Semiconductor devices performing threshold switching
A semiconductor device according to an embodiment of the present disclosure includes a substrate, a gate electrode layer disposed over the substrate, a gate dielectric layer disposed on the gate electrode layer, a channel electrode layer disposed on the gate dielectric layer, a threshold switching layer disposed on the channel electrode layer, and a source electrode layer and a drain electrode layer that are disposed on the threshold switching layer to be spaced apart from each other.
1. A semiconductor device comprising:
a substrate;
a gate electrode layer disposed over the substrate;
a gate dielectric layer disposed on the gate electrode layer;
a channel electrode layer disposed on the gate dielectric layer;
a threshold switching layer disposed on the channel electrode layer; and
a source electrode layer and a drain electrode layer that are disposed on the threshold switching layer to be spaced apart from each other,
wherein the threshold switching layer includes a resistance change material having a non-memory property.
2. The semiconductor device of claim 1 , wherein the channel electrode layer includes a conductor.
3. The semiconductor device of claim 1 , wherein the channel electrode layer includes a noble metal.
4. The semiconductor device of claim 1 , wherein the resistance change material includes at least one selected from the group consisting of silicon oxide, aluminum oxide, zirconium oxide, hafnium oxide, tungsten oxide, titanium oxide, nickel oxide, copper oxide, manganese oxide, tantalum oxide, niobium oxide, and iron oxide.
5. The semiconductor device of claim 1 , wherein the resistance change material includes, as a dopant, at least one selected from the group consisting of silver (Ag), aluminum (Al), lanthanum (La), niobium (Nb), vanadium (V), tantalum (Ta), tungsten (W), chromium (Cr), molybdenum (Mo), titanium (Ti), copper (Cu), zirconium (Zr), and hafnium (Hf).
6. The semiconductor device of claim 1 ,
wherein at least a portion of the source electrode layer and at least a portion of the channel electrode layer overlap with each other in a direction substantially perpendicular to a surface of the channel electrode layer, and
wherein at least a portion of the drain electrode layer and at least a portion of the channel electrode layer overlap with each other in the direction substantially perpendicular to the surface of the channel electrode layer.
7. The semiconductor device of claim 1 , further comprising a first conductive path formed between the source electrode layer and the channel electrode layer and a second conductive path formed between the drain electrode layer and the channel electrode layer according to a voltage applied to the gate electrode layer,
wherein the semiconductor device is turned-on by a formation of the first conductive path and the second conductive path.
8. The semiconductor device of claim 1 , further comprising first and second conductive filaments generated in the threshold switching layer according to a voltage applied to the gate electrode layer,
wherein the first conductive filament electrically connects the source electrode layer and the channel electrode layer to each other, and the second conductive filament electrically connects the drain electrode layer and the channel electrode layer to each other.
9. The semiconductor device of claim 8 , wherein conductive carriers conduct between the source electrode layer and the drain electrode layer through the first and second conductive filaments and the channel electrode layer.
10. The semiconductor device of claim 8 , wherein the semiconductor device is turned on by generation of the first and second conductive filaments and is turned off through disconnection of the first and second conductive filaments.
11. A semiconductor device comprising:
a substrate;
a channel electrode layer disposed over the substrate;
a threshold switching layer disposed on a first surface of the channel electrode layer;
a source electrode layer and a drain electrode layer that are disposed on the threshold switching layer to be spaced apart from each other;
a gate dielectric layer disposed on a second surface of the channel electrode layer opposite to the first surface of the channel electrode layer; and
a gate electrode layer disposed on the gate dielectric layer,
wherein the threshold switching layer includes a resistance change material having a non-memory property.
12. The semiconductor device of claim 11 , wherein the channel electrode layer includes a conductor.
13. The semiconductor device of claim 11 , wherein the channel electrode layer includes a noble metal.
14. The semiconductor device of claim 11 , wherein the resistance change material includes at least one selected from the group consisting of silicon oxide, aluminum oxide, zirconium oxide, hafnium oxide, tungsten oxide, titanium oxide, nickel oxide, copper oxide, manganese oxide, tantalum oxide, niobium oxide, and iron oxide.
15. The semiconductor device of claim 11 , wherein the resistance change material includes, as a dopant, at least one selected from the group consisting of silver (Ag), aluminum (Al), lanthanum (La), niobium (Nb), vanadium (V), tantalum (Ta), tungsten (W), chromium (Cr), molybdenum (Mo), titanium (Ti), copper (Cu), zirconium (Zr), and hafnium (Hf).
16. The semiconductor device of claim 11 ,
wherein at least a portion of the source electrode layer and at least a portion of the channel electrode layer overlap with each other in a direction substantially perpendicular to the first surface of the channel electrode layer, and
wherein at least a portion of the drain electrode layer and at least a portion of the channel electrode layer overlap with each other in the direction substantially perpendicular to the first surface of the channel electrode layer.
17. A semiconductor device comprising:
a substrate;
a source electrode layer and a drain electrode layer that are disposed over the substrate to be spaced apart from each other in a direction perpendicular to a surface of the substrate;
a threshold switching layer disposed over the substrate to contact the source electrode layer and the drain electrode layer;
a channel electrode layer disposed over the substrate to contact the threshold switching layer;
a gate dielectric layer disposed on the channel electrode layer; and
a gate electrode layer disposed on the gate dielectric layer,
wherein the threshold switching layer includes a resistance change material having a non-memory property.
18. The semiconductor device of claim 17 , wherein the channel electrode layer extends in the direction perpendicular to the surface of the substrate.
19. The semiconductor device of claim 17 , wherein the channel electrode layer includes a conductor.
20. The semiconductor device of claim 17 , wherein the channel electrode layer includes a noble metal.