Semiconductor structure and methods of forming the same
View Patent ↗A semiconductor structure includes a first semiconductor device formed over a substrate. The first semiconductor device includes a first source/drain feature over the substrate, a first gate structure over the substrate, a first conductive feature over the first source/drain feature, and a first insulation layer between the first gate structure and the first conductive feature, wherein the first insulation layer comprises a first contact etching stop layer (CESL) in contact with the first source/drain feature. The semiconductor structure includes a second semiconductor device formed over the substrate, including a second source/drain feature over the substrate, a second gate structure over the substrate, a second conductive feature over the second source/drain feature, and a second insulation layer between the second gate structure and the second conductive feature, the second insulation layer comprises a second CESL in contact with the second source/drain feature, wherein a thickness of the first CESL is less than a thickness of the second CESL.
1. A semiconductor structure comprising:
a first semiconductor device formed over a substrate comprising:
a first source/drain feature over the substrate;
a first gate structure over the substrate;
a first conductive feature over the first source/drain feature; and
a first insulation layer between the first gate structure and the first conductive feature, wherein the first insulation layer comprises a first contact etching stop layer (CESL) in contact with the first source/drain feature; and
a second semiconductor device formed over the substrate comprising:
a second source/drain feature over the substrate;
a second gate structure over the substrate;
a second conductive feature over the second source/drain feature; and
a second insulation layer between the second gate structure and the second conductive feature, the second insulation layer comprises a second CESL in contact with the second source/drain feature,
wherein a thickness of the first CESL is less than a thickness of the second CESL.
2. The semiconductor structure of claim 1 , wherein the first CESL and the second CESL comprise the same material.
3. The semiconductor structure of claim 1 , wherein the first CESL and the second CESL are formed on different regions of the substrate during the same process.
4. The semiconductor structure of claim 3 , wherein the first conductive feature has a width less than a width of the second conductive feature.
5. The semiconductor structure of claim 3 , wherein the first gate structure has a width that is substantially the same as a width of the second gate structure.
6. The semiconductor structure of claim 5 , wherein the first insulation layer further comprises a first spacer layer disposed between the first CESL and the first gate structure, and the second insulation layer further comprises a second spacer layer disposed between the second CESL and the second gate structure.
7. The semiconductor structure of claim 6 , wherein a thickness of the first spacer and a thickness of the second spacer is substantially the same.
8. A semiconductor structure comprising:
a first gate structure disposed between two first source/drain (S/D) contacts at a first device region over a substrate, wherein each first S/D contact has a first width;
a second gate structure disposed between two second S/D contacts at a second device region over the substrate, wherein each second S/D contact has a second width greater than the first width;
a first contact etching stop layer (CESL) disposed between the first gate structure and the first S/D contact, wherein the first CESL has a first thickness; and
a second CESL disposed between the second gate structure and the second S/D contact, wherein the second CESL has a second thickness greater than the first thickness.
9. The semiconductor structure of claim 8 , further comprising:
a first gate spacer layer disposed between the first CESL and the first gate structure, wherein the first gate spacer layer has a first thickness; and
a second gate spacer layer disposed between the second CESL and the second gate structure, wherein the second gate spacer layer has a second thickness that is substantially equal to the first thickness of the first gate spacer.
10. The semiconductor structure of claim 9 , wherein the first CESL is disposed between and in contact with the first S/D contact and the first gate spacer, and the second CESL is disposed between and in contact with the second S/D contact and the second gate spacer.
11. The semiconductor structure of claim 9 , further comprising:
a first S/D feature disposed below the first S/D contact, wherein the first S/D feature has a first width; and
a second S/D feature disposed below the second S/D contact, wherein the second S/D feature has a second width greater than the first width of the first S/D feature.
12. The semiconductor structure of claim 8 , wherein the first gate structure has a first width, and the second gate structure has a second width that is substantially equal to the first width of the first gate structure.
13. The semiconductor structure of claim 12 , wherein the second width of the second S/D contact is greater than the second width of the second gate structure.
14. The semiconductor structure of claim 8 , wherein the first device region comprises transistor for a system-on-chip (SOC) device and the second device region comprises transistors for high-performance-computing (HPC) devices.
15. A method for manufacturing a semiconductor structure, comprising:
forming a first source/drain (S/D) contact opening through a dummy gate structure at a first region over a substrate and a second S/D contact opening through the dummy gate structure at a second region over the substrate, wherein the first S/D contact opening exposes a first spacer layer and a first S/D feature in the first S/D contact opening, the second S/D contact opening exposes a second spacer layer and a second S/D feature in the second S/D contact opening, and wherein the first S/D contact opening has a first width and the second S/D contact opening has a second width greater than the first width;
forming a contact etching stop layer (CESL) on exposed surfaces of the first spacer layer, the first S/D feature, the second spacer layer, and the second S/D feature;
performing a thinning operation so that the CESL within the first S/D contact opening has a thickness less than a thickness of the CESL within the second S/D contact opening;
filling the first and second S/D contact openings with an interlayer dielectric (ILD);
removing the dummy gate structure from the first and second regions;
forming a first gate structure and a second gate structure respectively in regions formed as a result of the removal of the dummy gate structure at the first and second regions; and
replacing the ILD in the first and second S/D contact openings with a conductive feature.
16. The method of claim 15 , wherein the conductive feature in the first S/D contact opening has a width that is less than a width of the conductive feature in the second S/D contact opening.
17. The method of claim 16 , wherein the first gate structure and the second gate structure have the same gate width.
18. The method of claim 15 , further comprising:
after forming the CESL and prior to performing the thinning operation, forming a protection layer over the CESL in second region.
19. The method of claim 15 , wherein the second gate structure has a width less than the second width of the second S/D contact opening.
20. The method of claim 15 , wherein the first region comprises transistor for a system-on-chip (SOC) device and the second region comprises transistors for high-performance-computing (HPC) devices.