IP Library › Granted Patent US 12,275,852
Granted Patent B2
US 12,275,852 · App. 17/538,684 · Granted Apr 15, 2025

High chroma flakes

Inventors: Johannes Seydel (Petaluma, CA); Mark Tevis (Novato, CA); Kangning Liang (Santa Rosa, CA); Jeffrey James Kuna (San Francisco, CA); Jaroslaw Zieba (Santa Rosa, CA); Paul Thomas Kohlmann (Windsor, CA)
Assignee: VIAVI SOLUTIONS INC.
C09C1/0015B32B7/02B32B7/023C09C1/003C09C1/0033C09C1/0036C09C1/0039C09C1/006C09C1/0063C09C1/0066C09C1/0069G02B5/0808B32B2250/05B32B2250/40C01P2006/62C01P2006/65C01P2006/66C09C2200/1054C09C2200/24C09C2200/30C09C2200/301C09C2200/302C09C2200/303C09C2200/306C09C2200/50C09C2200/505C09C2200/507C09C2220/20G02B5/26G02B5/28
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Quick Facts
Patent No.
US 12,275,852
App. No.
17/538,684
Granted
Apr 15, 2025
Kind
B2
Abstract

An article including a reflector having a first surface and a second surface opposite the first surface; a first selective light modulator layer external to the first surface of the reflector; a second selective light modulator layer external to the second surface of the reflector; a first absorber layer external to the first selective light modulator layer; and a second absorber layer external to the second selective light modulator layer; wherein each of the first and second selective light modulator layers include a host material is disclosed herein. Methods of making the article are also disclosed.

Claims (38)

1. A method for forming an article comprising:

depositing on a substrate a first absorber layer;

depositing on the first absorber layer a first selective light modulator layer;

depositing on the first selective light modulator layer a reflector;

depositing on the reflector a second selective light modulator layer; and

depositing on the second selective light modulator layer a second absorber layer;

wherein at least one of the first selective light modulator layer and the second selective light modulator layer is deposited using a liquid coating process;

wherein each of the first and second selective light modulator layers comprises a solvent and the method further comprises evaporating the solvent from each of the deposited first and second selective light modulator layers before curing each of the deposited first and second selective light modulator layers; and

wherein the liquid coating process is a process chosen from slot-bead, slide bead, slot curtain, slide curtain and gravure.

2. A method for forming an article comprising:

depositing on a substrate a first absorber layer;

depositing on the first absorber layer a first selective light modulator layer;

depositing on the first selective light modulator layer a reflector;

depositing on the reflector a second selective light modulator layer; and

depositing on the second selective light modulator layer a second absorber layer;

wherein at least one of the first selective light modulator layer and the second selective light modulator layer is deposited using a liquid coating process;

wherein the first and second selective light modulator layer each independently include a selective light modulator particle chosen from a color shifting particle, a reflective pigment, quantum dots, fluorides, or mixtures thereof.

3. The method of claim 1 , wherein the liquid coating process comprises curing each one of the deposited first and second selective light modulator layers.

4. The method of claim 2 , wherein each of the first and second selective light modulator layers comprises a solvent and the method further comprises evaporating the solvent from each of the deposited first and second selective light modulator layers before curing each of the deposited first and second selective light modulator layers.

5. The method of claim 1 , wherein a viscosity for each of the deposited first and second selective light modulator layers ranges from 10 to 3000 cP.

6. The method of claim 1 , wherein each of the deposited first and second selective light modulator layers is deposited at a speed ranging from about 0.1 to about 1000 m/min.

7. The method of claim 1 , wherein the evaporating of the solvent results in an end first and second selective light modulator layers having a lesser cured film thickness than the thickness of the deposited first and second selective light modulator layers before the evaporating.

8. The method of claim 2 , wherein the liquid coating process is a process chosen from slot-bead, slide bead, slot curtain, slide curtain, tensioned web, gravure, and roll coating.

