Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device
An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a solubility in a developer, which changes by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation; and an acid diffusion control agent, in which a molecular weight of the acid diffusion control agent is 420 or more, and a distance Ra between a Hansen solubility parameter of the acid diffusion control agent and a Hansen solubility parameter of the air satisfies 15≤Ra≤45.
1. An actinic ray-sensitive or radiation-sensitive resin composition comprising:
a resin having a solubility in a developer, which changes by an action of an acid;
a compound that generates an acid upon irradiation with actinic rays or radiation; and
an acid diffusion control agent,
wherein a molecular weight of the acid diffusion control agent is 420 or more,
a distance Ra between a Hansen solubility parameter of the acid diffusion control agent and a Hansen solubility parameter of air is from 15 MPa 0.5 to 45 MPa 0.5 , and
the acid diffusion control agent is a compound represented by General Formula (Q-1),
in General Formula (Q-1),
Rq 1 and Rq 2 each independently represents a substituent,
Xq represents —NH—, —S—, or —O—,
in a case where Xq represents —NH—, the compound represented by General Formula (Q-1) is a compound represented by General Formula (Q11),
in General Formula (Q 11),
Rq 11 and Rq 12 each independently represents an alkyl group or an aryl group, and
Lq 1 and Lq 2 each independently represents a single bond, or —O—, —(C═O)—, an alkylene group, or a divalent linking group formed by combination of these groups, and
in a case where Xq represents —S— or —O—,
mq represents an integer of 0 to 5, in a case where mq is 2 or more, a plurality of Rq 1 's may be the same as or different from each other, and in a case where mq is 2 or more, the plurality of Rq 1 's may be bonded to each other to form a ring structure, and
nq represents an integer of 0 to 4, in a case where nq is 2 or more, a plurality of Rq 2 's may be the same as or different from each other, and in a case where nq is 2 or more, the plurality of Rq 2 's may be bonded to each other to form a ring structure.
2. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,
wherein Ra is from 17 MPa 0.5 to 42 MPa 0.5 .
3. An actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 .
4. A pattern forming method comprising:
forming a resist film using the actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ;
exposing the resist film; and
developing the exposed resist film using a developer.
5. A method for manufacturing an electronic device, comprising the pattern forming method according to claim 4 .