Apparatus for and method of manufacturing semiconductor device
An apparatus for manufacturing a semiconductor device includes a chamber including a lower housing and an upper housing, heater chucks in the lower housing, shower heads on the heater chucks, the shower heads being between the lower housing and the upper housing, power supplies connected to the shower heads to provide radio-frequency powers to the shower heads, power straps in the upper housing to connect the shower heads to the power supplies, and shielding members in the upper housing, the shielding members enclosing the power straps and the shower heads, respectively, the shielding members to prevent electromagnetic interference of the radio-frequency powers between the power straps and between the shower heads.
1. A method of manufacturing a semiconductor device, the method comprising:
placing substrates in a chamber, the chamber including shower heads enclosed in respective shielding members;
supplying a reaction gas onto the substrates via the shower heads; and
providing radio-frequency powers to the shower heads without an electromagnetic interference between the shower heads by using the shielding members,
wherein the chamber further includes:
a lower housing, and
an upper housing on the lower housing and on the shower heads, power straps connected to the shower heads extending into the upper housing, and
wherein the shielding members include:
shower-head shielding members enclosing the shower heads respectively, and
strap shielding members connected to the shower-head shielding members and enclosing the power straps, respectively-
wherein the shower-head shielding members are connected to each other by capacitors,
wherein the capacitors comprise:
short range capacitors connected between the shower-head shielding members that are disposed in short range distance to remove or minimize a near field interference between the shower-head shielding members, and
long range capacitors connected between the shower-head shielding members that are disposed in long range distance longer than the short range distance to remove or minimize a far field interference between the shower-head shielding members.
2. The method as claimed in claim 1 , wherein:
the shower-head shielding members are provided at positions corresponding to vertices of a rectangle;
the short range capacitors provided along sides of the rectangle, to each other; and
the long range capacitors are provided between the short range capacitors which are spaced apart from each other in a diagonal direction of the rectangle, to each other.
3. The method as claimed in claim 2 ,
wherein the short range capacitors have capacitance larger than that of the long range capacitors.
4. The method as claimed in claim 1 , wherein providing the radio-frequency powers includes generating the radio-frequency powers by power supplies, the power straps and the power supplies being connected to cables.
5. The method as claimed in claim 4 , wherein each of the cables includes a coaxial cable.
6. The method as claimed in claim 4 , wherein the upper housing includes sockets connecting the power straps to the cables, respectively, and the shielding members are provided between the sockets and the shower heads.