9. A method for forming an article comprising:

depositing on a substrate a first absorber layer;

depositing on the first absorber layer a first selective light modulator layer;

depositing on the first selective light modulator layer a reflector;

depositing on the reflector a second selective light modulator layer; and

depositing on the second selective light modulator layer a second absorber layer;

wherein at least one of the first selective light modulator layer and the second selective light modulator layer is deposited using a liquid coating process;

wherein at least one of the first selective light modulator layer and the second selective light modulator layer includes at least one of (i) a photoinitiator including a phosphineoxide and (ii) an oxygen inhibition mitigation composition including at least one acrylate monomer and at least one acrylate oligomer.

10. The method of claim 1 , wherein at least one of the first selective light modulator layer and the second selective light modulator layer has less than about 7% optical thickness variation across the layer.

11. The method of claim 1 , further comprising, removing the substrate from the deposited layers.

12. The method of claim 1 , wherein the at least one of the first selective light modulator layer and the second selective light modulator layer are deposited having a wet film thickness ranging from about 0.1 μm to about 500 μm.

13. The method of claim 11 , further comprising, sizing the article to produce flakes.

14. The method of claim 1 , wherein the liquid coating process includes a ratio of slot gap to wet film thickness that ranges from about 1 to about 100 at a coating speed of from about 0.1 to about 1000 m/min.

15. The method of claim 9 , wherein the liquid coating process comprises depositing each of the first and second light modulator layers at a rate of from about 0.1 to about 1000 m/min.

16. The method of claim 3 , wherein the step of curing uses an ultraviolet light at a dose ranging from about 200 mJ/cm2 to about 1000 mJ/cm2.

