Granted Patent B2

US 12,265,255 · App. 17/944,252 · Granted Apr 1, 2025

Inventors: Yusheng Bian (Ballston Lake, NY); Steven M. Shank (Jericho, VT); Judson Holt (Ballston Lake, NY); Michal Rakowski (Ballston Lake, NY); Bartlomiej Jan Pawlak (Leuven, BE)

Assignee: GlobalFoundries U.S. Inc.

G02B6/1228G02B6/13

Abstract

Claims (43)

1. A structure comprising:

a waveguide core including a first tapered section, a second tapered section, and a longitudinal axis, the first tapered section and the second tapered section aligned along the longitudinal axis;

a first waveguide taper overlapping the first tapered section of the waveguide core;

a second waveguide taper overlapping the second tapered section of the waveguide core; and

a multiple-layer structure on the waveguide core between the first waveguide taper and the second waveguide taper, the multiple-layer structure having a first end portion and a second end portion opposite to the first end portion,

wherein the first waveguide taper wraps around the first end portion, and the second waveguide taper wraps around the second end portion.

2. The structure of claim 1 wherein the first waveguide taper abuts the first tapered section of the waveguide core.

3. The structure of claim 2 wherein the second waveguide taper abuts the second tapered section of the waveguide core.

4. The structure of claim 2 wherein the first waveguide taper has a width dimension that increases with decreasing distance from the multiple-layer structure.

5. The structure of claim 4 wherein the first waveguide taper is terminated at an end that is longitudinally spaced from the multiple-layer structure.

6. The structure of claim 1 further comprising:

a substrate,

wherein the first tapered section of the waveguide core is positioned in a vertical direction between the first waveguide taper and the substrate.

7. The structure of claim 6 wherein the second tapered section of the waveguide core is positioned in the vertical direction between the second waveguide taper and the substrate.

8. The structure of claim 1 further comprising:

a dielectric layer positioned in a vertical direction between the first tapered section of the waveguide core and the first waveguide taper, the dielectric layer comprising a dielectric material.

9. The structure of claim 8 wherein the dielectric layer is positioned in the vertical direction between the second tapered section of the waveguide core and the second waveguide taper.

10. The structure of claim 1 wherein the multiple-layer structure is a multiple quantum well.

11. The structure of claim 1 wherein the waveguide core comprises a first material, and the first waveguide taper and the second waveguide taper comprise a second material different from the first material.

12. The structure of claim 11 wherein the first material is silicon, and the second material is silicon nitride.

13. The structure of claim 1 further comprising:

a third waveguide taper overlapping the first waveguide taper, the first waveguide taper positioned in a vertical direction between the third waveguide taper and the first tapered section of the waveguide core.

14. The structure of claim 13 further comprising:

a fourth waveguide taper overlapping the second waveguide taper, the second waveguide taper is positioned in the vertical direction between the fourth waveguide taper and the second tapered section of the waveguide core.

15. The structure of claim 1 wherein the first end portion is tapered, and the second end portion is tapered.

16. The structure of claim 1 further comprising:

a dielectric layer on the multiple-layer structure, the dielectric layer including a first portion between the first tapered section of the waveguide core and the first waveguide taper, and the dielectric layer including a second portion between the second tapered section of the waveguide core and the second waveguide taper.

17. A structure comprising:

a waveguide core including a first tapered section, a second tapered section, and a longitudinal axis, the first tapered section and the second tapered section aligned along the longitudinal axis;

a first waveguide taper overlapping the first tapered section of the waveguide core;

a second waveguide taper overlapping the second tapered section of the waveguide core;

a multiple-layer structure on the waveguide core between the first waveguide taper and the second waveguide taper,

a third waveguide taper adjacent to the multiple-layer structure; and

a fourth waveguide taper adjacent to the multiple-layer structure,

wherein the first waveguide taper wraps around the third waveguide taper, and the second waveguide taper wraps around the fourth waveguide taper.

18. The structure of claim 17 wherein the first waveguide taper and the second waveguide taper comprise a first material, and the third waveguide taper and the fourth waveguide taper comprise a second material different from the first material.

19. The structure of claim 17 wherein the multiple-layer structure has a first end portion and a second end portion opposite to the first end portion, the first waveguide taper further wraps around the first end portion, and the second waveguide taper further wraps around the second end portion.

20. A method comprising:

forming a waveguide core including a first tapered section, a second tapered section, and a longitudinal axis, wherein the first tapered section and the second tapered section are aligned along the longitudinal axis;

forming a first waveguide taper overlapping the first tapered section of the waveguide core;

forming a second waveguide taper overlapping the second tapered section of the waveguide core; and

forming a multiple-layer structure on the waveguide core between the first waveguide taper and the second waveguide taper,

wherein the multiple-layer structure has a first end portion and a second end portion opposite to the first end portion, the first waveguide taper wraps around the first end portion, and the second waveguide taper wraps around the second end portion.

Assignments (1)

Continuity (1)

References Cited (18)