the first wafer and the second wafer, reducing a stage gap between the first wafer stage and the second wafer stage.
2. The method of claim 1 , wherein when the bonding wave propagates, the first wafer comprises a bent portion that is bent with a slant angle being formed, and the bent portion also propagates toward the edge portions of the first wafer and the second wafer.
3. The method of claim 2 , wherein when the bonding wave propagates, the slant angle of the bent portion is a substantially constant angle.
4. The method of claim 2 , wherein when the bonding wave propagates, the slant angle of the bent portion reduces with time.
5. The method of claim 2 , wherein when the bonding wave propagates, the slant angle of the bent portion increases.
6. The method of claim 1 , wherein the reducing the stage gap is performed through a pre-determined schedule, in which a reduction rate of the stage gap is a function of time.
7. The method of claim 1 further comprising measuring positions of a bonding wave front of the first wafer and the second wafer, and the reducing the stage gap is based on the measured positions.
8. The method of claim 7 further comprising:
emitting a plurality of light beams on the first wafer, wherein the plurality of light beams are aligned to a radius of the first wafer; and
detecting the plurality of light beams reflected from the first wafer, wherein the positions of the bonding wave front is determined based on the light beams reflected from the first wafer.
9. The method of claim 1 , wherein the reducing the stage gap between the first wafer and the second wafer is performed through a plurality of motors to drive the first wafer stage.
10. The method of claim 1 further comprising:
detecting whether the first wafer stage and the second wafer stage are parallel to each other through a plurality of stage sensors; and
driving the first wafer stage to make the first wafer stage and the second wafer stage to be parallel to each other.
11. A method comprising:
placing a bottom wafer on a bottom wafer stage;
placing a top wafer on a top wafer stage; and
allowing a bonding wave to propagate from a center portion to edge portions of the top wafer and the bottom wafer, wherein when the bonding wave propagates, a bent portion of the top wafer at a bonding-wave front also propagates toward the edge portions of the top wafer and the bottom wafer, and when the bent portion propagates, a slant angle of the bent portion is either constant or reduced.
12. The method of claim 11 , wherein the slant angle is kept as substantially a constant when the bent portion propagates.
13. The method of claim 11 , wherein the slant angle is reduced when the bent portion propagates.
14. The method of claim 11 , wherein the center portion of the top wafer contacts the bottom wafer at a first time point, and at the first time point, the top wafer and the bottom wafer have a first stage gap, and at a second time point later than the first time point, wherein the bonding wave still propagates at the second time point, the top wafer and the bottom wafer have a second stage gap smaller than the first stage gap.
15. A method comprising:
placing a first wafer on a first wafer stage;
placing a second wafer over and spaced apart from the first wafer;
contacting a first center portion of the first wafer with a second center portion of the second wafer, wherein a bonding wave propagates from the first center portion and the second center portion to edge portions of the first wafer and the second wafer; and
when the bonding wave propagates, reducing a distance between a first wafer edge of the first wafer and a second wafer edge of the second wafer, wherein the second wafer edge is directly over the first wafer edge.
16. The method of claim 15 , wherein the second wafer is placed under and attached to a second wafer stage, and wherein when the bonding wave propagates, a distance from the second wafer stage to the first wafer stage is gradually reduced.
17. The method of claim 15 , wherein when the bonding wave propagates, the second wafer comprises a bent portion that is bent with a slant angle being formed, and the bent portion also propagates toward the edge portions of the first wafer and the second wafer.
18. The method of claim 17 , wherein when the bonding wave propagates, the slant angle of the bent portion is a substantially constant angle or reduces with time.
19. The method of claim 15 further comprising:
when the bonding wave propagates, measuring the distance; and
adjusting a position of the second wafer in response to the distance.
20. The method of claim 15 further comprising, after the bonding wave reaches the edge portions of the first wafer and the second wafer, annealing to bond the first wafer to the second wafer.