Assignments (4)
RELEASE OF SECURITY INTEREST AT REEL/FRAME 73189/0873 Recorded May 28, 2026
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS ADMINISTRATIVE AGENT
To: INERTIAL LABS, INC.; VIAVI SOLUTIONS INC.; VIAVI SOLUTIONS LICENSING LLC
Reel/Frame 075642/0381 →
SECURITY INTEREST Recorded Nov 14, 2025
From: VIAVI SOLUTIONS INC.; VIAVI SOLUTIONS LICENSING LLC; INERTIAL LABS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS AGENT
Reel/Frame 073571/0137 →
SECURITY AGREEMENT Recorded Oct 21, 2025
From: INERTIAL LABS, INC.; VIAVI SOLUTIONS INC.; VIAVI SOLUTIONS LICENSING LLC
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS ADMINISTRATIVE AGENT
Reel/Frame 073189/0873 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 1, 2021
From: SEYDEL, JOHANNES; TEVIS, MARK; LIANG, KANGNING; KUNA, JEFFREY JAMES; ZIEBA, JAROSLAW; KOHLMANN, PAUL THOMAS
To: VIAVI SOLUTIONS INC.
Reel/Frame 058256/0260 →
Continuity (3)
Division 15633619 · Jun 26, 2017
Provisional Application 62355147 · Jun 27, 2016
Related Publication 20220089878A1 · Mar 24, 2022
References Cited (246)
US 2688007A · Steinman · 1954 [cited by applicant]
US 3425975A · James · 1969 [cited by applicant]
US 3997485A · Dowbenko et al. · 1976 [cited by applicant]
US 4017326A · Davis · 1977 [cited by applicant]
US 4071489A · Emmons et al. · 1978 [cited by applicant]
US 4100133A · Emmons et al. · 1978 [cited by applicant]
US 4129537A · Dhein et al. · 1978 [cited by applicant]
US 4216252A · Moeller · 1980 [cited by applicant]
US 4332861A · Franz et al. · 1982 [cited by applicant]
US 4639069A · Yatabe et al. · 1987 [cited by applicant]
US 5055345A · Wank et al. · 1991 [cited by applicant]
US 5102925A · Suzuki et al. · 1992 [cited by applicant]
US 5135812A · Phillips et al. · 1992 [cited by applicant]
US 5136404A · Nobile et al. · 1992 [cited by applicant]
US 5219900A · Davies et al. · 1993 [cited by applicant]
US 5346569A · Simon · 1994 [cited by examiner]
US 5471331A · Takizawa et al. · 1995 [cited by applicant]
US 5569535A · Phillips et al. · 1996 [cited by applicant]
US 5582645A · Trest et al. · 1996 [cited by applicant]
US 5641544A · Melancon et al. · 1997 [cited by applicant]
US 5700607A · Rath · 1997 [cited by applicant]
US 5743981A · Lu · 1998 [cited by applicant]
US 5877895A · Shaw et al. · 1999 [cited by applicant]
US 6132504A · Kuntz et al. · 2000 [cited by applicant]
US 6139613A · Hendrickson · 2000 [cited by examiner]
US 6150022A · Coulter et al. · 2000 [cited by applicant]
US 6156115A · Pfaff et al. · 2000 [cited by applicant]
US 6235105B1 · Hubbard et al. · 2001 [cited by applicant]
US 6236510B1 · Bradley, Jr. · 2001 [cited by examiner]
US 6243204B1 · Bradley, Jr. et al. · 2001 [cited by applicant]
US 6299979B1 · Neubauer et al. · 2001 [cited by applicant]
US 6376018B1 · Kittler, Jr. · 2002 [cited by applicant]
US 6383638B1 · Coulter · 2002 [cited by examiner]
US 6531221B1 · Schumacher · 2003 [cited by applicant]
US 6572784B1 · Coombs et al. · 2003 [cited by applicant]
US 6686042B1 · LeGallee · 2004 [cited by applicant]
US 6749936B2 · Argoitia et al. · 2004 [cited by applicant]
US 6783349B2 · Neavin et al. · 2004 [cited by applicant]
US 6808806B2 · Phillips et al. · 2004 [cited by applicant]
US 6818299B2 · Phillips et al. · 2004 [cited by applicant]
US 6841238B2 · Argoitia et al. · 2005 [cited by applicant]
US 6894086B2 · Munro · 2005 [cited by examiner]
US 6913783B2 · Lazarev et al. · 2005 [cited by applicant]
US 6979704B1 · Mayer et al. · 2005 [cited by applicant]
US 6997981B1 · Coombs et al. · 2006 [cited by applicant]
US 7258900B2 · Raksha et al. · 2007 [cited by applicant]
US 7261950B2 · Fleming et al. · 2007 [cited by applicant]
US 7390715B2 · Ou et al. · 2008 [cited by applicant]
US 7455904B2 · O'Keefe · 2008 [cited by applicant]
US 7518284B2 · Benslimane et al. · 2009 [cited by applicant]
US 7625596B2 · Lewis et al. · 2009 [cited by applicant]
US 7629051B2 · Fukushige et al. · 2009 [cited by applicant]
US 7719187B2 · Ray · 2010 [cited by applicant]
US 7767123B2 · Argoitia · 2010 [cited by applicant]
US 7850359B2 · Jeng et al. · 2010 [cited by applicant]
US 7951418B2 · O'Keefe · 2011 [cited by applicant]
US 8252412B2 · Purdy et al. · 2012 [cited by applicant]
US 8372685B2 · Robinson et al. · 2013 [cited by applicant]
US 8454859B2 · Lowenthal · 2013 [cited by applicant]
US 8557332B2 · Watanabe et al. · 2013 [cited by applicant]
US 8586457B1 · Liang et al. · 2013 [cited by applicant]
US 8591775B2 · Fujdala et al. · 2013 [cited by applicant]
US 8641933B2 · Purdy et al. · 2014 [cited by applicant]
US 8715537B2 · Fujdala et al. · 2014 [cited by applicant]
US 8815337B2 · Yializis et al. · 2014 [cited by applicant]
US 8852476B2 · Decker · 2014 [cited by applicant]
US 9012261B2 · Van Duren et al. · 2015 [cited by applicant]
US 9105526B2 · Le et al. · 2015 [cited by applicant]
US 9105527B2 · Van Duren et al. · 2015 [cited by applicant]
US 9212089B2 · Arsten et al. · 2015 [cited by applicant]
US 9822275B2 · Hibben · 2017 [cited by applicant]
US 10048415B2 · Banerjee et al. · 2018 [cited by applicant]
US 20020015914A1 · Miyamoto et al. · 2002 [cited by applicant]
US 20020137819A1 · Polonka · 2002 [cited by applicant]
US 20020160194A1 · Phillips et al. · 2002 [cited by applicant]
US 20020182383A1 · Phillips et al. · 2002 [cited by applicant]
US 20030203222A1 · Phillips et al. · 2003 [cited by applicant]
US 20030215641A1 · Phillips et al. · 2003 [cited by applicant]
US 20040001973A1 · Gao et al. · 2004 [cited by applicant]
US 20040012838A1 · Huibers et al. · 2004 [cited by applicant]
US 20040160672A1 · Phillips et al. · 2004 [cited by applicant]
US 20040166308A1 · Raksha et al. · 2004 [cited by applicant]
US 20050150740A1 · Finkenzeller et al. · 2005 [cited by applicant]
US 20050196584A1 · Halecki et al. · 2005 [cited by applicant]
US 20050261389A1 · Bratolavsky et al. · 2005 [cited by applicant]
US 20050261406A1 · Nakayama et al. · 2005 [cited by applicant]
US 20050267230A1 · Esaki et al. · 2005 [cited by applicant]
US 20060023327A1 · Coombs et al. · 2006 [cited by applicant]
US 20060068115A1 · Ogawa · 2006 [cited by applicant]
US 20060094323A1 · Hong et al. · 2006 [cited by applicant]
US 20060103781A1 · Jeng et al. · 2006 [cited by applicant]
US 20060263539A1 · Argoitia · 2006 [cited by applicant]
US 20060285184A1 · Phillips · 2006 [cited by examiner]
US 20070062445A1 · Kodou et al. · 2007 [cited by applicant]
US 20070070494A1 · Brott et al. · 2007 [cited by applicant]
US 20070230191A1 · Komuro et al. · 2007 [cited by applicant]
US 20070231571A1 · Lane et al. · 2007 [cited by applicant]
US 20080129928A1 · Jeng · 2008 [cited by applicant]
US 20080170192A1 · Jeng · 2008 [cited by applicant]
US 20090004478A1 · Baetzold et al. · 2009 [cited by applicant]
US 20090081460A1 · Argoitia et al. · 2009 [cited by applicant]
US 20090322993A1 · Saito et al. · 2009 [cited by applicant]
US 20100055401A1 · Choi et al. · 2010 [cited by applicant]
US 20100095868A1 · Kaupp et al. · 2010 [cited by applicant]
US 20100140916A1 · Firth · 2010 [cited by applicant]
US 20100261017A1 · Kikuchi · 2010 [cited by applicant]
US 20110013260A1 · Ohno · 2011 [cited by applicant]
US 20110042649A1 · Duvall et al. · 2011 [cited by applicant]
US 20110299167A1 · Woolf · 2011 [cited by applicant]
US 20120028009A1 · Gerardin et al. · 2012 [cited by applicant]
US 20120108700A1 · Kanzaki et al. · 2012 [cited by applicant]
US 20120177844A1 · Biver et al. · 2012 [cited by applicant]
US 20130095333A1 · Pal et al. · 2013 [cited by applicant]
US 20130164529A1 · Yu et al. · 2013 [cited by applicant]
US 20130233739A1 · Zhao et al. · 2013 [cited by applicant]
US 20130280854A1 · Jasieniak et al. · 2013 [cited by applicant]
US 20140035995A1 · Chou · 2014 [cited by applicant]
US 20140037890A1 · McJunkins · 2014 [cited by applicant]
US 20140050768A1 · Struck et al. · 2014 [cited by applicant]
US 20140110813A1 · Liang et al. · 2014 [cited by applicant]
US 20140151607A1 · Lowenthal · 2014 [cited by applicant]
US 20140238833A1 · Virkar et al. · 2014 [cited by applicant]
US 20140322452A1 · Kasyanova et al. · 2014 [cited by applicant]
US 20140322549A1 · Xu et al. · 2014 [cited by applicant]
US 20150055033A1 · Imamura et al. · 2015 [cited by applicant]
US 20150099119A1 · Farrand et al. · 2015 [cited by applicant]
US 20150118408A1 · Hong et al. · 2015 [cited by applicant]
US 20150123049A1 · Farrand et al. · 2015 [cited by applicant]
US 20150126680A1 · Farrand et al. · 2015 [cited by applicant]
US 20150129817A1 · Farrand et al. · 2015 [cited by applicant]
US 20150129818A1 · Blackman et al. · 2015 [cited by applicant]
US 20150129819A1 · Farrand et al. · 2015 [cited by applicant]
US 20150168746A1 · Blackman et al. · 2015 [cited by applicant]
US 20150184031A1 · Yurt et al. · 2015 [cited by applicant]
US 20150220057A1 · Tziovaras et al. · 2015 [cited by applicant]
US 20150235745A1 · Choe · 2015 [cited by applicant]
US 20150309353A1 · Stensvad et al. · 2015 [cited by applicant]
US 20150316686A1 · Vanier et al. · 2015 [cited by applicant]
US 20160076242A1 · Becker IV et al. · 2016 [cited by applicant]
US 20160085944A1 · Brophy et al. · 2016 [cited by applicant]
US 20160088756A1 · Ramadas · 2016 [cited by applicant]
US 20160168177A1 · Cunningham et al. · 2016 [cited by applicant]
US 20160264810A1 · Okamoto et al. · 2016 [cited by applicant]
US 20160326374A1 · Kuna et al. · 2016 [cited by applicant]
US 20160333526A1 · MacPherson et al. · 2016 [cited by applicant]
US 20170291401A1 · Yamane et al. · 2017 [cited by applicant]
US 20170368798A1 · Seydel et al. · 2017 [cited by applicant]
US 20170368866A1 · Seydel et al. · 2017 [cited by applicant]
US 20170371091A1 · Seydel et al. · 2017 [cited by applicant]
US 20200032111A1 · Ogawa · 2020 [cited by applicant]
US 20210141144A1 · Seydel et al. · 2021 [cited by applicant]
CN 1286761A · 2001 [cited by applicant]
CN 1423212A · 2003 [cited by applicant]
CN 1485146 · 2004 [cited by applicant]
CN 1748874 · 2006 [cited by applicant]
CN 1825140A · 2006 [cited by applicant]
CN 1946818 · 2007 [cited by applicant]
CN 101210975A · 2008 [cited by applicant]
CN 100592980C · 2010 [cited by applicant]
CN 101680975A · 2010 [cited by applicant]
CN 101970587A · 2011 [cited by applicant]
CN 102077060A · 2011 [cited by applicant]
CN 102221722A · 2011 [cited by applicant]
CN 102481723A · 2012 [cited by applicant]
CN 102483567 · 2012 [cited by applicant]
CN 101897036B · 2012 [cited by applicant]
CN 103415352 · 2013 [cited by applicant]
CN 103608183A · 2014 [cited by applicant]
CN 103998955 · 2014 [cited by applicant]
CN 104884265A · 2015 [cited by applicant]
CN 105283602 · 2016 [cited by applicant]
CN 106032407 · 2016 [cited by applicant]
DE 10349000 · 2005 [cited by applicant]
DE 102005017169 · 2006 [cited by applicant]
DE 102013021180 · 2015 [cited by applicant]
DE 102014001688 · 2015 [cited by applicant]
EP 0033896 · 1981 [cited by applicant]
EP 1239307 · 2002 [cited by applicant]
EP 1918334 · 2008 [cited by applicant]
EP 2538247 · 2012 [cited by applicant]
JP S5227892Y2 · 1977 [cited by applicant]
JP S55160060 · 1980 [cited by applicant]
JP S5926251 · 1984 [cited by applicant]
JP S60184001U · 1985 [cited by applicant]
JP S6221041U · 1987 [cited by applicant]
JP H0136891Y2 · 1989 [cited by applicant]
JP 02072700 · 1990 [cited by applicant]
JP H09113927 · 1997 [cited by applicant]
JP H10202153 · 1998 [cited by applicant]
JP 2003335880 · 2003 [cited by applicant]
JP 2006176742 · 2006 [cited by applicant]
JP 2007011309 · 2007 [cited by applicant]
JP 2007232958 · 2007 [cited by applicant]
JP 2008088317 · 2008 [cited by applicant]
JP 2008532069 · 2008 [cited by applicant]
JP 2009520844 · 2009 [cited by applicant]
JP 2011221376 · 2011 [cited by applicant]
JP 2012097135 · 2012 [cited by applicant]
JP 2012177938 · 2012 [cited by applicant]
JP 20123050524 · 2013 [cited by applicant]
JP 2013242396 · 2013 [cited by applicant]
JP 2016072422 · 2016 [cited by applicant]
KR 1020060011158 · 2006 [cited by applicant]
KR 1020080060707 · 2008 [cited by applicant]
KR 1020090025217 · 2009 [cited by applicant]
KR 20100081163 · 2010 [cited by applicant]
WO 1990010246 · 1990 [cited by applicant]
WO 0031571 · 2000 [cited by applicant]
WO 2003077019 · 2003 [cited by applicant]
WO 2004016441 · 2004 [cited by applicant]
WO 2004072186 · 2004 [cited by applicant]
WO 2006007742 · 2006 [cited by applicant]
WO 2008061930 · 2008 [cited by applicant]
WO 2012078820 · 2012 [cited by applicant]
WO 2013079542 · 2013 [cited by applicant]
WO 2014085473 · 2014 [cited by applicant]
WO 2014410427 · 2014 [cited by applicant]
WO 2016060173 · 2016 [cited by applicant]
WO 2016076333 · 2016 [cited by applicant]
Translation of CN 101265681 by Shimizu et al. (Year: 2008). [cited by examiner]
Arceneaux, et al., “Mitigation of Oxygen Inhibition in UV LED, UVA, and Low Intensity UV Cure”, RadTech 2014, 11 pages. [cited by applicant]
Daniel R. Swiler, “Pigments, Inorganic”, Kirk-Othmer Encyclopedia of Chemical Technology, Published online on Aug. 19, 2005, 38 pages. [cited by applicant]
Quantum Dots, Sigma-Aldrich (RTM), retrieved from “https://www.sigmaaldrich .com/technical-documents/articles/materials-science/nanomaterials/quantum-dots.html” on Mar. 12, 2020. (Year: 2020). [cited by applicant]
Quantum dot, Wikipedia (RTM), Retrieved from “https://en.wikipedia.org/w/index.php?title=Quantum_dot&oldid=942721 024” on Mar. 12, 2020. (Year: 2020). [cited by applicant]
Modaflow (RTM) Resin, Technical Datasheet, Version 5.0, Allnex, Jun. 18, 2020, 2 pages. (Year: 2020). [cited by applicant]
BYK-361 N, Technical Data Sheet, BYK (RTM) Additives & Instruments, Dec. 2012, 4 pages. (Year: 2012). [cited by applicant]
Paint Additives, Product Guide L-G 1, BYK (RTM) Additives & Instruments, Feb. 2009, 15 pages. (Year: 2009). [cited by applicant]
BYK-306, Technical Data Sheet, BYK (RTM) Additives & Instruments, Nov. 2012, 2 pages. (Year: 2012). [cited by applicant]
Penzel, E. “Polyacrylates”, In Ullmann's Encyclopedia of Industrial Chemistry, year 2000, vol. 28, pp. 515-536. [cited by applicant]
BASF brochure entitled “High lights! Radiation curing with resins and photoinitiators for industrial coatings and graphic arts: Laromer®, Irgacure®, Lucirin®, Darocur®”, BASF the Chemical Company, Aug. 6, 2014, 44 pages. [cited by applicant]
Husar, et al., “The formulator's guide to anti-oxygen inhibition additives”, Progress in Organic Coatings 77, 2014, p. 1789-1798, 10 pages. [cited by applicant]
Cohen et al., “Modern Coating and Drying Technology”, John Wiley & Sons, Inc., Oct. 1999, 6 pages. [cited by applicant]
“Office Action, China Application No. 202011447471.9”, dated Sep. 30, 2022, 9 pages including portion English translation cited as the concise statement of relevance regarding NPL reference Cohen. [cited by applicant]
Kobayashi, Satosi, Toyo Aluminium K.K. Product Report, Colored Aluminium Paste, Fall 2012. (Year: 2012). [cited by applicant]
“200 Questions on UV Optical Technology”, Gao Jing, p. 33, Printing Industry Press, Jan. 2012, 17 pages (relevant p. 33). [cited by applicant]
“Acid-catalyzed synthesis of butane-1, 2-propanediol condensation agent using phosphorus supported on silica”, Yang Shui-Jin et al., Chemical Intermediate, No. 11, Nov. 15, 2012, 3 pages. [cited by applicant]
“New Technology of Modern Coating Technology”, Liu Guojie, (relevant p. 231), China Light Industry Press, Apr. 2000, 32 pages. [cited by applicant]
“Study on influences of oxygen for photochemical solidification adhesive solidification”, Wang Zhengping, Chemical Engineer, vol. 107, No. 8, Aug. 30, 2004, 10 pages. [cited by applicant]
Du Zhenxia et al., “Research on surface modification of nano-calcium carbonate and its application in coatings”. Journal of Beijing University of Chemical Technology, vol. 26, No. 2, Jun. 30, 1999, 8 pages. [cited by applicant]
Hubei Paper, No. 4, “Study on the Effect of Nanoscale Calcium Carbonate on the Properties of Coatings and Papers”, Zhang Heng et al., Dec. 30, 2003, 9 pages. [cited by applicant]
IM&P, “Chemical Minerals and Processing”, No. 5, May 25, 2003, 4 pages. [cited by applicant]
Li Huachun et al., “The inhibitory effect of oxygen in the photocuring process of coatings”, Modern Plastics Processing and Application, vol. 14, No. 4, Aug. 15, 2002, 12 pages. [cited by applicant]
Liu Guojie et al., “Some new developments in research and development of acrylic resins and coatings”, Monographs and Reviews, vol. 15, No. 8, Aug. 20, 2012, 18 pages. [cited by applicant]
Liu Junhua, et al., “Synthesis of multifunctional acrylated pilyester and its photocuring”, Thermosetting Resin, vol. 18, No. 1, Jan. 30, 2003, 13 pages. [cited by applicant]
Polymer Bulletin, No. 9, Sun Jiazhen, et al., Aug. 28, 2015, 37 pages. [cited by applicant]
Progress in Chemistry, vol. 23, No. 11, Chen Bingkun et al., Nov. 24, 2011, 33 pages. [cited by applicant]
Cited By (1)
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